Research Article
Year 2020,
Volume: 13 Issue: 2, 511 - 517, 31.08.2020
Abstract
Takım
malzemesinin işlenebilirliği o malzemenin çalışma ömrüne bağlıdır. Bu sebeple
endüstride takım ömrünü artırmak için birçok işlem yapılmaktadır. Bunlardan en
yaygın olanı malzemenin yüzeyini sert filmle kaplama işlemidir. Kaplanan filmin
takım çeliğinin ömrünü artırabilmesi için taban malzeme ve film arasındaki
adezyonun yüksek olması gerekmektedir.
Sıçratma işlemi ile yapılan ince film kaplamalar, aşınma ve korozyon
direncindeki gelişme, yüzey kalitesinin arttırılması, fonksiyonel özelliklerin
zenginleştirilmesi ve kullanım ömrünün artması gibi üstün nitelikleri nedeniyle
birçok endüstride yaygın olarak kullanılmaktadır. Bu çalışmada, D2 takım
çeliğinin çalışma ömrünü artırmak için kaplanan TiN filmin adezyon ve yorulma ömrü
incelenmiştir. TiN filmi 400°C taban malzeme sıcaklığında D2 takım çeliğinin
üzerine sıçratma tekniği ile kaplanmıştır. Yapılan testler sonucu D2 çeliğine
kaplanan TiN filminin ömrünün 1000 çevrimden daha fazla olduğu belirlenmiştir.
Keywords
References
- Azadi, M., Sabour Rouhaghdam, A., & Ahangaranic, S. (2016). "A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition", International Journal of Engineering, 29(5), 677-687. doi:10.5829/idosi.ije.2016.29.05b.12
- Baran, Ö., Sukuroglu, E. E., Efeoglu, İ., & Totik, Y. (2016). "The investigation of adhesion and fatigue properties of TiN/TaN multilayer coatings", Journal of Adhesion Science and Technology, 30(20), 2188-2200. doi:10.1080/01694243.2016.1176662
- Bhaduri, D., Ghosh, A., Gangopadhyay, S., & Paul, S. (2010). "Effect of target frequency, bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating", Surface & Coatings Technology, 204(21-22), 3684-3697. doi:10.1016/j.surfcoat.2010.04.047
- Carbonari, M. J., & Martinelli, J. R. (2001). "Effects of Hot Isostatic Pressure on Titanium Nitride Films Deposited by Physical Vapor Deposition", Materials Research, 4(3), 163-168.
- Durusoy, H. Z., Duyar, Ö., Aydınlı, A., & Ay, F. (2003). "Influence of substrate temperature and bias voltage on the optical transmittance of TiN films", Vacuum, 70(1), 21-28. doi:10.1016/s0042-207x(02)00663-2
- Efeoglu, I., & Arnell, R. D. (2000). "Multi-pass sub-critical load testing of titanium nitride coatings", Thin Solid Films, 377, 346-353. doi:10.1016/s0040-6090(00)01309-2Kaya, S., Yilmaz, E., Karacali, H., Cetinkaya, A. O., & Aktag, A. (2015). "Samarium oxide thin films deposited by reactive sputtering: Effects of sputtering power and substrate temperature on microstructure, morphology and electrical properties", Materials Science in Semiconductor Processing, 33, 42-48. doi:10.1016/j.mssp.2015.01.035
- Kim, S. H., Park, H., Lee, K. H., Jee, S. H., Kim, D. J., Yoon, Y. S., & Chae, H. B. (2009). "Structure and mechanical properties of titanium nitride thin films grown by reactive pulsed laser deposition", Journal of Ceramic Processing Research, 10(1), 49-53. Retrieved from <Go to ISI>://WOS:000264403500010
- Li, X. Y., Li, H. J., Wang, Z. J., Xia, H., Xiong, Z. Y., Wang, J. X., & Yang, B. C. (2009). "Effect of substrate temperature on the structural and optical properties of ZnO and Al-doped ZnO thin films prepared by dc magnetron sputtering", Optics Communications, 282(2), 247-252. doi:10.1016/j.optcom.2008.10.003
- Ohring, M. (2001). "Materials science of thin films (Second ed. ed.), Academic press.
- Samani, M. K., Ding, X. Z., Khosravian, N., Amin-Ahmadi, B., Yi, Y., Chen, G.,Tay, B. K. (2015). "Thermal conductivity of titanium nitride/titanium aluminum nitride multilayer coatings deposited by lateral rotating cathode arc", Thin Solid Films, 578, 133-138. doi:10.1016/j.tsf.2015.02.032
- Sun, N., Zhou, D., Shi, S., Liu, W., Zhao, X., Liu, F., Ali, F. (2019). "DC substrate bias enables preparation of superior-performance TiN electrode films over a wide process window", Materials Research Bulletin, 119. doi:10.1016/j.materresbull.2019.110575
- Thornton, J. A. (1988). "Structure-Zone Models Of Thin Films "(Vol. 0821): SPIE.
