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Dielectrical parameters and relaxation of Al/NFT/p-Si schottky diode with frequency dependence

Year 2023, Volume: 41 Issue: 1, 84 - 92, 14.03.2023
https://izlik.org/JA26TB74CL

Abstract

The fabricated Al/ Naphthalimide /p-Si Schottky diode’s dielectrical parameters and series resistance effect have been investigated by using the DC and AC measurements. W e have developed a facile interface structure that consisted of double-layer films in order to investigate the capacitance volume and series resistance effect through the device. The organic interlayer with little nanometer thickness between electrode and inorganic semiconductor drastically reduce the series resistance at the interface. The dielectric parameters have increased with decreasing frequency. Interestingly, the value of ε´ (≈3) even at 1 kHz shows that the prepared naphthalimide (with Thiophene property) nano-interlayer can provide more charges or energy storage ability and so it can be used instead of traditional interfacial layers.

Year 2023, Volume: 41 Issue: 1, 84 - 92, 14.03.2023
https://izlik.org/JA26TB74CL

Abstract

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Details

Primary Language English
Subjects Software Architecture
Journal Section Image Presentation
Authors

Emine Karagöz This is me 0000-0001-5605-2932

Songül Fiat Varol This is me 0000-0001-7751-0103

Serkan Sayın This is me 0000-0003-0518-3208

Ziya Merdan This is me 0000-0001-8708-8583

Submission Date April 16, 2021
Publication Date March 14, 2023
IZ https://izlik.org/JA26TB74CL
Published in Issue Year 2023 Volume: 41 Issue: 1

Cite

Vancouver 1.Emine Karagöz, Songül Fiat Varol, Serkan Sayın, Ziya Merdan. Dielectrical parameters and relaxation of Al/NFT/p-Si schottky diode with frequency dependence. SIGMA [Internet]. 2023 Mar. 1;41(1):84-92. Available from: https://izlik.org/JA26TB74CL

IMPORTANT NOTE: JOURNAL SUBMISSION LINK https://eds.yildiz.edu.tr/sigma/