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ATOMİK KATMAN BİRİKTİRME (ALD) CİHAZLARI VE ÇEŞİTLERİNDEKİ GELİŞMELER

Year 2018, Volume: 6 Issue: 4, 590 - 605, 11.12.2018
https://doi.org/10.21923/jesd.392032

Abstract

Malzemelerin
yüzey özelliklerinin değiştirilmesi ile elde edilen ürünlere kendi
özelliklerinin yanında farklı işlevsellikler kazandırılabilmektedir. Yüzey
teknolojilerindeki gelişmeler yeni ürünlerin eldesini ve üretim süreçlerinin
gelişmesini de sağlamaktadır. ALD yöntemi çok farklı uygulama alanlarında
başarı ile uygulanma potansiyeline sahiptir. Global ALD endüstrisi market
araştırmaları 2017-2025 yılları arasında yıllık %12’lik büyüme öngörmektedir. Bu
makalede ince film biriktirme tekniklerinden biri olan atomik katman biriktirme
(ALD) yönteminde kullanılan cihazların tarihsel gelişimi ve gelişen ALD
çeşitleri incelenmiştir. Çalışma genel ALD çeşitlerinin yanında doğrudan
yazmalı (Direct write) ve rulodan ruloya (Roll to roll) gibi yeni ALD çeşitleri
hakkında bilgi vermektedir. 

References

  • Referans1 Aarik, J., Akbashev, A., Bechelany, M., Berdova, M., Cameron, D., Chekurov, N., . . . Ylivaara, O. 2014. On the Early History of ALD: Molecular Layering. 14th Int. Conf. on Atomic Layer Deposition'da sunulan bildiri. Kyoto, Japan.
  • Referans2 Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., . . . Yurkevich, O., 2017. Review Article: Recommended Reading List of Early Publications on Atomic Layer Deposition—Outcome of the “Virtual Project on the History of ALD”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 35(1), 010801-13.
  • Referans3 Backman, L. B., Rautiainen, A., Krause, A. O. I., Lindblad, M., 1998. A Novel Co/SiO2 Catalyst for Hydrogenation. Catal. Today, 43(1-2), 11-19.
  • Referans4 Beetstra, R., Lafont, U., Nijenhuis, J., Kelder, E. M., Van Ommen, J. R., 2009. Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition. Chemical Vapor Deposition, 15(7-9), 227-233.
  • Referans5 Bishal, A. K., Butt, A., K Selvaraj, S., Joshi, B., Patel, S., Huang, S., . . . Takoudis, C., 2015. Atomic Layer Deposition in Bio-Nanotechnology: A Brief Overview. Critical Reviews Biomed Eng., 43(4), 255-276.
  • Referans6 Bui, H. V., Grillo, F., Ommen, J. R., 2017. Atomic and Molecular Layer Deposition: off the Beaten Track. The Royal Society of Chemistry Chem. Commun.(53), 45-71.
  • Referans7 Carcia, P. F., McLean, R. S., Groner, M. D., Dameron, A. A., George, S. M., 2009. Gas Diffusion Ultrabarriers on Polymer Substrates Using Al2O3 Atomic Layer Deposition and SiN Plasma-enhanced Chemical Vapor Deposition. Journal of Applied Physics, 106(2), 023533-6.
  • Referans8 Delft-imp.nl, 2015. History of ALD. Erişim Tarihi: 12.05.2015. http://delft-imp.nl/technology/
  • Referans9 Drozd, V. 2016. Progress in Device from Molecular Layering to Atomic Layer Deposition Worldwide Technology. 14th. International Baltic Conference on Atomic Layer Deposition (BALD)'da sunulan bildiri. St. Petersburg, Russia.
