Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering

Soheil Mobtakeri; Ebru Senadim Tuzemen; Ali Özer; Emre Gür

doi:10.17776/csj.780730

EN

Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering

Abstract

In the present work, Gallium Oxide (Ga2O3) were deposited as thin films by radio frequency (RF) magnetron sputtering at 300 °C substrate temperature on glass substrate using Ga2O3 target with 99.99% purity. The crystalline structure, morphology, optical properties of the Gallium Oxide films were determined using X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–Visible Spectrometry, respectively. Experimental results show that annealing has an important role in the changes observed in the characterization of the Gallium Oxide thin films. All thin films produced were amorphous, except for the annealed P4-500. SEM pictures reveal the morphology of prepared Gallium Oxide thin films. The refractive index and real part of complex dielectric constant increased as the film deposition pressure increased.

Keywords

Gallium Oxide, RF magnetron sputtering, XRD, SEM, UV–Visible Spectrometry

References

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Details

Primary Language

English

Subjects

Classical Physics (Other)

Journal Section

Research Article

Authors

Soheil Mobtakeri This is me
0000-0003-3089-6162
Türkiye

Ebru Senadim Tuzemen ^*
0000-0001-9166-7422
Türkiye

Ali Özer
0000-0002-4207-8207
Türkiye

Emre Gür This is me
0000-0002-3606-2751
Türkiye

Publication Date

December 29, 2020

Submission Date

August 14, 2020

Acceptance Date

December 18, 2020

Published in Issue

Year 2020 Volume: 41 Number: 4

DOI

https://doi.org/10.17776/csj.780730

IZ

https://izlik.org/JA87JR92WP

APA

Mobtakeri, S., Senadim Tuzemen, E., Özer, A., & Gür, E. (2020). Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal, 41(4), 929-937. https://doi.org/10.17776/csj.780730

AMA

1.Mobtakeri S, Senadim Tuzemen E, Özer A, Gür E. Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering. CSJ. 2020;41(4):929-937. doi:10.17776/csj.780730

Chicago

Mobtakeri, Soheil, Ebru Senadim Tuzemen, Ali Özer, and Emre Gür. 2020. “Characterization of Gallium Oxide Glass Thin Films Grown by RF Magnetron Sputtering”. Cumhuriyet Science Journal 41 (4): 929-37. https://doi.org/10.17776/csj.780730.

EndNote

Mobtakeri S, Senadim Tuzemen E, Özer A, Gür E (December 1, 2020) Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal 41 4 929–937.

IEEE

[1]S. Mobtakeri, E. Senadim Tuzemen, A. Özer, and E. Gür, “Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering”, CSJ, vol. 41, no. 4, pp. 929–937, Dec. 2020, doi: 10.17776/csj.780730.

ISNAD

Mobtakeri, Soheil - Senadim Tuzemen, Ebru - Özer, Ali - Gür, Emre. “Characterization of Gallium Oxide Glass Thin Films Grown by RF Magnetron Sputtering”. Cumhuriyet Science Journal 41/4 (December 1, 2020): 929-937. https://doi.org/10.17776/csj.780730.

JAMA

1.Mobtakeri S, Senadim Tuzemen E, Özer A, Gür E. Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering. CSJ. 2020;41:929–937.

MLA

Mobtakeri, Soheil, et al. “Characterization of Gallium Oxide Glass Thin Films Grown by RF Magnetron Sputtering”. Cumhuriyet Science Journal, vol. 41, no. 4, Dec. 2020, pp. 929-37, doi:10.17776/csj.780730.

Vancouver

1.Soheil Mobtakeri, Ebru Senadim Tuzemen, Ali Özer, Emre Gür. Characterization of Gallium Oxide/glass thin films grown by RF magnetron sputtering. CSJ. 2020 Dec. 1;41(4):929-37. doi:10.17776/csj.780730