Year 2013,
Volume: 1 Issue: 1, 7 - 14, 01.04.2013
Abstract
This paper presents a review on using MEMS based mirror arrays to achieve maskless lithography in order to eliminate mask costs in the micro fabrication processes. With the advanced technology nodes, it becomes more and more costly to produce the lithography masks. Especially with the extreme ultraviolet lithography technique, the necessity to use maskless lithography becomes more obvious. Several universities and companies fabricated tilting mirror style or piston style mirror arrays to propose a solution to maskless lithography processes.
Keywords
References
- M.J.Madou, “Fundamentals of Microfabrication – The Science and Miniaturization, Second Edition”, CRC Press, (2002).
- J.E.Bjorkholm,“EUV Lithography—The Successor to Optical Lithography?”, Intel Technology Journal, (Q3), 1-8, (1998).
- R.R.Shaller,“Moore’s Law: past, present, and future”, IEEE Spectrum, 52-59, (1997).
- R.H.Stulen,“13-nm Extreme Ultraviolet Lithography”, IEEE Journ. of Quantum Electronics 1 (3), 970-975, (1995).
- N.Savage,“A Revolutionary Chipmaking Technique?”, IEEE Spectrum, 18, (2003). http://www.nikon-precision.com/docs/euv.pdf
- C.Gwyn,“EUV Lithography Update,” SPIE OE Magazine, 22-24, (2002).
- N.Choksi, D.S.Pickard, M.McCord, R.F.Pease, Y.Shroff, Y.Chen, W.Oldham, and D.Markle,“Maskless extreme ultraviolet lithography”, Journ. of Vacuum Science and Technology, B17 (6), 3047-3051, (1999).
- N.Harned and S.Roux,“Progress Report: Engineers take the EUV lithography challenge”, SPIE OE Magazine, 18-20, (2003). F.Niklaus, S.Haasl, and G.Stemme, “Arrays of monocrystalline silicon micromirrors fabricated using CMOS compatible transfer bonding,” IEEE Journ. of MEMS, 465- 469, (2003).
- J.M.Younse, “Projection Display Systems based on the digital micromirrorTM device (DMDTM )”, SPIE 2641, 64-75, (1995).
- K-N.Lee, D.S.Shin, W-J.Chung, Y-K.Kim, and Y-S.Lee, “Protein patterning by virtual mask photolithography”, IEEE Conf. on Microtechnologies in Medicine&Biology, 136-139, (2002).
- Y.Shroff, Y.Chen, W.G.Oldham, “Optical Analysis of Nanomirror Based Pattern Generation for Maskless lithography”, Techcon (2003).
- H.Lakner, P.D¨urr, U. Dauderstadt, W.Doleshall, and J.Amelung, “Design and fabrication of micromirror arrays for UV-Lithography”, SPIE 4561, 255-264, (2001).
- Y.Chen, C.Chu, Y.Shroff, and W.G.Oldham, “Fabrication and Dynamics of Electrically-Damped Double-Comb Nanomirrors for EUV Maskless lithography,” Techcon (2003).
- Y.Shroff, Y.Chen, and W.G.Oldham, “Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography”, Journ. of Vacuum Science and Technology, B19 (6), 2412-2415, (2001).
- Y.Chen, Y.Shroff, and W.Oldham,“Modeling and control of nanomirrors for EUV maskless lithography,” Modeling and Simulation of Microsystems,, 602-604, (2000).
- J-S.Wang, I.W.Jung, and O.Solgaard,“Fabrication method for elastomer spatial light modulators for short wavelength maskless lithography,” Sensors and Actuators, A 114, 52535, (2004).
- L.Erdmann, A.Deparney, F.Wirth, and R.Brunner,“MEMS based lithography for the fabrication of microoptical components,” SPIE 5347, 79-84, (2004). www.tpd.tno.nl/smartsite210.html
- H.Martinsson and T.Sandstrom,“Rastering for SLM-based mask-making and maskless lithography”, SPIE 5567, 557- 564, (2004).
