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Yıl 2023, Cilt: 41 Sayı: 1, 84 - 92, 14.03.2023

Öz

Dielectrical parameters and relaxation of Al/NFT/p-Si schottky diode with frequency dependence

Yıl 2023, Cilt: 41 Sayı: 1, 84 - 92, 14.03.2023

Öz

The fabricated Al/ Naphthalimide /p-Si Schottky diode’s dielectrical parameters and series resistance effect have been investigated by using the DC and AC measurements. W e have developed a facile interface structure that consisted of double-layer films in order to investigate the capacitance volume and series resistance effect through the device. The organic interlayer with little nanometer thickness between electrode and inorganic semiconductor drastically reduce the series resistance at the interface. The dielectric parameters have increased with decreasing frequency. Interestingly, the value of ε´ (≈3) even at 1 kHz shows that the prepared naphthalimide (with Thiophene property) nano-interlayer can provide more charges or energy storage ability and so it can be used instead of traditional interfacial layers.

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Ayrıntılar

Birincil Dil İngilizce
Konular Yazılım Mimarisi
Bölüm Research Articles
Yazarlar

Emine Karagöz Bu kişi benim 0000-0001-5605-2932

Songül Fiat Varol Bu kişi benim 0000-0001-7751-0103

Serkan Sayın Bu kişi benim 0000-0003-0518-3208

Ziya Merdan Bu kişi benim 0000-0001-8708-8583

Yayımlanma Tarihi 14 Mart 2023
Gönderilme Tarihi 16 Nisan 2021
Yayımlandığı Sayı Yıl 2023 Cilt: 41 Sayı: 1

Kaynak Göster

Vancouver Karagöz E, Fiat Varol S, Sayın S, Merdan Z. Dielectrical parameters and relaxation of Al/NFT/p-Si schottky diode with frequency dependence. SIGMA. 2023;41(1):84-92.

IMPORTANT NOTE: JOURNAL SUBMISSION LINK https://eds.yildiz.edu.tr/sigma/