The Role of Annealing on The Structural, Optical and Electrical Properties of Au-Copper Oxide Films Deposited by Chemical Bath Deposition

Abstract

In this work, the effect of annealing on Au-CuO films obtained by chemical bath deposition method was studied in terms of their structural, electrical and optical properties. Annealing process was carried out at an oxygen environment. The CuO peaks were detected using X-ray diffraction and all of the films were polycrystalline. Crystal size, preferential orientation, and surface tension were estimated from XRD data. The surface morphology and thickness of the films was determined using a field emission scanning electron microscope. Energy dispersive X-ray analysis stated average atomic percentages of Au in the films. The electrical resistivity values of the films determined using four probe methods varied from 155.74 to 496.87 Ω.cm. The optical properties of the films were determined using the optic spectrometer. The energy band gap values, extinction coefficient, refractive index and dielectric coefficient of the films were also calculated.

Keywords

• Au-CuO,Annealing effect,Thin film

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