INVESTIGATION OF STRUCTURAL, OPTICAL, AND ELECTRICAL PROPERTIES OF ITO FILMS DEPOSITED AT DIFFERENT PLASMA POWERS: ENHANCED PERFORMANCE AND EFFICIENCY IN SHJ SOLAR CELLS

Abstract

This article presents an investigation into the structural, optical, and electrical properties of Indium Tin Oxide (ITO) films that were deposited utilizing various plasma powers. The transmittance values in the visible region were measured, revealing that the ITO film deposited at 2050 W exhibited the highest transmittance (81%). Additionally, the sheet resistance values of all films were analyzed, indicating that the ITO film deposited at 2050 W had the lowest sheet resistance (64.9 Ω/sq). By means of XRD analysis, the structural properties of the films were meticulously scrutinized, and the distinctive diffraction peaks associated with the ITO films were successfully identified. Notably, the ITO film deposited at 2050 W demonstrated superior performance compared to the other films deposited using various plasma powers. Finally, we report a noteworthy efficiency of 17.03% achieved in the SHJ solar cell fabricated with the ITO film deposited at 2050 W on a 5x5 cm2 n-type Si substrate.

Keywords

• Transparent conductive oxide (TCO)
• Indium Tin Oxide (ITO)
• DC magnetron sputtering
• Sheet resistance
• Optical transmittance

References

1. C. Battaglia, A. Cuevas, and S. de Wolf, “High-efficiency crystalline silicon solar cells: status and perspectives,” Energy Environ Sci, vol. 9, no. 5, pp. 1552–1576, 2016, doi: 10.1039/C5EE03380B.
2. S. Q. Hussain et al., “Highly transparent RF magnetron-sputtered indium tin oxide films for a-Si:H/c-Si heterojunction solar cells amorphous/crystalline silicon,” Mater Sci Semicond Process, vol. 24, pp. 225–230, 2014, doi: https://doi.org/10.1016/j.mssp.2014.02.044.
3. M. Taguchi, “Review—Development History of High Efficiency Silicon Heterojunction Solar Cell: From Discovery to Practical Use,” ECS Journal of Solid State Science and Technology, vol. 10, no. 2, p. 025002, 2021, doi: 10.1149/2162-8777/abdfb6.
4. M. A. Green, E. D. Dunlop, J. Hohl-Ebinger, M. Yoshita, N. Kopidakis, and A. W. Y. Ho-Baillie, “Solar cell efficiency tables (Version 55),” Progress in Photovoltaics: Research and Applications, vol. 28, no. 1, pp. 3–15, Jan. 2020, doi: https://doi.org/10.1002/pip.3228.
5. S. de Wolf, A. Descoeudres, Z. C. Holman, and C. Ballif, “High-efficiency Silicon Heterojunction Solar Cells: A Review,” Green, vol. 2, no. 1, pp. 7–24, 2012, doi: doi:10.1515/green-2011-0018.
6. V. Singh, C. K. Suman, and S. Kumar, “Indium Tin Oxide (ITO) films on flexible substrates for organic light emitting diodes,” in Proc. of ASID, 2006, p. 388.
7. B. Walker, A. K. Pradhan, and B. Xiao, “Low temperature fabrication of high performance ZnO thin film transistors with high-k dielectrics,” Solid State Electron, vol. 111, pp. 58–61, 2015, doi: https://doi.org/10.1016/j.sse.2015.05.004.
8. Y. Zhang et al., “Flexible transparent high-voltage diodes for energy management in wearable electronics,” Nano Energy, vol. 40, pp. 289–299, 2017, doi: https://doi.org/10.1016/j.nanoen.2017.08.025.