Year 2013,
Volume: 1 Issue: 1, 7 - 14, 01.04.2013
Abstract
Bu makale MEMS tabanlı mikro-ayna dizilerinin mikro-üretim adımlarında maske maliyetini azaltmak için maskesiz litografi elde etmek amaçlı kullanılması hakkında bir derleme sunmaktadır. Gelişmiş teknoloji nodlarıtla birlikte litografi maskelerini üretmek daha da pahalı olmaktadır. Özellikle EUV (ekstrim ultraviolet litografi) tekniğinde, maskesiz litografi kullanmak ihtiyacı daha da aşikar olmuştur. Maskesiz litografi adımlarına bir çözüm olması amacıyla, çeşitli üniversite ve şirketler dönen veya piston şeklinde mikro-ayna dizileri üretmiştir.
Keywords
References
- M.J.Madou, “Fundamentals of Microfabrication – The Science and Miniaturization, Second Edition”, CRC Press, (2002).
- J.E.Bjorkholm,“EUV Lithography—The Successor to Optical Lithography?”, Intel Technology Journal, (Q3), 1-8, (1998).
- R.R.Shaller,“Moore’s Law: past, present, and future”, IEEE Spectrum, 52-59, (1997).
- R.H.Stulen,“13-nm Extreme Ultraviolet Lithography”, IEEE Journ. of Quantum Electronics 1 (3), 970-975, (1995).
- N.Savage,“A Revolutionary Chipmaking Technique?”, IEEE Spectrum, 18, (2003). http://www.nikon-precision.com/docs/euv.pdf
- C.Gwyn,“EUV Lithography Update,” SPIE OE Magazine, 22-24, (2002).
- N.Choksi, D.S.Pickard, M.McCord, R.F.Pease, Y.Shroff, Y.Chen, W.Oldham, and D.Markle,“Maskless extreme ultraviolet lithography”, Journ. of Vacuum Science and Technology, B17 (6), 3047-3051, (1999).
- N.Harned and S.Roux,“Progress Report: Engineers take the EUV lithography challenge”, SPIE OE Magazine, 18-20, (2003). F.Niklaus, S.Haasl, and G.Stemme, “Arrays of monocrystalline silicon micromirrors fabricated using CMOS compatible transfer bonding,” IEEE Journ. of MEMS, 465- 469, (2003).
- J.M.Younse, “Projection Display Systems based on the digital micromirrorTM device (DMDTM )”, SPIE 2641, 64-75, (1995).
- K-N.Lee, D.S.Shin, W-J.Chung, Y-K.Kim, and Y-S.Lee, “Protein patterning by virtual mask photolithography”, IEEE Conf. on Microtechnologies in Medicine&Biology, 136-139, (2002).
- Y.Shroff, Y.Chen, W.G.Oldham, “Optical Analysis of Nanomirror Based Pattern Generation for Maskless lithography”, Techcon (2003).
- H.Lakner, P.D¨urr, U. Dauderstadt, W.Doleshall, and J.Amelung, “Design and fabrication of micromirror arrays for UV-Lithography”, SPIE 4561, 255-264, (2001).
- Y.Chen, C.Chu, Y.Shroff, and W.G.Oldham, “Fabrication and Dynamics of Electrically-Damped Double-Comb Nanomirrors for EUV Maskless lithography,” Techcon (2003).
- Y.Shroff, Y.Chen, and W.G.Oldham, “Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography”, Journ. of Vacuum Science and Technology, B19 (6), 2412-2415, (2001).
- Y.Chen, Y.Shroff, and W.Oldham,“Modeling and control of nanomirrors for EUV maskless lithography,” Modeling and Simulation of Microsystems,, 602-604, (2000).
- J-S.Wang, I.W.Jung, and O.Solgaard,“Fabrication method for elastomer spatial light modulators for short wavelength maskless lithography,” Sensors and Actuators, A 114, 52535, (2004).
- L.Erdmann, A.Deparney, F.Wirth, and R.Brunner,“MEMS based lithography for the fabrication of microoptical components,” SPIE 5347, 79-84, (2004). www.tpd.tno.nl/smartsite210.html
- H.Martinsson and T.Sandstrom,“Rastering for SLM-based mask-making and maskless lithography”, SPIE 5567, 557- 564, (2004).
There are 18 citations in total.
Details
| Primary Language | Turkish |
|---|---|
| Journal Section | Articles |
| Authors | |
| Publication Date | April 1, 2013 |
| Submission Date | November 14, 2015 |
| Published in Issue | Year 2013 Volume: 1 Issue: 1 |