Optical Properties of AlGaN/GaN HEMT Structures
Abstract
This study investigated the optical properties of AlGaN/GaN/sapphire high-electron-mobility transistor (HEMT) structures. The AlGaN/GaN/sapphire HEMT structures were grown by metal-organic chemical vapour deposition (MOCVD). The aim of this study was to determine the optical properties, layer thicknesses, and band gap energies of the buffer layers. The Swanepoel envelope method was employed to calculate the refractive index, layer thickness, absorption coefficient, and extinction coefficient. These parameters were obtained for the transparent region as well as the weak- and medium-absorption regions. The Tauc method, together with the Kubelka–Munk method, was used to determine the optical band gap energy of the AlGaN layer.
Keywords
References
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Details
Primary Language
English
Subjects
Condensed Matter Physics (Other)
Journal Section
Research Article
Authors
Yunus Baş
0009-0000-5043-3873
Türkiye
Orkun Sarıarslan
0009-0003-9852-5752
Türkiye
Sabit Korcak
0000-0003-1140-6391
Türkiye
Publication Date
June 30, 2026
Submission Date
April 3, 2026
Acceptance Date
June 9, 2026
Published in Issue
Year 2026 Volume: 13 Number: 2