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Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence

Year 2009, Volume: 1 Issue: 4, 40 - 50, 01.12.2009

S. Helhel

Abstract

Axial density profiles of Confined Capacitively Coupled Plasma (CCCP) are measured for different pressure and power levels with a microwave interferometer. Abel inversion is used to deduce radial density profiles, which show that density diffuses from center to the quartz tube walls and indicate different density profiles depending on the pressure and power. The preheat like potential drop from center to close to the boundary edge is approximately twice the electron temperature, while the density drops approximately five to eight times

Keywords

Plasma density Microwave interferometer Confined Capacitively Coupled Plasma Pre-sheath

References

  • Makoto Sekine, Study for Plasma Etching of dielectric film in semiconductor device manufacturing. Review of ASET Project, Pure Appl. Chem., V: 74, No:3, pp. 381–395, 2002.
  • Y.J. Lee, K.N. Kim, B.K. Song, G.Y. Yeom, Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications, Materials Science in Semiconductor Processing 5 (2003) 419–423.
  • E. Kır , L. Oksuz, S. Helhel, Preparation of Poly(2-chloroaniline) Membrane and Plasma Surface Modification, Applied Surface Science, xxx (2005) xxxx, Received 26 February 2005, Accepted 18 May 2005 - APSUSC 12915 1-6 (In Press).
  • B. Chapman, Glow Discharge Processes, Wiley, New York, (1980)
  • J.C. Cecci, Lecture Notes for the course ‘Production and Diagnostic of Process plasma’, (Princeton Scientific Consultant, Inc, NJ, November 1984.
  • B.E. Gilchrist, S.G. Ohler, A.D. Gallimore, Flexible microwave System to measure the electron number density and quantify the communications impact of the electric thruster plumes, Rev. Sci. Instruments, 68(2) February (1997).
  • Xiao Feng Ma, Tatsuoki Takeda, Asymmetric Abel Inversion by Neural network for reconstruction of plasma density distribution, Nuclear Instruments and Methods in Physics Research, A 492 178-189 (2002).
  • P.Tomassini, A.Giulietti, A generalization of Abel inversion to non-axisymmetric density distribution, Optics Communication, 199 143-148 (2001).
  • M. J. Buie, J. T. P. Pender, J. P. Hollowat, T. Vincent,P. L. G. Ventzek, and M. L. Brake, Abel’s Inversion Applied to Experimental Spectroscopic Data with off Axis Peaks, J. Quant. Spamw. Radiat. Transfer Vol. 55, No. 2, pp. Z-243, (1996).
  • Hualin Ruan, Boanian Wan, A new Method for Asymmetrical Inversion Using FourierBessel Expansions, International Journal of Infrared and Millimeter Waves, Vol.21 No:12 (2000).
  • Ch Lukas, M Muller, V Schulz-von der Gathen and H F Dobele, Axially resolved electron density distribution in an RF excited parallel plate plasma reactor by 1 mm MWI, Plasma Sources Sci. Technol. 8 94–99. Printed in the UK (1999).
  • S. Helhel, L. Oksuz, B. Ellingboe and C. Gaman, Plasma Density Measurements of Confined Capacitively Coupled Plasma by Microwave Interferometer and Ion Energy Distribution Function Methods, Plasma Sources Science and Technology, (Submitted at February22, 2005, Reference No. NH0855).
  • K.U. Riemann, Phys. Fluids B 4, 2693 (1992)
  • J. Koo, N.Y. Babaeva, H.C. Kim, O.V. Manuilenko and J.W.Shon, Simulation of Capacitively Coupled Single and Dual Frequency RF Discharges, IEEE Transactions on Plasma Science, Vol 32, No:1, pp.47-53, February 2004.
  • Francis F.Chen, Introduction to Plasma Physics and Controlled Fussion, Second Eddition,pp:75, 1984 Plenum Press, NY&London.
  • L. Oksuz and N Hershkowitz PRL,89(14):art.no.145001 September 30 (2002).
  • L. Oksuz and N. Hershkowitz Plasma Sources Sci. and Tech. Vol 14 No 1 p 201 (2005)
  • Oksuz L. and Hershkowitz N. Plasma Sources Sci. and Tech. 13 263-271 (2004).
  • Deborah O’Connell, Investigations of high voltage plasma boundary sheaths in radiofrequency discharges operated with multiple frequencies, Ph.D. Thesis, Dublin City University, School of Physics – PRL, 13th July 2004.
  • Michael A. Lieberman and Allan J. Lichtenberg, principles of Plasma discahrges and Material processing, John wiley and Sons Inc, 1994.

