Effect of Post-thermal Annealing on the Structural, Morphological, and Optical Properties of RF-sputtered In2S3 Thin Films

Year 2023, Volume: 36 Issue: 3, 1351 - 1367, 01.09.2023

Neslihan Akcay , Berkcan Erenler Yunus Özen , Valery Gremenok Konstantin Pavlovich Buskıs Süleyman Özçelik

https://doi.org/10.35378/gujs.1075405

Cited By: 2

https://izlik.org/JA84PS67NB

Abstract

Indium sulfide films were deposited by radio frequency magnetron sputtering technique on soda lime glass substrate. The deposition was conducted at the temperature of 150 °C and prepared films were then thermally annealed under argon atmosphere at 350 °C and 450 °C for 30 min. The impact of post-thermal annealing treatment on the properties of the films was investigated. From X-ray diffraction analysis, the formation of the stable tetragonal β-In2S3 crystal structure was substantiated and revealed that the thermal annealing treatment at 450 °C improved the crystallization of the films. The change in surface topographies and morphologies of the films depending on the post-thermal annealing process were examined by atomic force microscopy and scanning electron microscopy techniques, respectively. The stoichiometric ratio of constituent elements in the films was obtained by elemental analysis and it was seen that the films had slightly sulfur (S) deficit composition. It was found that the concentration of S slightly increased with the thermal annealing process. The room temperature photoluminescence spectra revealed that the films included vacancies of sulfur (VS: donor) and indium (In) (VIn: acceptor), indium interstitial (Ini: donor) and oxygen (O) in vacancy of sulfur (OVs: acceptor) defects with strong and broad emission bands at around 1.70, 2.20, and 2.71 eV.

Keywords

In2S3 , indium sulfide , Cd-free buffer layers , sputtering , thermal annealing

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