Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System

Mr Ramavathu Ramesh Naik; Dr Ramakrishna Reddy Donapati; Dr Krishnanaik Vankdoth

doi:10.64808/engineeringperspective.1771169

Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System

Abstract

This paper presents an enhanced ONOFIC (ON/OFF Isolation Control) nano-domino logic framework implemented using 32 nm FinFET and CNTFET technologies for ultra-low leakage VLSI systems. The proposed ONOFIC technique employs feedback-controlled transistors to dynamically isolate leakage paths in the pull-up and pull-down networks, significantly reducing subthreshold leakage while preserving the high-speed characteristics of domino logic. Four ONOFIC-based architectures—Pull-Down, Dual-ONOFIC, Pull-Up, and Sandwiched ONOFIC—are designed and evaluated to investigate the trade-offs between leakage reduction, delay, and power consumption. In addition, an AI-assisted optimization approach is explored to automatically tune circuit parameters such as feedback bias and device sizing for improved leakage control and energy efficiency. HSPICE simulations using realistic FinFET and CNTFET models demonstrate up to 78% leakage reduction, approximately 45% total power savings, and 50–55% improvement in Power-Delay Product (PDP) compared with conventional domino logic techniques. The AI-optimized configurations further enhance leakage suppression and robustness under process-voltage-temperature (PVT) variations. These results confirm that combining ONOFIC-based leakage control with AI-assisted optimization provides an effective methodology for designing energy-efficient nano-scale VLSI systems suitable for modern low-power applications.

Keywords

Supporting Institution

Chaitanya Deemed to be University, Hyderabad, Telangana, India

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Details

Primary Language

English

Subjects

Circuits and Systems, Engineering Electromagnetics

Journal Section

Research Article

Authors

Mr Ramavathu Ramesh Naik
0009-0009-1583-1791
India

Dr Ramakrishna Reddy Donapati
0009-0000-9177-8093
India

Dr Krishnanaik Vankdoth ^*
0009-0008-9425-5069
India

Publication Date

March 15, 2026

Submission Date

September 5, 2025

Acceptance Date

March 5, 2026

Published in Issue

Year 2026 Volume: 6 Number: 2

DOI

https://doi.org/10.64808/engineeringperspective.1771169

IZ

https://izlik.org/JA44JJ93LW

Cite

RIS / Bibtex

APA

Naik, M. R. R., Donapati, D. R. R., & Vankdoth, D. K. (2026). Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System. Engineering Perspective, 6(2), 222-232. https://doi.org/10.64808/engineeringperspective.1771169

AMA

1.Naik MRR, Donapati DRR, Vankdoth DK. Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System. engineeringperspective. 2026;6(2):222-232. doi:10.64808/engineeringperspective.1771169

Chicago

Naik, Mr Ramavathu Ramesh, Dr Ramakrishna Reddy Donapati, and Dr Krishnanaik Vankdoth. 2026. “Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage With AI-Assisted Optimization in 32 Nm VLSI System”. Engineering Perspective 6 (2): 222-32. https://doi.org/10.64808/engineeringperspective.1771169.

EndNote

Naik MRR, Donapati DRR, Vankdoth DK (March 1, 2026) Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System. Engineering Perspective 6 2 222–232.

IEEE

[1]M. R. R. Naik, D. R. R. Donapati, and D. K. Vankdoth, “Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System”, engineeringperspective, vol. 6, no. 2, pp. 222–232, Mar. 2026, doi: 10.64808/engineeringperspective.1771169.

ISNAD

Naik, Mr Ramavathu Ramesh - Donapati, Dr Ramakrishna Reddy - Vankdoth, Dr Krishnanaik. “Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage With AI-Assisted Optimization in 32 Nm VLSI System”. Engineering Perspective 6/2 (March 1, 2026): 222-232. https://doi.org/10.64808/engineeringperspective.1771169.

JAMA

1.Naik MRR, Donapati DRR, Vankdoth DK. Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System. engineeringperspective. 2026;6:222–232.

MLA

Naik, Mr Ramavathu Ramesh, et al. “Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage With AI-Assisted Optimization in 32 Nm VLSI System”. Engineering Perspective, vol. 6, no. 2, Mar. 2026, pp. 222-3, doi:10.64808/engineeringperspective.1771169.

Vancouver

1.Mr Ramavathu Ramesh Naik, Dr Ramakrishna Reddy Donapati, Dr Krishnanaik Vankdoth. Enhanced ONOFIC-Controlled Nano-Domino Logic Using FinFET and CNTFET Devices for Ultra-Low Leakage with AI-Assisted Optimization in 32 nm VLSI System. engineeringperspective. 2026 Mar. 1;6(2):222-3. doi:10.64808/engineeringperspective.1771169