  • Referans10 Ferguson, J. D., Weimer, A. W., George, S. M., 2000a. Atomic Layer Deposition of Al2O3 and SiO2 on BN particles Using Sequential Surface Reactions. Applied Surface Science, 162(2000), 280-292.
  • Referans11 Ferguson, J. D., Weimer, A. W., George, S. M., 2000b. Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles. Thin Solid Films, 371(1-2), 95-104.
  • Referans12 George, S. M., 2010. Atomic Layer Deposition: An Overview. Chemical Reviews, 110(1), 111-131.
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  • Referans15 Ghiraldelli, E., Pelosi, C., Gombia, E., Chiavarotti, G., Vanzetti, L., 2008. ALD growth, Thermal Treatments and Characterisation of Al2O3 Layers. Thin Solid Films, 517(1), 434-436.
  • Referans16 Goldstein, D. N., McCormick, J. A., George, S. M., 2008. Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry. Journal of Physical Chemistry C, 112(49), 19530-19539.
  • Referans17 Grandviewresearch.com, 2018. Atomic Layer Deposition (ALD) Market Size. Erişim Tarihi: 25.01.2018. https://www.grandviewresearch.com/press-release/global-atomic-layer-deposition-market
  • Referans18 Granneman, E., Fischer, P., Pierreux, D., Terhorst, H., Zagwijn, P., 2007. Batch ALD: Characteristics, Comparison with Single Wafer ALD, and Examples. Surface and Coatings Technology, 201(22), 8899-8907.
  • Referans19 Groner, M. D., Elam, J. W., Fabreguette, F. H., George, S. M., 2002. Electrical Characterization of Thin Al2O3 Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates. Thin Solid Films, 413(1-2), 186-197.
  • Referans20 Hakim, L. F., Blackson, J., George, S. M., Weimer, A. W., 2005. Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor. Chemical Vapor Deposition, 11(10), 420-425.
  • Referans21 Hakim, L. F., Portman, J. L., Casper, M. D., Weimer, A. W., 2005. Aggregation Behavior of Nanoparticles in Fluidized Beds. Powder Technology, 160(3), 149-160.
  • Referans22 Higashi, G. S., Fleming, C. G., 1989. Sequential Surface Chemical-Reaction Limited Growth of High-Quality Al2O3 Dielectrics. Applied Physics Letters, 55(19), 1963-1965.
  • Referans23 Hwang, C. S., Yoo, C. Y. 2014. Atomic Layer Deposition for Semiconductors. Springer Science+Business Media. New York.
  • Referans24 Jang, B., Kim, S. H., 2016. Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules. Korean Journal of Materials Research, 26(8), 430-437.
  • Referans25 Johnson, R. W., Hultqvist, A., Bent, S. F., 2014. A Brief Review of Atomic Layer Deposition: From Fundamentals to Applications. Materials Today, 17(5), 236-246.
  • Referans26 Jones, A. C., Hitchman, M. L. 2009. Chemical Vapour Deposition: Precursors, Processes and Applications. RSC Publising. USA.
  • Referans27 Jung, Y. S., Cavanagh, A. S., Riley, L. A., Kang, S. H., Dillon, A. C., Groner, M. D., . . . Lee, S. H., 2010. Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li-Ion Batteries. Advanced Materials, 22(19), 2172–2176.
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IMPROVEMENTS OF ATOMIC LAYER DEPOSITION (ALD) DEVICES AND TYPES

