CHARACTERIZATION OF PLAIN AND BORON INTERFACE METAL/p-Si SOLAR CELLS OBTAINED BY SPUTTER METHOD

Abstract

In this study, 1.167 mg/ml was prepared with Boric acid in deionized water. Using this solution, Boron coating was made on a molybdenum foil by electrochemical coating method and this coating was confirmed with SEM images. Then, the Si wafer made of p-type ohmic contact with a carrier density of 1014 to 1018 (1,0,0) orientation was divided into two and this solution was coated on one of them by electrochemical method.

Keywords

• Solar Cell
• Sputter Methot
• Elektrochemical Coating Methot
• Boron
• p-Type Silicon

Project Number

Bap-12-261-2015

SPUTTER YÖNTEMİYLE ELDE EDİLEN SADE VE BOR ARAYÜZEYLİ METAL/p-Si GÜNEŞ PİLLERİNİN KARAKTERİZASYONU

Abstract

Bu çalışmada, hazırlanan 1,167 mg/ml deiyonize su ile Borik asit ile hazırlandı. Bu çözelti kullanılarak elektrokimyasal kaplama yöntemiyle molibden bir folyo üzerine Bor kaplaması yapıldı ve bu kaplama sem görüntüleri ile teyit edildi. Sonra 1014 ila 1018 taşıyıcı yoğunluğuna (1,0,0) yönelimine sahip p tipi omik kontağı yapılmış Silisyum wafer ikiye bölünerek birinin üzerine bu çözelti elektrokimyasal yöntemle kaplandı.

Keywords

• Güneş Pilleri
• Sputter Yöntemi
• Elektrokimyasal Kaplama Yöntemi
• Bor
• p-Tipi Silisyum

Supporting Institution

Bingöl Üniversitesi

Project Number

Bap-12-261-2015

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