Year 2026,
Volume: 11 Issue: 1, 801 - 817, 17.03.2026
Tuğba Hacıosmanoğlu
,
Hande Karadeniz
Project Number
FEN-BAP-A-150219-14
References
-
[1] Hepp AF, Kumta PN, Velikokhatnyi OI, Datta MK. Batteries for Aeronautics and Space Exploration: Recent Developments and Future Prospects Lithium-Sulfur Batteries. Advances in High-Energy Density Batteries 2022; 531-595.
-
[2] Rhoderick EM, Williams RH. Metal–Semiconductor Contacts, 2nd Ed. Clarendon and Oxford, 1988.
-
[3] Chand S, Bala S. Analysis of current–voltage characteristics of inhomogeneous Schottky diodes at low temperatures. Applied Surface Science 2005; 252: 358–363.
-
[4] Simchi H, Heidarisaani M, Esmaeilzadeh M. Electron transport through nano-MOSFET in presence of electron-electron interaction. AIP Advances 2013; 3: 032124.
-
[5] Xia P, Feng X, Ng RJ, Wang S, Chi D, Li C, He Z, Liu X, Ang K-W. Impact and Origin of Interface States in MOS Capacitor with Monolayer MoS2 and HfO2 High-k Dielectric. Scientific Reports. 2017; 7: 40669.
-
[6] Ejderha S, Duman C, Nuhoglu C, Urhan F, Turut A. Effect of temperature on the current (capacitance and conductance)–voltage characteristics of Ti/n-GaAs diode Journal of Applied Physics 2014; 116: 234503.
-
[7] Jyothi I, Janardhanam V, Hong H, Choi C. Analysis of current–voltage characteristics of inhomogeneous Schottky diodes at low temperatures. J., Mater. Sci. Semicond. 2015; Process. 39: 390–399.
-
[8] Yildiz DE, Altindal S, Tekeli Z, Ozer M. The effects of surface states and series resistance on the performance of Au/SnO2/n-Si and Al/SnO2/p-Si (MIS) Schottky barrier diodes. Materials Science in Semiconductor Processing. 2010; 13: 34–40.
-
[9] Yenel E, Torlak Y, Kocyigit A, Erden I, Kus M, Yildirim M. W- and Mo-based polyoxometalates (POM) as interlayer in Al/n–Si photodiodes. Journal of Materials Science: Materials in Electronics 2021; 32: 12094–12110.
-
[10] Gozeh BA, Karabulut A, Yildiz A, Yakuphanoglu F. Solar light responsive ZnO nanoparticles adjusted using Cd and La Co-dopant photodetector J. Alloys Compd. 2018; 732: 16–34.
-
[11] Aydin ME, Yakuphanoglu F. Electrical characterization of inorganic-on-organic diode based InP and poly (3, 4-ethylenedioxithiophene)/poly (styrenesulfonate)(PEDOT: PSS). Microelectronics Reliability 2012; 52(7): 1350-1354.
-
[12] Karadeniz S, Yildiz DE, Yildirim M, Mirza S, Durmaz F, Baris B. Investigation of illumination effects on photovoltaic features of Al/p-Si Schottky diode with different amount of mixed PANI: Rubrene interface. Journal of Materials Science Materials in Electronics 2025; 36: 522.
-
[13] Imer AG, Korkut A, Farooq WA, Dere A, Atif M, Hanif A, Karabulut A. Interface controlling study of silicon based Schottky diode by organic layer. Journal of Materials Science: Materials in Electronics 2019; 19239–19246.
-
[14] Demirezen S, Dere A, Cetinkaya H, Shehab G, Mansour A, Yakuphanoglu F. Interface and dielectric properties of Al/p-Si diode by organic composite interlayer for MOS. Journal of Materials Science Materials in Electronics 2025; 36: 855.
-
[15] Gullu O, Aydogan S, Turut A. High barrier Schottky diode with organic interlayer. Solid State Communications 2012; 152: 381-385.
