Deposition and Structural Characterization of Sn-Se-Te Thin Films

Year 2018, , 343 - 347, 31.12.2018

Özge Sürücü

https://doi.org/10.31590/ejosat.489491

Cited By: 2

Abstract

In this study, the effects of Se and
Te substitution on structural and morphological properties of SnSeTe (TSeTe)
thin films are studied. TSeTe thin films are fabricated by using the physical
vapor deposition (PVD). In order to determine the structural and morphological
properties of these films, XRD (X-ray diffraction), SEM (Scanning electron
microscopy), EDXA (Energy dispersive X-Ray analysis), Raman Analysis, and AFM
(Atomic Force Microscopy) measurements are carried out. Then, different
post-annealing processes are applied to figure out the heat treatment effects
on the thin film properties

Keywords

Thin film, structural characterization, XRD, SEM, Raman analysis

Sn-Se-Te İnce Filmlerinin Üretimi ve Yapısal Karakterizasyonu

Abstract

Bu çalışmada Se ve Te değişiminin fiziksel buharlaştırma tekniği (FBT) ile üretilmiş SnSeTe (TSeTe) ince filmlerinin yapısal ve morfolojik özelliklerine etkisi incelenmiştir. Bu filmlerin yapısal ve morfolojik özelliklerini belirlemek için XRD ( X-ışını Kırınım Deseni), SEM( Taramalı Elektron Mikroskobu), EDXA (Enerji Dağılımlı X-ışını Analizi), Raman Analizi ve AFM (Atomik Kuvvet Mikroskobu) ölçümleri yapılmıştır. Ardından ısının film özelliklerine  etkisini gözlemlemek için  üretim sonrası farklı sıcaklıklarda tavlama işlemleri uygulanmıştır. 

Keywords

İnce Film, Yapısal Karaterizasyon, Taramalı Elektron Mikroskopu, XRD, Raman Analizi

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