TY - JOUR T1 - Single Crystal Diamond Growth by Microwave Plasma Chemical Vapor Deposition System AU - Biçer, Emre AU - Sönmezgül, Fatih AU - Baz, Zeynep PY - 2023 DA - December Y2 - 2023 JF - Uluslararası Sivas Bilim ve Teknoloji Üniversitesi Dergisi PB - Sivas Bilim ve Teknoloji Üniversitesi WT - DergiPark SN - 3023-4212 SP - 18 EP - 29 VL - 2 IS - 2 LA - en AB - This study delves into the diamond growth process on distinct substrates, namely Seed A and Seed B, fabricated using different production methods from separate companies. Seed A, employing ion implantation and the lift-off method akin to semiconductor production, stands distinct from Seed B. Preceding the growth phase, thorough chemical cleaning was administered to the substrates to mitigate potential organic or inorganic contamination from laser cutting, polishing, and surface fabrication. The diamond growth was executed utilizing the MWCVD system, where plasma was generated under 5 Torr pressure and a 500W microwave power. The investigation focused on understanding the impact of diamond growth rates under varying CH4/H2 gas ratios. Substrates were strategically placed on the molybdenum surface using "mosaic growth" methods, ensuring no gaps between them. Photoluminescence spectra for Seed A and Seed B were meticulously examined to unravel insights into their respective characteristics. Additionally, this study pioneers a novel approach, coating the molybdenum surface with AlTiN and TiN using the physical vapor deposition (PVD) method. This innovative surface modification, a first in the literature to the best of our knowledge, aims to enhance the properties and performance of the diamond growth process. The findings of this comprehensive study contribute to the evolving understanding of diamond growth dynamics on different substrates and introduce a novel surface modification technique, opening avenues for further advancements in diamond film applications. KW - Synthetic diamond KW - CVD KW - PVD CR - Koizumi, S., Nebel, C.E., Nesladek, M. 2008. Physics and applications of CVD diamond. 1st ed. Wiley VCH. ISBN 978-3-527-40801-6. CR - Nassau, K., Nassau, J. 1979. The history and present status of synthetic diamond. Journal of Crystal Growth, 46(2):157-172. Wang, X., Duan, P., Cao, Z., Liu, C., Wang, D., Peng, Y., Xu, X., Hu, X. 2019. Surface Morphology of the Interface Junction of CVD Mosaic Single-Crystal Diamond. Materials, 13(1): 91. CR - Werner, M., Locher, R. (1998). Growth and application of undoped and doped diamond films. Reports on Progress in Physics. 61(12):1665-1710. UR - https://dergipark.org.tr/tr/pub/usbtu/issue//1411850 L1 - https://dergipark.org.tr/tr/download/article-file/3628637 ER -