Research Article
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THE CHANGE OF LINE RATIO OF OPTICAL EMISSION SPECTRA WITH TIME FOR INDUCTIVE RADIO FREQUENCY ARGON DISCHARGE AT LOW PRESSURE

Year 2019, Volume: 20 , 55 - 60, 16.12.2019
https://doi.org/10.18038/estubtda.636565

Abstract

In this study, inductive radio-frequency (RF) argon
(Ar) discharge and afterglow downstream discharge at low pressure were
investigated with optical emission spectroscopy (OES). Spectral lines recorded
with OES measurements were detected in the wavelength range of 650-900 nm. For
all measurements, a spectrum line that remained at approximately the same value
was taken as the value of the reference wavelength throughout the study. The
changes in the optical emission spectrum ratios of the inductive RF Ar
discharge and the afterglow downstream discharge with respect to time were
compared. As a result, it was reported that some transitions for both regions
were to be increased in time. The transitions in time for some wavelengths (738.39,
751.47, 772.42, 801.48, 810.37 and 842.46 nm) have been approximately improved
between 20% and 34% for discharge zone. Also, it can be increased for
wavelength of 801.48 nm in afterglow downstream discharge region (32.55%).

Supporting Institution

Eskişehir Technical University

Project Number

19ADP154

Thanks

We are grateful to Eskişehir Technical University via Research Project No: 19ADP154.

References

  • Bogaerts A, Neyts E, Gijbels R, van der Mullen J. Gas discharge plasmas and their applications. Spectrochim. Acta Part B 2002; 57: 609–658.
  • Descoeudres A, Hollenstein C, Demellayer R, Wälder G. Optical emission spectroscopy of electrical discharge machining plasma. Journal of Materials Processing Tech. 2004; 149: 184-190.
  • Canal GP, Luna H, Galv ́ao RMO, Castell R. An approach to a non-LTE Saha equation based on the Druyvesteyn energy distribution function: a comparison between the electron temperature obtained from OES and the Langmuir probe analysis. J. Phys. D: Appl. Phys. 2009; 42: 135202 (6pp).
  • Roth JR Industrial Plasma Engineering Volume 1: Principles, London: IOP Publishing Ltd, 1995.
  • Donnelly VM. Plasma electron temperatures and electron energy distributions measured by trace rare gases optical emission spectroscopy. J. Phys. D: Appl. Phys. 2004; 37: R217-R236.
  • Tanışlı M, Rafatov İ, Şahin N, Mertadam S, Demir S. Spectroscopic study and numerical simulation of low-pressure radio-frequency capacitive discharge with argon downstream. Can. J. Phys. 2017; 95: 190-200.
  • https://physics.nist.gov/PhysRefData/ASD/lines_form.html (Available: 01.08.2019)
  • Musa G, Ciobotaru CL, Chiru P, Baltog A. The M-effect in argon-hydrogen gas mixtures. J. Opt. Adv. Materials 2004; 6: 459-464.
  • Tanisli M and Sahin N. Optical characteristics for capacitively and inductively radio frequency discharge and post-discharge of helium. Phys. Plas. 2016; 23: 013513.
  • Luo D, Ma D, He Y, Li X, Wang S, Duan Y. Needle electrode-based microplasma formed in a cavity chamber for optical emission spectrometric detection of volatile organic compounds through a filter paper sampling. Microchemical Journal 2017; 130: 33-39.
  • Siepa S, Danko S, Tsankov TV, Mussenbrock T, Czarnetzki U. On the OES line-ratio technique in argon and argon-containing plasmas. J. Phys. D: Appl. Phys. 2014; 47: 445201 (16pp).
Year 2019, Volume: 20 , 55 - 60, 16.12.2019
https://doi.org/10.18038/estubtda.636565

Abstract

Project Number

19ADP154

References

  • Bogaerts A, Neyts E, Gijbels R, van der Mullen J. Gas discharge plasmas and their applications. Spectrochim. Acta Part B 2002; 57: 609–658.
  • Descoeudres A, Hollenstein C, Demellayer R, Wälder G. Optical emission spectroscopy of electrical discharge machining plasma. Journal of Materials Processing Tech. 2004; 149: 184-190.
  • Canal GP, Luna H, Galv ́ao RMO, Castell R. An approach to a non-LTE Saha equation based on the Druyvesteyn energy distribution function: a comparison between the electron temperature obtained from OES and the Langmuir probe analysis. J. Phys. D: Appl. Phys. 2009; 42: 135202 (6pp).
  • Roth JR Industrial Plasma Engineering Volume 1: Principles, London: IOP Publishing Ltd, 1995.
  • Donnelly VM. Plasma electron temperatures and electron energy distributions measured by trace rare gases optical emission spectroscopy. J. Phys. D: Appl. Phys. 2004; 37: R217-R236.
  • Tanışlı M, Rafatov İ, Şahin N, Mertadam S, Demir S. Spectroscopic study and numerical simulation of low-pressure radio-frequency capacitive discharge with argon downstream. Can. J. Phys. 2017; 95: 190-200.
  • https://physics.nist.gov/PhysRefData/ASD/lines_form.html (Available: 01.08.2019)
  • Musa G, Ciobotaru CL, Chiru P, Baltog A. The M-effect in argon-hydrogen gas mixtures. J. Opt. Adv. Materials 2004; 6: 459-464.
  • Tanisli M and Sahin N. Optical characteristics for capacitively and inductively radio frequency discharge and post-discharge of helium. Phys. Plas. 2016; 23: 013513.
  • Luo D, Ma D, He Y, Li X, Wang S, Duan Y. Needle electrode-based microplasma formed in a cavity chamber for optical emission spectrometric detection of volatile organic compounds through a filter paper sampling. Microchemical Journal 2017; 130: 33-39.
  • Siepa S, Danko S, Tsankov TV, Mussenbrock T, Czarnetzki U. On the OES line-ratio technique in argon and argon-containing plasmas. J. Phys. D: Appl. Phys. 2014; 47: 445201 (16pp).
There are 11 citations in total.

Details

Primary Language English
Journal Section Articles
Authors

Murat Tanışlı 0000-0001-7578-7344

Project Number 19ADP154
Publication Date December 16, 2019
Published in Issue Year 2019 Volume: 20

Cite

AMA Tanışlı M. THE CHANGE OF LINE RATIO OF OPTICAL EMISSION SPECTRA WITH TIME FOR INDUCTIVE RADIO FREQUENCY ARGON DISCHARGE AT LOW PRESSURE. Estuscience - Se. December 2019;20:55-60. doi:10.18038/estubtda.636565