EFFECTS of LOW REACTION RATE on ZNO THIN FILMS PRODUCED by a CHEMICAL BATH DEPOSITION METHOD

Year 2022, Issue: 050, 124 - 136, 30.09.2022

Metehan Önal , Barış Altıokka

Abstract

In the presented study, while ZnO thin films were deposited onto glass substrates, chemical bath deposition method was used and Na2S2O3 was used as an inhibitor to reduce the reaction rate. Four different samples were produced using 0, 4, 8 and 16mM Na2S2O3, respectively. The images obtained from the scanning electron microscope showed that the amount of nano flowers on the film surfaces decreased due to the increase in the amount of inhibitor. The X-ray diffraction results were consistent with the ASTM card and showed that all the films were crystallized in a hexagonal structure. UV measurements showed that the absorbance value of the sample obtained without the use of inhibitor was up to four times higher than the other samples. It was observed that the energy band gaps of the films increased up to 4.24 eV depending on the amount of inhibitor. Visual analysis showed that all films adhered very well to the glass surface.

Keywords

ZnO, Thin film, Chemical bath deposition, İnhibitor

Supporting Institution

Bilecik Şeyh Edebali Üniversitesi

Project Number

2020-02.BŞEÜ.11-01

Thanks

The authors thank the Scientific Research Projects Coordinatorship of Bilecik Şeyh Edebali University for their support for the project titled Production of ZnO Films by Chemical Deposition Method, numbered 2020-02.BŞEÜ.11-01.

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