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Year 2018, Volume: 1 Issue: 1, 52 - 56, 06.08.2018

Beyhan Tatar , Canan Yöney Dilek Demiroğlu

Abstract

References

  • 1] K. AL-Abdullah, Energy Procedia, 19, (2012).
  • [2] P.C. Lansåker, P. Petersson, G.A. Niklasson, C.G. Granqvist, Sol. Energy Mater.Sol. Cells, 117, (2013).
  • [3] A.L. Daltin, A. Addad, J.P. Chopart, Microelectron. Eng., 108, (2013).
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  • [6] B. Mauvernay, L. Presmanes, S. Capdeville, V.G. de Resende, E. De Grave,C. Bonningue, P. Tailhades, Thin Solid Films, 515, (2007).
  • [7] W. Peng, J. Li, B. Chen, N. Wang, G. Luo, F. Wei, Catal. Commun., 74, (2016).
  • [8] J. Yao, K. Hashimoto, A. Fujishima, Nature 355, (1992).
  • [9] C. Imawan, F. Solzbacher, H. Steffes, E. Obermeier, Sens. Actuators B, 64, (2000).
  • [10] J. K. Shin, S. M. Jeong, Y. Tak, S. H. Baeck, Research on Chemical Intermediates, 36, (2010).
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The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique

Year 2018, Volume: 1 Issue: 1, 52 - 56, 06.08.2018

Beyhan Tatar , Canan Yöney Dilek Demiroğlu

Abstract

The molybdenum trioxide MoO3 thin films were growth on
c-Si substrates by magnetron sputtering technique. The structural and
morphological properties of MoO3 thin films were investigated by XRD, RAMAN and SEM
analysis. Prior to annealing process, X-ray diffractogram indicated that MoO3 thin films vere
amorphous nature. All of the MoO3 thin films were applied three different annealing
temperature and obtained optimum annealing temperature with 300 0C. XRD patterns of annealed thin films showed that these MoO3
thin films have polycrystalline nature with 2θ
peak at 12˚,23˚, 25˚, 38˚, 55˚and 58˚ corresponding to the (020), (110), (040), (060), (112) and (081) planes.  RAMAN spectrum of the MoO3 thin films were
determined 14 Raman active peaks belong to α-phase MoO3. The surface morphology of the MoO3 thin films as
deposited has appeared to be uniform with smaller grains and exhibits a coarse
structure. Annealing of the MoO3 thin films favors growth and
agglomeration of small grains.

Keywords

MoO3 thin films Metal oxide semiconductors Surface Properties Structural Properties

References

  • 1] K. AL-Abdullah, Energy Procedia, 19, (2012).
  • [2] P.C. Lansåker, P. Petersson, G.A. Niklasson, C.G. Granqvist, Sol. Energy Mater.Sol. Cells, 117, (2013).
  • [3] A.L. Daltin, A. Addad, J.P. Chopart, Microelectron. Eng., 108, (2013).
  • [4] T. Audichon, E. Mayousse, T.W. Napporn, C. Morais, C. Comminges, K.B. Kokoh,Electrochim. Acta, 132, (2014).
  • [5] L. Boudaoud, N. Benramdane, A. Bouzidi, A. Nekerala, R. Desfeux, Optik e Int. J.Light Electron Opt., 127, (2016).
  • [6] B. Mauvernay, L. Presmanes, S. Capdeville, V.G. de Resende, E. De Grave,C. Bonningue, P. Tailhades, Thin Solid Films, 515, (2007).
  • [7] W. Peng, J. Li, B. Chen, N. Wang, G. Luo, F. Wei, Catal. Commun., 74, (2016).
  • [8] J. Yao, K. Hashimoto, A. Fujishima, Nature 355, (1992).
  • [9] C. Imawan, F. Solzbacher, H. Steffes, E. Obermeier, Sens. Actuators B, 64, (2000).
  • [10] J. K. Shin, S. M. Jeong, Y. Tak, S. H. Baeck, Research on Chemical Intermediates, 36, (2010).
  • [11] L. Seguin, M. Figlarz, R. Cavagnat, J.C. Lassegues, Spectrochimica Acta Part A, 51 (1995).
There are 11 citations in total.

Details

Primary Language English
Subjects Metrology, Applied and Industrial Physics
Journal Section Articles
Authors

Beyhan Tatar

Canan Yöney This is me

Dilek Demiroğlu This is me

Publication Date August 6, 2018
Submission Date July 25, 2018
Acceptance Date August 1, 2018
Published in Issue Year 2018 Volume: 1 Issue: 1

Cite

APA Tatar, B., Yöney, C., & Demiroğlu, D. (2018). The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique. Journal of Physical Chemistry and Functional Materials, 1(1), 52-56.
AMA Tatar B, Yöney C, Demiroğlu D. The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique. Journal of Physical Chemistry and Functional Materials. August 2018;1(1):52-56.
Chicago Tatar, Beyhan, Canan Yöney, and Dilek Demiroğlu. “The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique”. Journal of Physical Chemistry and Functional Materials 1, no. 1 (August 2018): 52-56.
EndNote Tatar B, Yöney C, Demiroğlu D (August 1, 2018) The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique. Journal of Physical Chemistry and Functional Materials 1 1 52–56.
IEEE B. Tatar, C. Yöney, and D. Demiroğlu, “The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique”, Journal of Physical Chemistry and Functional Materials, vol. 1, no. 1, pp. 52–56, 2018.
ISNAD Tatar, Beyhan et al. “The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique”. Journal of Physical Chemistry and Functional Materials 1/1 (August 2018), 52-56.
JAMA Tatar B, Yöney C, Demiroğlu D. The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique. Journal of Physical Chemistry and Functional Materials. 2018;1:52–56.
MLA Tatar, Beyhan et al. “The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique”. Journal of Physical Chemistry and Functional Materials, vol. 1, no. 1, 2018, pp. 52-56.
Vancouver Tatar B, Yöney C, Demiroğlu D. The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique. Journal of Physical Chemistry and Functional Materials. 2018;1(1):52-6.
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