-
[16] Lebedev AA, Kozlovski VV, Levinshtein ME, Ivanov AE, Davydovskaya KS. Effect of high temperature irradiation with 15 MeV protons on characteristics of power SiC Schottky diodes. Solid-State Electronics 2021;181–182: 108009.
-
[17] Zhen Z, Feng C, Xiao H, Jiang L, Li W. Proton-irradiation effects and reliability on GaN-based MIS-HEMTs. Micromachines 2024; 15(9): 1091.
-
[18] Yoon YJ, Lee JS, Kang IM, Lee EJ, Kim DS. Impact of process-dependent SiNx passivation on proton-induced degradation in GaN MIS-HEMTs. Results in Physics. 2021; 31: 105013.
-
[19] Yoon YJ et al. Effects of proton irradiation on the current characteristics of SiN-passivated AlGaN/GaN MIS-HEMTs. Micromachines 2021;12(8): 864.
-
[20] Lee JH, Kim DS, Kim JG, Ahn WH, Bae Y, Lee JH. Effect of gate dielectrics on characteristics of high-energy proton-irradiated AlGaN/GaN MISHEMTs. Radiation Physics and Chemistry. 2021; 184: 109473.
-
[21] Cowley AM, Sze SM. Surface states and barrier height of metal‐semiconductor systems. Journal of Applied Physics. 1965; 36: 3212.
-
[22] Acar S, Karadeniz S, Tugluoglu N, Selcuk AB, Kasap M. Gaussian distribution of inhomogeneous barrier height in Ag/p-Si (1 0 0) Schottky barrier diodes. Applied Surface Science. 2004; 233: 373–381.
-
[23] Tugluoglu N, Karadeniz S, Acar S, Kasap M. Temperature-dependent barrier characteristics of inhomogeneous In/p-Si (100) Schottky barrier diodes. Chinese Physics Letter. 2004; 21(9): 1795.
-
[24] Karadeniz S, Baris B, Yuksel OF, Tugluoglu N. Analysis of electrical properties of Al/p-Si Schottky contacts with and without rubrene layer. Synthetic Metals 2013; 168: 16–22.
-
[25] Baris B, Yuksel OF, Tugluoglu N, Karadeniz S. Double barrier heights in 5, 6, 11, 12-tetraphenylnaphthacene (rubrene) based organic Schottky diode. Synthetic Metals 2013; 180: 38–42.
-
[26] Schottky W. Halbleitertheorie der Sperrschicht. Naturwissenschaften 1938; 26: 843.
-
[27] Mott NF. The theory of crystal rectifiers. Proceedings of the Royal Society of London. Series A, Mathematical and Physical Sciences 1939; 171: 27-38.
-
[28] Mott NF. Note on the contact between a metal and an insulator or semi-conductor. Proceedings of Cambridge Philosophical Society 1938; 34(4): 568-572.
-
[29] Nicollian EH, Brews JR. Metal Oxide Semiconductor (MOS) Physics and Technology, John Wiley, New York, 1982.
-
[30] Sze SM. Physics of Semiconductors Devices, 2nd Ed. John Wiley and Sons, 1981.
-
[31] Padovani FA, Stratton R. Field and thermionic-field emission in Schottky barriers. Solid-State Electron. 1966; 9: 695-707.
-
[32] Crowell CR, Rideout VL. Normalized thermionic-field (TF) emission in metal-semiconductor (Schottky) barriers. Solid State Electron. 1969; 12: 89-105.
-
[33] Padovani FA. The voltage–current characteristic of metal–semiconductor contacts. Academic Press, New York 1971; 7: 75-146.
-
[34] Kar S, Ashok S, Fonash SJ. Evidence of tunnel‐assisted transport in nondegenerate MOS and semiconductor‐oxide‐semiconductor diodes at room temperature. Journal of Applied Physics. 1980; 51: 3417-3421.
-
[35] Omotoso E, Meyer WE, Janse PRV, Igumbor E, Tunhuma SM, Ngoepe PNM, Danga HT, Auret FD. The effects of high-energy proton irradiation on the electrical characteristics of Au/Ni/4H-SiC Schottky barrier diodes. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2017; 409: 241-245.
