INITIATED CHEMICAL VAPOR DEPOSITION (iCVD) OF POLY(ACRYLIC ACID): A COMPARISON BETWEEN CONTINUOUS AND CLOSED-BATCH iCVD APPROACHES

Year 2024, , 586 - 595, 01.09.2024

Kurtuluş Yılmaz , Emine Sevgili Mercan , Mehmet Gürsoy , Mustafa Karaman

https://doi.org/10.36306/konjes.1416290

Abstract

In this study, poly(acrylic acid) (PAA) thin films were deposited on silicon wafer and glass surfaces by initiated chemical vapor deposition (iCVD) method using di-tert-butyl peroxide (TBPO) as the initiator and acrylic acid (AA) as the monomer. During iCVD, two different precursor feeding approaches, namely continuous and closed-batch, were employed. The effects of substrate temperature and the precursor feeding approaches on the deposition rates and surface morphology of the films were investigated. The highest deposition rates for the continuous and closed-batch iCVD approaches were found as 26.1 nm/min and 18.6 nm/min, respectively, at a substrate temperature of 15 °C. FTIR analysis of the films deposited by both approaches indicated high structural retention of the monomer during the polymerization. AFM results indicated that, PAA thin films possessed low RMS roughness values of 2.76 nm and 1.84 nm using continuous and closed-batch iCVD, respectively. Due to the slightly higher surface roughness of the film deposited under continuous iCVD, that film exhibited a lower water contact angle of 16.1° than the film deposited in closed-batch iCVD. In terms of monomer utilization ratio, closed-batch system was found to be more effective, which may help to minimize the carbon footprint of iCVD process.

Keywords

Poly(acrylic acid), Thin film, Hydrophilic, Chemical vapor deposition, iCVD

Project Number

Konya Technical University Research Foundation (Project No: 232216033), Scientific and Technological Research Council of Turkey (TÜBİTAK, Project No: 118M041)

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