- Zhang, S. Y., & Zhu, W. G. (1993). "TiN Coatıng Of Tool Steels - A Revıew", Journal of Materials Processing Technology, 39(1-2), 165-177. doi:10.1016/0924-0136(93)90016-y
Year 2020,
Volume: 13 Issue: 2, 511 - 517, 31.08.2020
Abstract
References
- Azadi, M., Sabour Rouhaghdam, A., & Ahangaranic, S. (2016). "A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition", International Journal of Engineering, 29(5), 677-687. doi:10.5829/idosi.ije.2016.29.05b.12
- Baran, Ö., Sukuroglu, E. E., Efeoglu, İ., & Totik, Y. (2016). "The investigation of adhesion and fatigue properties of TiN/TaN multilayer coatings", Journal of Adhesion Science and Technology, 30(20), 2188-2200. doi:10.1080/01694243.2016.1176662
- Bhaduri, D., Ghosh, A., Gangopadhyay, S., & Paul, S. (2010). "Effect of target frequency, bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating", Surface & Coatings Technology, 204(21-22), 3684-3697. doi:10.1016/j.surfcoat.2010.04.047
- Carbonari, M. J., & Martinelli, J. R. (2001). "Effects of Hot Isostatic Pressure on Titanium Nitride Films Deposited by Physical Vapor Deposition", Materials Research, 4(3), 163-168.
- Durusoy, H. Z., Duyar, Ö., Aydınlı, A., & Ay, F. (2003). "Influence of substrate temperature and bias voltage on the optical transmittance of TiN films", Vacuum, 70(1), 21-28. doi:10.1016/s0042-207x(02)00663-2
- Efeoglu, I., & Arnell, R. D. (2000). "Multi-pass sub-critical load testing of titanium nitride coatings", Thin Solid Films, 377, 346-353. doi:10.1016/s0040-6090(00)01309-2Kaya, S., Yilmaz, E., Karacali, H., Cetinkaya, A. O., & Aktag, A. (2015). "Samarium oxide thin films deposited by reactive sputtering: Effects of sputtering power and substrate temperature on microstructure, morphology and electrical properties", Materials Science in Semiconductor Processing, 33, 42-48. doi:10.1016/j.mssp.2015.01.035
- Kim, S. H., Park, H., Lee, K. H., Jee, S. H., Kim, D. J., Yoon, Y. S., & Chae, H. B. (2009). "Structure and mechanical properties of titanium nitride thin films grown by reactive pulsed laser deposition", Journal of Ceramic Processing Research, 10(1), 49-53. Retrieved from <Go to ISI>://WOS:000264403500010
- Li, X. Y., Li, H. J., Wang, Z. J., Xia, H., Xiong, Z. Y., Wang, J. X., & Yang, B. C. (2009). "Effect of substrate temperature on the structural and optical properties of ZnO and Al-doped ZnO thin films prepared by dc magnetron sputtering", Optics Communications, 282(2), 247-252. doi:10.1016/j.optcom.2008.10.003
- Ohring, M. (2001). "Materials science of thin films (Second ed. ed.), Academic press.
- Samani, M. K., Ding, X. Z., Khosravian, N., Amin-Ahmadi, B., Yi, Y., Chen, G.,Tay, B. K. (2015). "Thermal conductivity of titanium nitride/titanium aluminum nitride multilayer coatings deposited by lateral rotating cathode arc", Thin Solid Films, 578, 133-138. doi:10.1016/j.tsf.2015.02.032
- Sun, N., Zhou, D., Shi, S., Liu, W., Zhao, X., Liu, F., Ali, F. (2019). "DC substrate bias enables preparation of superior-performance TiN electrode films over a wide process window", Materials Research Bulletin, 119. doi:10.1016/j.materresbull.2019.110575
- Thornton, J. A. (1988). "Structure-Zone Models Of Thin Films "(Vol. 0821): SPIE.
- Zhang, S. Y., & Zhu, W. G. (1993). "TiN Coatıng Of Tool Steels - A Revıew", Journal of Materials Processing Technology, 39(1-2), 165-177. doi:10.1016/0924-0136(93)90016-y
There are 13 citations in total.
Details
| Primary Language | Turkish |
|---|---|
| Subjects | Engineering |
| Journal Section | Makaleler |
| Authors | |
| Publication Date | August 31, 2020 |
| Published in Issue | Year 2020 Volume: 13 Issue: 2 |