Year 2018, Volume: 6 Issue: 4, 590 - 605, 11.12.2018
https://doi.org/10.21923/jesd.392032

Abstract










The products obtained by changing the surface
properties of the materials can be given different functionalities besides
their own properties. Developments in surface technologies also provide the
development of obtain new products and manufacturing processes. The ALD method
has the potential to be successfully applied in many different application
areas. The global market research on the atomic layer deposition industry
estimated to annual growth of 12% from 2017 to 2025. In this paper the
historical developments of devices and types used in the application of ALD
method which is a types of thin film coating technique were investigated. It
gives information about new ALD types like direct write and roll to roll ALD as
well as general ALD approaches. 

References

  • Referans1 Aarik, J., Akbashev, A., Bechelany, M., Berdova, M., Cameron, D., Chekurov, N., . . . Ylivaara, O. 2014. On the Early History of ALD: Molecular Layering. 14th Int. Conf. on Atomic Layer Deposition'da sunulan bildiri. Kyoto, Japan.
  • Referans2 Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., . . . Yurkevich, O., 2017. Review Article: Recommended Reading List of Early Publications on Atomic Layer Deposition—Outcome of the “Virtual Project on the History of ALD”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 35(1), 010801-13.
  • Referans3 Backman, L. B., Rautiainen, A., Krause, A. O. I., Lindblad, M., 1998. A Novel Co/SiO2 Catalyst for Hydrogenation. Catal. Today, 43(1-2), 11-19.
  • Referans4 Beetstra, R., Lafont, U., Nijenhuis, J., Kelder, E. M., Van Ommen, J. R., 2009. Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition. Chemical Vapor Deposition, 15(7-9), 227-233.
  • Referans5 Bishal, A. K., Butt, A., K Selvaraj, S., Joshi, B., Patel, S., Huang, S., . . . Takoudis, C., 2015. Atomic Layer Deposition in Bio-Nanotechnology: A Brief Overview. Critical Reviews Biomed Eng., 43(4), 255-276.
  • Referans6 Bui, H. V., Grillo, F., Ommen, J. R., 2017. Atomic and Molecular Layer Deposition: off the Beaten Track. The Royal Society of Chemistry Chem. Commun.(53), 45-71.
  • Referans7 Carcia, P. F., McLean, R. S., Groner, M. D., Dameron, A. A., George, S. M., 2009. Gas Diffusion Ultrabarriers on Polymer Substrates Using Al2O3 Atomic Layer Deposition and SiN Plasma-enhanced Chemical Vapor Deposition. Journal of Applied Physics, 106(2), 023533-6.
  • Referans8 Delft-imp.nl, 2015. History of ALD. Erişim Tarihi: 12.05.2015. http://delft-imp.nl/technology/
  • Referans9 Drozd, V. 2016. Progress in Device from Molecular Layering to Atomic Layer Deposition Worldwide Technology. 14th. International Baltic Conference on Atomic Layer Deposition (BALD)'da sunulan bildiri. St. Petersburg, Russia.
  • Referans10 Ferguson, J. D., Weimer, A. W., George, S. M., 2000a. Atomic Layer Deposition of Al2O3 and SiO2 on BN particles Using Sequential Surface Reactions. Applied Surface Science, 162(2000), 280-292.
  • Referans11 Ferguson, J. D., Weimer, A. W., George, S. M., 2000b. Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles. Thin Solid Films, 371(1-2), 95-104.
  • Referans12 George, S. M., 2010. Atomic Layer Deposition: An Overview. Chemical Reviews, 110(1), 111-131.
  • Referans13 George, S. M., Ferguson, J. D., Weimer, A. W. 1999. U.S. Patent.
  • Referans14 George, S. M., Ott, A. W., Klaus, J. W., 1996. Surface Chemistry for Atomic Layer Growth. Journal of Physical Chemistry, 100(31), 13121-13131.
  • Referans15 Ghiraldelli, E., Pelosi, C., Gombia, E., Chiavarotti, G., Vanzetti, L., 2008. ALD growth, Thermal Treatments and Characterisation of Al2O3 Layers. Thin Solid Films, 517(1), 434-436.
  • Referans16 Goldstein, D. N., McCormick, J. A., George, S. M., 2008. Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry. Journal of Physical Chemistry C, 112(49), 19530-19539.
  • Referans17 Grandviewresearch.com, 2018. Atomic Layer Deposition (ALD) Market Size. Erişim Tarihi: 25.01.2018. https://www.grandviewresearch.com/press-release/global-atomic-layer-deposition-market
  • Referans18 Granneman, E., Fischer, P., Pierreux, D., Terhorst, H., Zagwijn, P., 2007. Batch ALD: Characteristics, Comparison with Single Wafer ALD, and Examples. Surface and Coatings Technology, 201(22), 8899-8907.
  • Referans19 Groner, M. D., Elam, J. W., Fabreguette, F. H., George, S. M., 2002. Electrical Characterization of Thin Al2O3 Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates. Thin Solid Films, 413(1-2), 186-197.
  • Referans20 Hakim, L. F., Blackson, J., George, S. M., Weimer, A. W., 2005. Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor. Chemical Vapor Deposition, 11(10), 420-425.
  • Referans21 Hakim, L. F., Portman, J. L., Casper, M. D., Weimer, A. W., 2005. Aggregation Behavior of Nanoparticles in Fluidized Beds. Powder Technology, 160(3), 149-160.
  • Referans22 Higashi, G. S., Fleming, C. G., 1989. Sequential Surface Chemical-Reaction Limited Growth of High-Quality Al2O3 Dielectrics. Applied Physics Letters, 55(19), 1963-1965.
  • Referans23 Hwang, C. S., Yoo, C. Y. 2014. Atomic Layer Deposition for Semiconductors. Springer Science+Business Media. New York.
  • Referans24 Jang, B., Kim, S. H., 2016. Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules. Korean Journal of Materials Research, 26(8), 430-437.
  • Referans25 Johnson, R. W., Hultqvist, A., Bent, S. F., 2014. A Brief Review of Atomic Layer Deposition: From Fundamentals to Applications. Materials Today, 17(5), 236-246.
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There are 81 citations in total.

Details

Primary Language Turkish
Subjects Engineering
Journal Section Review Articles
Authors

Alper Uğur 0000-0002-8310-8839

Nuran Ay 0000-0002-2228-9904

Publication Date December 11, 2018
Submission Date February 8, 2018
Acceptance Date October 4, 2018
Published in Issue Year 2018 Volume: 6 Issue: 4

Cite

APA Uğur, A., & Ay, N. (2018). ATOMİK KATMAN BİRİKTİRME (ALD) CİHAZLARI VE ÇEŞİTLERİNDEKİ GELİŞMELER. Mühendislik Bilimleri Ve Tasarım Dergisi, 6(4), 590-605. https://doi.org/10.21923/jesd.392032