Elektrodepozisyon Yapılan ZnO İnce Filmlerinin Korozyon Davranışı

Year 2020, Volume: 10 Issue: 2, 355 - 365, 15.04.2020

Kübra Çınar Demir

https://doi.org/10.17714/gumusfenbil.617532

Abstract

Elektrokimyasal büyütme metodu, homojen ince filmlerin
oluşumunun mümkün olması, düşük maliyeti, nano-yapıların elde edilebilirliğinin
kolaylığı, büyük yüzey alanlı büyütmelerin gerçekleştirilebilirliği ve
stokiyometrideki kontrolü gibi avantajlara sahip olması nedeniyle yaygın bir
şekilde kullanılmaktadır. Bu çalışmada, nano-yapılı çinko oksit (ZnO) ince
filmler elektrokimyasal büyütme metodu kullanarak indiyum tin oksit (ITO) kaplı
cam altlıklar üzerine büyütülmüştür. Filmlerin kalitesi üzerine katodik
potansiyel, zaman, sıcaklık ve pH etkileri analiz edilmiştir. ZnO ince filmler dimetil
sülfoksit’te (DMSO) 130 °C sıcaklıkta 3600 sn
büyütme süresinde -1.0 V katodik potansiyelde elde edilmiştir. X-ışını kırınımı
(XRD) analizi, ZnO ince filmlerin açıkça (0002) tercihi yöneliminde tek kristal
özelliğe sahip olduğunu doğrulamaktadır. Soğurma ölçümlerine göre, ZnO filminin
optik band aralığı (Eg) 3.4 eV olarak hesaplanmıştır. ITO altlık üzerine
elektrodepozisyon yapılan ZnO ince filmlerin korozyon özellikleri
elektrokimyasal empedans spektroskopisi (EIS) ve Tafel ölçümleriyle
incelenmiştir. Nyquist, açık devre potansiyeli (OCV) ve Bode analizi ZnO’nun
yapısal değişimini ve korozyon davranışını anlamak için oluştutulmuş ve Nyquist
eğrisine fit yapılarak elde edilen çözelti direnci (Rs), polarizasyon direnci
(Rp), sabit faz elementi (CPE_dl) ve sabit faz elementi üstel değeri
(n) sırasıyla 49.61 Ω, 4.97x10^-6 Ω, 6.75x10-6 Ω^-1.s.cm^-2 ve 0.940 olarak hesaplanmıştır. Tafel eğrisine fit
yapılarak elde edilen korozyon potansiyeli (E_kor) ve korozyon akımı
(I_kor) sırasıyla -0.199 V ve 2.97x10^-8 A olarak elde
edilmiştir. Tüm ölçümler dikkate alındığında, büyük korozyon direncinin
nedeninin büyütme sırasında oluşan kusurların artışına bağlı olarak yüzey
pasivasyonuyla açıklanabilir.

Keywords

EIS, Elektrodepozisyon, Tafel, XRD, ZnO

Corrosion Behaviour Of Electrodeposited ZnO Thin Films

Abstract

Electrochemical deposition method (ECD) has been widely used due to its
advantages in stoichiometry control, large area growth, easy to form
nano-structures, being low coast, possible formation of homogeneous thin films.
In this study, nanostructured zinc oxide (ZnO) thin films were deposited on
Indium tin oxide (ITO)-coated glass substrate using ECD. The effects of
cathodic potential, time, temperature and pH on quality of the films were
examined. ZnO thin films were achieved with in cathodic potential with -1.0 V
and deposition time with 3600 seconds at temperature 130°C in dimethyl
sulfoxide (DMSO). X-ray diffraction (XRD) analysis confirmed clearly that the
ZnOthin films have sinle crystalline properties with a strong
c-axis (0002) preferential orientation. According to the absorption
measurements, the optical bandgap of the ZnOfilm was calculated as
Eg 3.4 eV. ZnO thin films electrodeposited on ITO substrate were studied with
Electrochemical Impedance Spectroscopy (EIS) and Tafel measurements. Nyquist,
open circuit potential and Bode analysis were evaluated to find out the
structural changing of ZnOand its corrosion behavior. With the help
of these plots, solution resistance (Rs), polarization resistance (Rp), a
constant phase element (CPE) and a CPE exponent (n) were calculated as 49.61 Ω,
4.97x10⁶ Ω, 6.75x10^-6 Ω^-1.s.cm^-2,
0.940, respectively. Also, we examined the ZnO thin films corrosion features
with the help of tafel measurements. Considering all these measurement, the possible
reason of increasing corrosion resistance can be interpreted as surface
passivation depending on increasing defects caused by deposition. 

Keywords

EIS, Electrodeposition, Tafel, XRD, ZnO

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