MICROFABRICATION PROCESS of GRAPHENE FIELD EFFECT DEVICES and INVESTIGATION of LITHOGRAPHIC RESIDUES by SURFACE ENHANCED RAMAN SPECTROSCOPY

Year 2016, Volume: 12 Issue: 2, 6 - 6, 01.08.2016

Hidayet Çetin

Abstract

At the fabrication of Graphene Field Effect Transistor (GFET), microfabrication process
has been extensively used. Microfabrication process has usually left impurities. However, impurities
could be much more important at graphene-like two dimensional systems. In this work, pristine and
photolithography-applied graphene samples were investigated by Surface Enhanced Raman
Spectroscopy (SERS) which is a powerful method to detect molecules even if only one molecule [1-
2]. Furthermore, after the photolithography process, to obtain more clean graphene surface, several
methods were applied. The obtained electrical and SERS results were associated and compared to
each other’s to propound a new lift-off solvents.

Keywords

Graphene, SERS, Lithographic Residues.