9. N. Cheng, Y. Shao, J. Liu, and X. Sun, “Electrocatalysts by atomic layer deposition for fuel cell applications,” Nano Energy, vol. 29, pp. 220–242, 2016, doi: https://doi.org/10.1016/j.nanoen.2016.01.016.
10. B. Yan, G. Yue, J. M. Owens, J. Yang, and S. Guha, “Light-induced metastability in hydrogenated nanocrystalline silicon solar cells,” Appl Phys Lett, vol. 85, no. 11, pp. 1925–1927, Sep. 2004, doi: 10.1063/1.1790072.
11. C. G. Granqvist, “Transparent conductors as solar energy materials: A panoramic review,” Solar Energy Materials and Solar Cells, vol. 91, no. 17, pp. 1529–1598, 2007, doi: https://doi.org/10.1016/j.solmat.2007.04.031.
12. Y.-H. Tak, K.-B. Kim, H.-G. Park, K.-H. Lee, and J.-R. Lee, “Criteria for ITO (indium–tin-oxide) thin film as the bottom electrode of an organic light emitting diode,” Thin Solid Films, vol. 411, no. 1, pp. 12–16, 2002, doi: https://doi.org/10.1016/S0040-6090(02)00165-7.
13. M. K. M. Ali, K. Ibrahim, O. S. Hamad, M. H. Eisa, M. G. Faraj, and F. Azhari, “Deposited indium tin oxide (ITO) thin films by dc-magnetron sputtering on polyethylene terephthalate substrate (PET),” Rom. J. Phys, vol. 56, no. 5–6, pp. 730–741, 2011.
14. C. S. Moon and J. G. Han, “Low temperature synthesis of ITO thin film on polymer in Ar/H2 plasma by pulsed DC magnetron sputtering,” Thin Solid Films, vol. 516, no. 19, pp. 6560–6564, 2008, doi: https://doi.org/10.1016/j.tsf.2007.11.028.
15. S. Laux, N. Kaiser, A. Zöller, R. Götzelmann, H. Lauth, and H. Bernitzki, “Room-temperature deposition of indium tin oxide thin films with plasma ion-assisted evaporation,” Thin Solid Films, vol. 335, no. 1, pp. 1–5, 1998, doi: https://doi.org/10.1016/S0040-6090(98)00861-X.
16. D. C. Paine, T. Whitson, D. Janiac, R. Beresford, C. O. Yang, and B. Lewis, “A study of low temperature crystallization of amorphous thin film indium–tin–oxide,” J Appl Phys, vol. 85, no. 12, pp. 8445–8450, May 1999, doi: 10.1063/1.370695.
17. T. Karasawa and Y. Miyata, “Electrical and optical properties of indium tin oxide thin films deposited on unheated substrates by d.c. reactive sputtering,” Thin Solid Films, vol. 223, no. 1, pp. 135–139, 1993, doi: https://doi.org/10.1016/0040-6090(93)90737-A.
18. L. Meng and M. P. dos Santos, “Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature,” Thin Solid Films, vol. 322, no. 1, pp. 56–62, 1998, doi: https://doi.org/10.1016/S0040-6090(97)00939-5.
19. D. Raoufi, A. Kiasatpour, H. R. Fallah, and A. S. H. Rozatian, “Surface characterization and microstructure of ITO thin films at different annealing temperatures,” Appl Surf Sci, vol. 253, no. 23, pp. 9085–9090, 2007, doi: https://doi.org/10.1016/j.apsusc.2007.05.032.
20. L. Raniero et al., “Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings,” Thin Solid Films, vol. 511–512, pp. 295–298, 2006, doi: https://doi.org/10.1016/j.tsf.2005.12.057.
21. S. M. Kim, H.-W. Choi, K.-H. Kim, S.-J. Park, and H.-H. Yoon, “Preparation of ITO and IZO thin films by using the facing targets sputtering (FTS) method,” J. Korean Phys. Soc, vol. 55, no. 5, pp. 1996–2001, 2009, [Online]. Available: http://dx.doi.org/10.3938/jkps.55.1996
22. T. J. Burke and C. Segrin, “Examining Diet- and Exercise-Related Communication in Romantic Relationships: Associations With Health Behaviors,” Health Commun, vol. 29, no. 9, pp. 877–887, Oct. 2014, doi: 10.1080/10410236.2013.811625.
