Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi

Necmi Serkan Tezel; Fatma Meydaneri Tezel; Afşin Kariper

doi:10.29137/umagd.1070390

EN TR

Electrical, Optical and Structural Analysis Depending on Concentration of TiO Thin Films Produced via Dip-Coating Method

Abstract

In this study, TiO thin films were produced on glass lamels by Dip-Coating method at 2 times 5 seconds into solutions prepared at different concentrations (A1:0.8 Molar, A2:1,25x10-2 Molar, A3:2, 5x10-3 Molar) and these films were annealed at 500 °C. In general, these films with an amorphous structure have 2θ = 25,5° (1 0 1) a spread was observed at the Miller orientation peak. With a decrease in the concentration, small grains have changed from a spherical shape to an ellipse of larger and smaller sizes. While there is a lot of reflectivities in the UV region, their transmittance values are quite high in the visible region of 400-700 nm. The energy band gap values of TiO thin films with A1, A2 and A3 concentrations were calculated as Eg = 3.52 eV; 2.60 eV and 3.03 eV, respectively. The increase in the electrical resistivity values with increasing concentration is evidence that the exhibits a typical metal-like behavior due to the particular conductivity in the oxide sub-layers.

Keywords

Thin film, Dip-coating, TiO2, Electrical Resistivity, Optical Properties, Egap

Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi

Abstract

Bu çalışmada, farklı derişimlerde (A1: 0,8 Molar, A2: 1,25x10-2 Molar, A3: 2,5x10-3 Molar) hazırlanan çözeltilere 2 şer kez 5 saniye daldırma metodu (Dip-coating) ile cam lameller üzerine TiO ince filmleri üretilmiştir ve üretilen bu filmler 500 °C’ de tavlanmıştır. Genel olarak amorf yapıya sahip bu filmlerin 2θ = 25,5° (1 0 1) Miller yönelim pikinde yayılma görülmüştür. Derişimin azalması ile küçük taneli yapılar, küresel şekilden daha irili ufaklı elipse doğru değişim göstermiştir. UV bölgede yansıtma özelliği oldukça fazla iken 400-700 nm görünür bölgede ise geçirgenlikleri oldukça fazladır. A1, A2 ve A3 derişimli TiO ince filmlerin enerji bant aralığı değerleri sırası ile Eg = 3,52 eV; 2,60 eV ve 3,03 eV olarak hesaplanmıştır. Derişimin artması ile elektriksel özdirenç değerlerinin artması, oksit alt tabakalardaki özel iletkenlikten dolayı metal benzeri tipik bir davranış gösterdiğinin kanıtıdır.

Keywords

İnce Tabaka, Daldırma-Kaplama, TiO2, Elektriksel Direnç, Optik Özellikler, Egap

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Details

Primary Language

Turkish

Subjects

Electrical Engineering

Journal Section

Research Article

Authors

Necmi Serkan Tezel ^*
0000-0001-9127-301X
Türkiye

Fatma Meydaneri Tezel
0000-0003-1546-875X
Türkiye

Afşin Kariper
0000-0001-9127-301X
Türkiye

Publication Date

July 31, 2022

Submission Date

February 9, 2022

Acceptance Date

June 30, 2022

Published in Issue

Year 2022 Volume: 14 Number: 2

DOI

https://doi.org/10.29137/umagd.1070390

IZ

https://izlik.org/JA99UR34FJ

APA

Tezel, N. S., Meydaneri Tezel, F., & Kariper, A. (2022). Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi. International Journal of Engineering Research and Development, 14(2), 590-603. https://doi.org/10.29137/umagd.1070390

AMA

1.Tezel NS, Meydaneri Tezel F, Kariper A. Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi. IJERAD. 2022;14(2):590-603. doi:10.29137/umagd.1070390

Chicago

Tezel, Necmi Serkan, Fatma Meydaneri Tezel, and Afşin Kariper. 2022. “Daldırma Metodu Ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik Ve Yapısal Analizi”. International Journal of Engineering Research and Development 14 (2): 590-603. https://doi.org/10.29137/umagd.1070390.

EndNote

Tezel NS, Meydaneri Tezel F, Kariper A (July 1, 2022) Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi. International Journal of Engineering Research and Development 14 2 590–603.

IEEE

[1]N. S. Tezel, F. Meydaneri Tezel, and A. Kariper, “Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi”, IJERAD, vol. 14, no. 2, pp. 590–603, July 2022, doi: 10.29137/umagd.1070390.

ISNAD

Tezel, Necmi Serkan - Meydaneri Tezel, Fatma - Kariper, Afşin. “Daldırma Metodu Ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik Ve Yapısal Analizi”. International Journal of Engineering Research and Development 14/2 (July 1, 2022): 590-603. https://doi.org/10.29137/umagd.1070390.

JAMA

1.Tezel NS, Meydaneri Tezel F, Kariper A. Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi. IJERAD. 2022;14:590–603.

MLA

Tezel, Necmi Serkan, et al. “Daldırma Metodu Ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik Ve Yapısal Analizi”. International Journal of Engineering Research and Development, vol. 14, no. 2, July 2022, pp. 590-03, doi:10.29137/umagd.1070390.

Vancouver

1.Necmi Serkan Tezel, Fatma Meydaneri Tezel, Afşin Kariper. Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi. IJERAD. 2022 Jul. 1;14(2):590-603. doi:10.29137/umagd.1070390

Kırıkkale University, Faculty of Engineering and Natural Science, 71450 Yahşihan / Kırıkkale, Türkiye.

ijerad@kku.edu.tr

Electrical, Optical and Structural Analysis Depending on Concentration of TiO Thin Films Produced via Dip-Coating Method

Abstract

Keywords

Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi

Abstract

Keywords

References

Details

Primary Language

Subjects

Journal Section

Authors

Publication Date

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Acceptance Date

Published in Issue

DOI

IZ

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