Year 2021, Volume 10 , Issue 2, Pages 423 - 431 2021-06-07

Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen
Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen

Asim MANTARCI [1]


Changes in growth conditions of ZnO thin films produced in the presence of different oxygen, changes in important properties such as crystal, surface properties, and absorption properties of the films were examined and reported. It is inferred from the XRD experimental results that the oxygen we applied to the films plays a role in the crystal structure changes of the films (grain size, strain value, dislocation density etc.) The highest RMS roughness value is 8.58 nm, the lowest RMS roughness value is 1.08 nm corresponding to non-flow and 1 sccm flow film respectively. AFM proved that films with nano-structured, tightly packed, grain properties were obtained in the produced films. Inference from UV analysis made is that the oxygen applied to the film caused small changes in the optical band gap values (in the range of about 3.30-3.32 eV). Except for 3 sccm oxygen state, all the films obtained were tightly packed, granulated and almost homogeneous and the nano property was clearly seen. All the results obtained show that the oxygen applied in the ZnO film process causes some changes in the physical properties of the film and this has an effect on the film quality and it is seen that these results can contribute to the production of the devices using ZnO.
Farklı oksijen varlığında üretilen ZnO ince filmlerin büyüme koşullarındaki değişiklikler, filmlerin kristal, yüzey özellikleri ve soğurma özellikleri gibi önemli özellikleri üzerindeki değişiklikler incelenmiş ve raporlanmıştır. XRD deneysel sonuçlarından, filmlere uyguladığımız oksijenin filmlerin kristal yapı değişikliklerinde (tane boyutu, gerinim değeri, dislokasyon yoğunluğu vb.) rol oynadığı anlaşılmaktadır. En yüksek RMS pürüzlülük değeri 8.58 nm olarak akışsız filme karşılık gelir, en düşük RMS pürüzlülük değeri 1.08 nm ile 1 sccm akışlı filme karşılık gelir. AFM, üretilen filmlerde nano yapılı, sıkı paketlenmiş, tanecik özellikli filmler elde edildiğini kanıtladı. Yapılan UV analizinden çıkan sonuç, filme uygulanan oksijenin optik bant aralığı değerlerinde (yaklaşık 3.30-3.32 eV aralığında) küçük değişikliklere neden olduğudur. 3 sccm oksijen durumu dışında, elde edilen tüm filmler sıkıca paketlenmiş, tanecik yapılı ve neredeyse homojen olan ve nano özelliği açıkça görüldü. Elde edilen tüm sonuçlar, ZnO film işleminde uygulanan oksijenin filmin fiziksel özelliklerinde bir takım değişikliklere neden olduğunu ve bunun film kalitesine etki ettiğini göstermektedir ve bu sonuçların ZnO kullanan cihazların üretimine katkı sağlayabileceği görülmüştür
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Primary Language en
Subjects Engineering
Journal Section Araştırma Makalesi
Authors

Orcid: 0000-0001-8369-3559
Author: Asim MANTARCI (Primary Author)
Institution: MUŞ ALPARSLAN ÜNİVERSİTESİ
Country: Turkey


Dates

Publication Date : June 7, 2021

Bibtex @research article { bitlisfen886060, journal = {Bitlis Eren Üniversitesi Fen Bilimleri Dergisi}, issn = {2147-3129}, eissn = {2147-3188}, address = {}, publisher = {Bitlis Eren University}, year = {2021}, volume = {10}, pages = {423 - 431}, doi = {10.17798/bitlisfen.886060}, title = {Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen}, key = {cite}, author = {Mantarcı, Asim} }
APA Mantarcı, A . (2021). Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen . Bitlis Eren Üniversitesi Fen Bilimleri Dergisi , 10 (2) , 423-431 . DOI: 10.17798/bitlisfen.886060
MLA Mantarcı, A . "Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen" . Bitlis Eren Üniversitesi Fen Bilimleri Dergisi 10 (2021 ): 423-431 <https://dergipark.org.tr/en/pub/bitlisfen/issue/62708/886060>
Chicago Mantarcı, A . "Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen". Bitlis Eren Üniversitesi Fen Bilimleri Dergisi 10 (2021 ): 423-431
RIS TY - JOUR T1 - Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen AU - Asim Mantarcı Y1 - 2021 PY - 2021 N1 - doi: 10.17798/bitlisfen.886060 DO - 10.17798/bitlisfen.886060 T2 - Bitlis Eren Üniversitesi Fen Bilimleri Dergisi JF - Journal JO - JOR SP - 423 EP - 431 VL - 10 IS - 2 SN - 2147-3129-2147-3188 M3 - doi: 10.17798/bitlisfen.886060 UR - https://doi.org/10.17798/bitlisfen.886060 Y2 - 2021 ER -
EndNote %0 Bitlis Eren Üniversitesi Fen Bilimleri Dergisi Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen %A Asim Mantarcı %T Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen %D 2021 %J Bitlis Eren Üniversitesi Fen Bilimleri Dergisi %P 2147-3129-2147-3188 %V 10 %N 2 %R doi: 10.17798/bitlisfen.886060 %U 10.17798/bitlisfen.886060
ISNAD Mantarcı, Asim . "Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen". Bitlis Eren Üniversitesi Fen Bilimleri Dergisi 10 / 2 (June 2021): 423-431 . https://doi.org/10.17798/bitlisfen.886060
AMA Mantarcı A . Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen. Bitlis Eren Üniversitesi Fen Bilimleri Dergisi. 2021; 10(2): 423-431.
Vancouver Mantarcı A . Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen. Bitlis Eren Üniversitesi Fen Bilimleri Dergisi. 2021; 10(2): 423-431.
IEEE A. Mantarcı , "Structural-crystalline, optical, topographical properties of ZnO thin film produced in presence of various oxygen", Bitlis Eren Üniversitesi Fen Bilimleri Dergisi, vol. 10, no. 2, pp. 423-431, Jun. 2021, doi:10.17798/bitlisfen.886060