Year 2009, Volume: 1 Issue: 4, 40 - 50, 01.12.2009

S. Helhel

Abstract

References

  • Makoto Sekine, Study for Plasma Etching of dielectric film in semiconductor device manufacturing. Review of ASET Project, Pure Appl. Chem., V: 74, No:3, pp. 381–395, 2002.
  • Y.J. Lee, K.N. Kim, B.K. Song, G.Y. Yeom, Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications, Materials Science in Semiconductor Processing 5 (2003) 419–423.
  • E. Kır , L. Oksuz, S. Helhel, Preparation of Poly(2-chloroaniline) Membrane and Plasma Surface Modification, Applied Surface Science, xxx (2005) xxxx, Received 26 February 2005, Accepted 18 May 2005 - APSUSC 12915 1-6 (In Press).
  • B. Chapman, Glow Discharge Processes, Wiley, New York, (1980)
  • J.C. Cecci, Lecture Notes for the course ‘Production and Diagnostic of Process plasma’, (Princeton Scientific Consultant, Inc, NJ, November 1984.
  • B.E. Gilchrist, S.G. Ohler, A.D. Gallimore, Flexible microwave System to measure the electron number density and quantify the communications impact of the electric thruster plumes, Rev. Sci. Instruments, 68(2) February (1997).
  • Xiao Feng Ma, Tatsuoki Takeda, Asymmetric Abel Inversion by Neural network for reconstruction of plasma density distribution, Nuclear Instruments and Methods in Physics Research, A 492 178-189 (2002).
  • P.Tomassini, A.Giulietti, A generalization of Abel inversion to non-axisymmetric density distribution, Optics Communication, 199 143-148 (2001).
  • M. J. Buie, J. T. P. Pender, J. P. Hollowat, T. Vincent,P. L. G. Ventzek, and M. L. Brake, Abel’s Inversion Applied to Experimental Spectroscopic Data with off Axis Peaks, J. Quant. Spamw. Radiat. Transfer Vol. 55, No. 2, pp. Z-243, (1996).
  • Hualin Ruan, Boanian Wan, A new Method for Asymmetrical Inversion Using FourierBessel Expansions, International Journal of Infrared and Millimeter Waves, Vol.21 No:12 (2000).
  • Ch Lukas, M Muller, V Schulz-von der Gathen and H F Dobele, Axially resolved electron density distribution in an RF excited parallel plate plasma reactor by 1 mm MWI, Plasma Sources Sci. Technol. 8 94–99. Printed in the UK (1999).
  • S. Helhel, L. Oksuz, B. Ellingboe and C. Gaman, Plasma Density Measurements of Confined Capacitively Coupled Plasma by Microwave Interferometer and Ion Energy Distribution Function Methods, Plasma Sources Science and Technology, (Submitted at February22, 2005, Reference No. NH0855).
  • K.U. Riemann, Phys. Fluids B 4, 2693 (1992)
  • J. Koo, N.Y. Babaeva, H.C. Kim, O.V. Manuilenko and J.W.Shon, Simulation of Capacitively Coupled Single and Dual Frequency RF Discharges, IEEE Transactions on Plasma Science, Vol 32, No:1, pp.47-53, February 2004.
  • Francis F.Chen, Introduction to Plasma Physics and Controlled Fussion, Second Eddition,pp:75, 1984 Plenum Press, NY&London.
  • L. Oksuz and N Hershkowitz PRL,89(14):art.no.145001 September 30 (2002).
  • L. Oksuz and N. Hershkowitz Plasma Sources Sci. and Tech. Vol 14 No 1 p 201 (2005)
  • Oksuz L. and Hershkowitz N. Plasma Sources Sci. and Tech. 13 263-271 (2004).
  • Deborah O’Connell, Investigations of high voltage plasma boundary sheaths in radiofrequency discharges operated with multiple frequencies, Ph.D. Thesis, Dublin City University, School of Physics – PRL, 13th July 2004.
  • Michael A. Lieberman and Allan J. Lichtenberg, principles of Plasma discahrges and Material processing, John wiley and Sons Inc, 1994.
There are 20 citations in total.

Details

Other ID JA65GR22HV
Journal Section Articles
Authors

S. Helhel This is me

Publication Date December 1, 2009
Published in Issue Year 2009 Volume: 1 Issue: 4

Cite

APA Helhel, S. (2009). Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence. International Journal of Engineering and Applied Sciences, 1(4), 40-50.
AMA Helhel S. Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence. IJEAS. December 2009;1(4):40-50.
Chicago Helhel, S. “Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence”. International Journal of Engineering and Applied Sciences 1, no. 4 (December 2009): 40-50.
EndNote Helhel S (December 1, 2009) Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence. International Journal of Engineering and Applied Sciences 1 4 40–50.
IEEE S. Helhel, “Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence”, IJEAS, vol. 1, no. 4, pp. 40–50, 2009.
ISNAD Helhel, S. “Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence”. International Journal of Engineering and Applied Sciences 1/4 (December 2009), 40-50.
JAMA Helhel S. Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence. IJEAS. 2009;1:40–50.
MLA Helhel, S. “Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence”. International Journal of Engineering and Applied Sciences, vol. 1, no. 4, 2009, pp. 40-50.
Vancouver Helhel S. Axial Density Profile of 27 Mhz Capacitively Coupled Rf Plasma; Power and Pressure Dependence. IJEAS. 2009;1(4):40-5.

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