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Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell

Year 2012, Volume: 2 Issue: 3, 356 - 362, 01.09.2012

Ali Ibrahim A.a. El-amin

Abstract

This work has focuses on the development of a simple and low cost alternative to these deposited coatings (ARC) , through the use of an electrochemical etching technique to form AR layers of silicon (mc-Si). This is considered as the proper etching process for mc-Si. Also, silicon oxide (SiO) and titanium oxide (TiO2) coatings have been used to reduce the reflection losses from silicon solar cells. More than 20.6% enhancement in the short circuit current has been demonstrated in the polished cells using evaporated SiO antireflection coating. Additionally more than 12% enhancement in the short circuit current has been observed after TiO2 antireflection coating. The output current is found almost directly proportional to light intensity.

Keywords

ARC; electrochemical etching technique; multicrystalline Silicon Solar cell; reflection losses; polished cells.

References

  • M. A. Green, Silicon Solar Cells: Advanced Principles and Practice, Centre for Photovoltaic Devices and Systems, Sydney, 1995.
  • Zhao, J. Wang, A. Campbell, P. Green, M.A., 22.7% efficient silicon photovoltaic modules with textured front surface , Electron Devices, IEEE Transactions on, Volume: 46 Issue: 7, pp:1495 - 1497, 1999. ISSN: 0018
  • M. j. Mecann, K. e. Catchpole, K. J. Weber, A. W. Blakers, Sol. Ener. Mater. Sol. Cells 68, 135, 2001.
  • S. Reber, W. Zimmemnan, T. Kielba,, Sol. Ener. Mater. Sol. Cells 65, 409, 2001.
  • C. j. Brabec, N. S. Sariciftci, and J. C. Hummelen, "Plastic Solar Cells", Adv. Funct. Mater11, No. 1, pp 15- , 2001.
  • A. Combert, "Future Steps Towards Large-Area Microstructures Surfaces", in M. Weck (Ed.), "Precision Engineering and Micro Technology", 195-203, 2000.
  • Ph. Lalanne, G. M. Morries, "Highly imporoved coupled-wave polarization", J. Opt. Soc. Am. A 13, 779-784, 1996. method for TM
  • H. J. Möller, Solid State Phenomena, Vols, 47-48, pp. 142, 1996.
  • Sexton, F. W. , Plasma nitrade AR coating for silicon solar cells. Solar Energy Mat., 7,1- 4, 1991.
  • Kishore, R. , Singh, S. N. and Das, B. K., PECVD grown silicon nitrade AR coating on polycrstalline silicon solar cells. Solar Energy Mat. Solar cells, 26, 27-35, Kishore, R., Singh, S. N. and Das, B.K. Growth of silicon nitrade films on single and multicrystalline silicon solar cell using PECVD Technique. 6th int. Photovoltaic Sc. Engng. Conf., New Delhi, India, pp 249-253, 1992
  • Ramkishore, S.N. Singh and B.K.Das, Screen printer Titanium oxide and pecvd silicon nitrade as antireflection coating on silicon solar cells, Renewable Energy, Vol. 12, pp. 131-135, 1997.
  • Chen, Z., Sana, P., Rohatgi, A., A novel and effective PECVD SiO2/SiN antireflection coating for Si Solar cells. IEEE Trans. Electron Devices, 40, 1161- , 1993.
  • Narayanan, S., Ronein, S. and Wohlgemuth, J., Silicon nitade AR coating for low cost silicon solar cells. th Int. Photovoltaic Sc. Eneng. Conf., New Delhi, India 136, 1992.
  • H. J. Hovel.‘TiO2 antireflection coating by a low temperature spray process,‘ J. Electrochem. Soc., Soild- State Sci. Technol. Vol. 125, No.6, pp. 983-985, 1978.
  • A. Moussi and G. Sala, .‘TiO2 antireflection layer sprayed on textured surface,‘ in Proc. 18 th E. C. Photovoltaic Sol Energy Conf. 198, Vol2, pp.1374-7.
  • S. Strehlke, S. Bastide, J. Guillet, C.Levy-Clement, Material Science and Engineering B69-70, PP. 81-86, O. S. Heavens, Optical properties of thin films, Dover, New York, 1965.
  • A. M. Goodman. Appl. Optics 17 (1978) 2779.
  • H. Nouri, M. Bouaïcha, B. Bessaïs , " Effect of porous silicon on the performances of silicon solar cells during the porous silicon-based gettering procedure" Solar Energy Materials and Solar Cells, Volume 93, Issue , October 2009, Pages 1823-1826
  • Alexei Deinega, Ilya Valuev, Boris Potapkin, and Yurii Lozovik, Antireflective properties of pyramidally textured surfaces, Optics Letters, Vol. 35, Issue 2, pp. 108 (2010) http://dx.doi.org/10.1364/OL.35.000106
  • B. L. Sopori, R. A. Pryor. Solar Cells 8 (1983) 249 Appendix
  • Table 1. Preparation condition of the cold metallization procedure Metal Al (200nm) Etch away None Kern (NH4OH:H2O2+HCL: H2O2) Boiling H2SO4 + (NH4)2S2O8 Boiling HNO3 Al (200nm) Lift off M17 Al (200nm) Cr(2nm)/Cu(2 nm) (NH4)2S2O8 M20