-
[36] Oeba DA, Bodunrin JO, Moloi SJ. Electrical properties of 3 MeV proton irradiated silicon Schottky diodes. Physica B: Condensed Matter. 2021;610: 412786.
-
[37] Han XW, Dai GD. Study on Total Measuring Effect of Ionizing Irradiation of Schottky Diode. Applied Mechanics and Materials 2014; (488-489): 1285-1288.
-
[38] Arshak K, Korostynska O. Thick film oxide diode structures for personal dosimetry application. Sensors and Actuators A 2004; 113: 319–323.
-
[39] Mamor M, Sellai A, Bouziane K, Harthi SH, Busaidi M, Gard FS. Influence of He-ion irradiation on the characteristics of Pd/n-Si0.90Ge0.10/Si Schottky contacts. Journal of Physics D: Applied Physics. 2007; 40: 1351.
-
[40] Grussell E, Berg S, Andersson LP. Electrical Defects in Silicon Introduced by Sputtering and Sputter‐Etching. Journal of The Electrochemical Society. 1980; 127: 1573.
-
[41] Bohlin KE. Generalized Norde plot including determination of the ideality factor. Journal of Applied Physics 1986; 60: 1223-1224.
-
[42] Norde HA. Modified Forward I−V Plot for Schottky Diodes with High Series Resistance. Journal of Applied Physics. 1979; 50: 5052–5053.
-
[43] Card HC, Rhoderick EH. Studies of tunnel MOS diodes I. Interface effects in silicon Schottky diodes. Journal of Physics D: Applied Physics 1971; D4: 1589.
-
[44] Cao Y, Guo H, Ma W, Zhu W, Zhong X, Feng Y. Study on Proton Irradiation Damage of Diamond Schottky Barrier Diodes. IEEE Transactions on Electron Devices. 2026; 73(3): 1163–1168.
Investigation of electrical properties of fabricated Schottky diodes with organic interfaces in terms of radiation
Year 2026,
Volume: 11 Issue: 1, 801 - 817, 17.03.2026
Tuğba Hacıosmanoğlu
,
Hande Karadeniz
Abstract
The behavior of metal/semiconductor structures with organic interfaces exposed to proton radiation in radiation environments was investigated. For this purpose, organic-based Schottky devices have been fabricated within laboratory facilities, and the fundamental electrical parameters of structures have been investigated using graphs. The current-voltage (I-V) characteristics of metal/methyl-red/semiconductor Schottky devices before and after irradiation have been obtained, and changes in their electrical parameters have been investigated using these characteristics. This study is important in the context of energy storage and protection in power applications of electronic devices for space grade. Recently, energy storage technologies and power systems resistant to changes in radiation environments has become critical in electronic power applications.
Supporting Institution
Giresun University
Project Number
FEN-BAP-A-150219-14
Thanks
We also thank Professor Dr. Serdar Karadeniz for his experimental insights and support that contributed to our work.
References
-
[1] Hepp AF, Kumta PN, Velikokhatnyi OI, Datta MK. Batteries for Aeronautics and Space Exploration: Recent Developments and Future Prospects Lithium-Sulfur Batteries. Advances in High-Energy Density Batteries 2022; 531-595.
-
[2] Rhoderick EM, Williams RH. Metal–Semiconductor Contacts, 2nd Ed. Clarendon and Oxford, 1988.
-
[3] Chand S, Bala S. Analysis of current–voltage characteristics of inhomogeneous Schottky diodes at low temperatures. Applied Surface Science 2005; 252: 358–363.
-
[4] Simchi H, Heidarisaani M, Esmaeilzadeh M. Electron transport through nano-MOSFET in presence of electron-electron interaction. AIP Advances 2013; 3: 032124.
-
[5] Xia P, Feng X, Ng RJ, Wang S, Chi D, Li C, He Z, Liu X, Ang K-W. Impact and Origin of Interface States in MOS Capacitor with Monolayer MoS2 and HfO2 High-k Dielectric. Scientific Reports. 2017; 7: 40669.