23. J. Montero, C. Guillén, and J. Herrero, “AZO/ATO double-layered transparent conducting electrode: A thermal stability study,” Thin Solid Films, vol. 519, no. 21, pp. 7564–7567, 2011, doi: https://doi.org/10.1016/j.tsf.2010.12.103.
24. H. Park, J. Lee, H. Kim, D. Kim, J. Raja, and J. Yi, “Influence of SnO2:F/ZnO:Al bi-layer as a front electrode on the properties of p-i-n amorphous silicon based thin film solar cells,” Appl Phys Lett, vol. 102, no. 19, p. 191602, May 2013, doi: 10.1063/1.4807127.
25. M. P. Taylor et al., “The Remarkable Thermal Stability of Amorphous In-Zn-O Transparent Conductors,” Adv Funct Mater, vol. 18, no. 20, pp. 3169–3178, Oct. 2008, doi: https://doi.org/10.1002/adfm.200700604.
26. R. Riveros, E. Romero, and G. Gordillo, “Synthesis and characterization of highly transparent and conductive SnO2: F and In2O3: Sn thin films deposited by spray pyrolysis,” Brazilian journal of physics, vol. 36, pp. 1042–1045, 2006.
27. A. Ambrosini, A. Duarte, K. R. Poeppelmeier, M. Lane, C. R. Kannewurf, and T. O. Mason, “Electrical, Optical, and Structural Properties of Tin-Doped In2O3–M2O3 Solid Solutions (M=Y, Sc),” J Solid State Chem, vol. 153, no. 1, pp. 41–47, 2000, doi: https://doi.org/10.1006/jssc.2000.8737.
28. J. M. Gaskell and D. W. Sheel, “Deposition of indium tin oxide by atmospheric pressure chemical vapour deposition,” Thin Solid Films, vol. 520, no. 12, pp. 4110–4113, 2012, doi: https://doi.org/10.1016/j.tsf.2011.04.191.
29. M. J. Alam and D. C. Cameron, “Optical and electrical properties of transparent conductive ITO thin films deposited by sol–gel process,” Thin Solid Films, vol. 377–378, pp. 455–459, 2000, doi: https://doi.org/10.1016/S0040-6090(00)01369-9.
30. A. H. Sofi, M. A. Shah, and K. Asokan, “Structural, Optical and Electrical Properties of ITO Thin Films,” J Electron Mater, vol. 47, no. 2, pp. 1344–1352, 2018, doi: 10.1007/s11664-017-5915-9.
31. D.-W. Kim and D.-W. Park, “Preparation of indium tin oxide (ITO) nanoparticles by DC arc plasma,” Surf Coat Technol, vol. 205, pp. S201–S205, 2010, doi: https://doi.org/10.1016/j.surfcoat.2010.07.078.
32. A. H. Sofi and M. A. Shah, “Structural and electrical properties of copper doped In2O3 nanostructures prepared by citrate gel processes,” Mater Res Express, vol. 6, no. 4, p. 045039, 2019, doi: 10.1088/2053-1591/aafc0b.
33. S.-Y. Lien, “Characterization and optimization of ITO thin films for application in heterojunction silicon solar cells,” Thin Solid Films, vol. 518, no. 21, Supplement, pp. S10–S13, 2010, doi: https://doi.org/10.1016/j.tsf.2010.03.023.
34. T. Ogi, D. Hidayat, F. Iskandar, A. Purwanto, and K. Okuyama, “Direct synthesis of highly crystalline transparent conducting oxide nanoparticles by low pressure spray pyrolysis,” Advanced Powder Technology, vol. 20, no. 2, pp. 203–209, 2009, doi: https://doi.org/10.1016/j.apt.2008.09.002.
35. W.-F. Wu, B.-S. Chiou, and S.-T. Hsieh, “Effect of sputtering power on the structural and optical properties of RF magnetron sputtered ITO films,” vol. 9, no. 6, pp. 1242–1249, Jun. 1994, doi: https://doi.org/10.1088/0268-1242/9/6/014.
36. A. Mansingh and V. Kumar, “Properties of RF-sputtered ITO films on substrates above and below the virtual source,” vol. 22, no. 3, pp. 455–457, Mar. 1989, doi: https://doi.org/10.1088/0022-3727/22/3/013.
37. Tauc, "Optical properties and electronic structure of amorphous Ge and Si," Materials research bulletin, vol. 3, no. 1 second. 37-46, 1968, doi: https://doi.org/10.1016/0025-5408(68)90023-8