Year 2012, Volume: 2 Issue: 3, 356 - 362, 01.09.2012

Ali Ibrahim A.a. El-amin

Abstract

References

  • M. A. Green, Silicon Solar Cells: Advanced Principles and Practice, Centre for Photovoltaic Devices and Systems, Sydney, 1995.
  • Zhao, J. Wang, A. Campbell, P. Green, M.A., 22.7% efficient silicon photovoltaic modules with textured front surface , Electron Devices, IEEE Transactions on, Volume: 46 Issue: 7, pp:1495 - 1497, 1999. ISSN: 0018
  • M. j. Mecann, K. e. Catchpole, K. J. Weber, A. W. Blakers, Sol. Ener. Mater. Sol. Cells 68, 135, 2001.
  • S. Reber, W. Zimmemnan, T. Kielba,, Sol. Ener. Mater. Sol. Cells 65, 409, 2001.
  • C. j. Brabec, N. S. Sariciftci, and J. C. Hummelen, "Plastic Solar Cells", Adv. Funct. Mater11, No. 1, pp 15- , 2001.
  • A. Combert, "Future Steps Towards Large-Area Microstructures Surfaces", in M. Weck (Ed.), "Precision Engineering and Micro Technology", 195-203, 2000.
  • Ph. Lalanne, G. M. Morries, "Highly imporoved coupled-wave polarization", J. Opt. Soc. Am. A 13, 779-784, 1996. method for TM
  • H. J. Möller, Solid State Phenomena, Vols, 47-48, pp. 142, 1996.
  • Sexton, F. W. , Plasma nitrade AR coating for silicon solar cells. Solar Energy Mat., 7,1- 4, 1991.
  • Kishore, R. , Singh, S. N. and Das, B. K., PECVD grown silicon nitrade AR coating on polycrstalline silicon solar cells. Solar Energy Mat. Solar cells, 26, 27-35, Kishore, R., Singh, S. N. and Das, B.K. Growth of silicon nitrade films on single and multicrystalline silicon solar cell using PECVD Technique. 6th int. Photovoltaic Sc. Engng. Conf., New Delhi, India, pp 249-253, 1992
  • Ramkishore, S.N. Singh and B.K.Das, Screen printer Titanium oxide and pecvd silicon nitrade as antireflection coating on silicon solar cells, Renewable Energy, Vol. 12, pp. 131-135, 1997.
  • Chen, Z., Sana, P., Rohatgi, A., A novel and effective PECVD SiO2/SiN antireflection coating for Si Solar cells. IEEE Trans. Electron Devices, 40, 1161- , 1993.
  • Narayanan, S., Ronein, S. and Wohlgemuth, J., Silicon nitade AR coating for low cost silicon solar cells. th Int. Photovoltaic Sc. Eneng. Conf., New Delhi, India 136, 1992.
  • H. J. Hovel.‘TiO2 antireflection coating by a low temperature spray process,‘ J. Electrochem. Soc., Soild- State Sci. Technol. Vol. 125, No.6, pp. 983-985, 1978.
  • A. Moussi and G. Sala, .‘TiO2 antireflection layer sprayed on textured surface,‘ in Proc. 18 th E. C. Photovoltaic Sol Energy Conf. 198, Vol2, pp.1374-7.
  • S. Strehlke, S. Bastide, J. Guillet, C.Levy-Clement, Material Science and Engineering B69-70, PP. 81-86, O. S. Heavens, Optical properties of thin films, Dover, New York, 1965.
  • A. M. Goodman. Appl. Optics 17 (1978) 2779.
  • H. Nouri, M. Bouaïcha, B. Bessaïs , " Effect of porous silicon on the performances of silicon solar cells during the porous silicon-based gettering procedure" Solar Energy Materials and Solar Cells, Volume 93, Issue , October 2009, Pages 1823-1826
  • Alexei Deinega, Ilya Valuev, Boris Potapkin, and Yurii Lozovik, Antireflective properties of pyramidally textured surfaces, Optics Letters, Vol. 35, Issue 2, pp. 108 (2010) http://dx.doi.org/10.1364/OL.35.000106
  • B. L. Sopori, R. A. Pryor. Solar Cells 8 (1983) 249 Appendix
  • Table 1. Preparation condition of the cold metallization procedure Metal Al (200nm) Etch away None Kern (NH4OH:H2O2+HCL: H2O2) Boiling H2SO4 + (NH4)2S2O8 Boiling HNO3 Al (200nm) Lift off M17 Al (200nm) Cr(2nm)/Cu(2 nm) (NH4)2S2O8 M20
There are 21 citations in total.

Details

Primary Language English
Journal Section Articles
Authors

Ali Ibrahim This is me

A.a. El-amin This is me

Publication Date September 1, 2012
Published in Issue Year 2012 Volume: 2 Issue: 3

Cite

APA Ibrahim, A., & El-amin, A. (2012). Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell. International Journal Of Renewable Energy Research, 2(3), 356-362.
AMA Ibrahim A, El-amin A. Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell. International Journal Of Renewable Energy Research. September 2012;2(3):356-362.
Chicago Ibrahim, Ali, and A.a. El-amin. “Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell”. International Journal Of Renewable Energy Research 2, no. 3 (September 2012): 356-62.
EndNote Ibrahim A, El-amin A (September 1, 2012) Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell. International Journal Of Renewable Energy Research 2 3 356–362.
IEEE A. Ibrahim and A. El-amin, “Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell”, International Journal Of Renewable Energy Research, vol. 2, no. 3, pp. 356–362, 2012.
ISNAD Ibrahim, Ali - El-amin, A.a. “Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell”. International Journal Of Renewable Energy Research 2/3 (September 2012), 356-362.
JAMA Ibrahim A, El-amin A. Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell. International Journal Of Renewable Energy Research. 2012;2:356–362.
MLA Ibrahim, Ali and A.a. El-amin. “Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell”. International Journal Of Renewable Energy Research, vol. 2, no. 3, 2012, pp. 356-62.
Vancouver Ibrahim A, El-amin A. Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell. International Journal Of Renewable Energy Research. 2012;2(3):356-62.