-
[6] Ejderha S, Duman C, Nuhoglu C, Urhan F, Turut A. Effect of temperature on the current (capacitance and conductance)–voltage characteristics of Ti/n-GaAs diode Journal of Applied Physics 2014; 116: 234503.
-
[7] Jyothi I, Janardhanam V, Hong H, Choi C. Analysis of current–voltage characteristics of inhomogeneous Schottky diodes at low temperatures. J., Mater. Sci. Semicond. 2015; Process. 39: 390–399.
-
[8] Yildiz DE, Altindal S, Tekeli Z, Ozer M. The effects of surface states and series resistance on the performance of Au/SnO2/n-Si and Al/SnO2/p-Si (MIS) Schottky barrier diodes. Materials Science in Semiconductor Processing. 2010; 13: 34–40.
-
[9] Yenel E, Torlak Y, Kocyigit A, Erden I, Kus M, Yildirim M. W- and Mo-based polyoxometalates (POM) as interlayer in Al/n–Si photodiodes. Journal of Materials Science: Materials in Electronics 2021; 32: 12094–12110.
-
[10] Gozeh BA, Karabulut A, Yildiz A, Yakuphanoglu F. Solar light responsive ZnO nanoparticles adjusted using Cd and La Co-dopant photodetector J. Alloys Compd. 2018; 732: 16–34.
-
[11] Aydin ME, Yakuphanoglu F. Electrical characterization of inorganic-on-organic diode based InP and poly (3, 4-ethylenedioxithiophene)/poly (styrenesulfonate)(PEDOT: PSS). Microelectronics Reliability 2012; 52(7): 1350-1354.
-
[12] Karadeniz S, Yildiz DE, Yildirim M, Mirza S, Durmaz F, Baris B. Investigation of illumination effects on photovoltaic features of Al/p-Si Schottky diode with different amount of mixed PANI: Rubrene interface. Journal of Materials Science Materials in Electronics 2025; 36: 522.
-
[13] Imer AG, Korkut A, Farooq WA, Dere A, Atif M, Hanif A, Karabulut A. Interface controlling study of silicon based Schottky diode by organic layer. Journal of Materials Science: Materials in Electronics 2019; 19239–19246.
-
[14] Demirezen S, Dere A, Cetinkaya H, Shehab G, Mansour A, Yakuphanoglu F. Interface and dielectric properties of Al/p-Si diode by organic composite interlayer for MOS. Journal of Materials Science Materials in Electronics 2025; 36: 855.
-
[15] Gullu O, Aydogan S, Turut A. High barrier Schottky diode with organic interlayer. Solid State Communications 2012; 152: 381-385.
-
[16] Lebedev AA, Kozlovski VV, Levinshtein ME, Ivanov AE, Davydovskaya KS. Effect of high temperature irradiation with 15 MeV protons on characteristics of power SiC Schottky diodes. Solid-State Electronics 2021;181–182: 108009.
-
[17] Zhen Z, Feng C, Xiao H, Jiang L, Li W. Proton-irradiation effects and reliability on GaN-based MIS-HEMTs. Micromachines 2024; 15(9): 1091.
-
[18] Yoon YJ, Lee JS, Kang IM, Lee EJ, Kim DS. Impact of process-dependent SiNx passivation on proton-induced degradation in GaN MIS-HEMTs. Results in Physics. 2021; 31: 105013.
-
[19] Yoon YJ et al. Effects of proton irradiation on the current characteristics of SiN-passivated AlGaN/GaN MIS-HEMTs. Micromachines 2021;12(8): 864.
-
[20] Lee JH, Kim DS, Kim JG, Ahn WH, Bae Y, Lee JH. Effect of gate dielectrics on characteristics of high-energy proton-irradiated AlGaN/GaN MISHEMTs. Radiation Physics and Chemistry. 2021; 184: 109473.
-
[21] Cowley AM, Sze SM. Surface states and barrier height of metal‐semiconductor systems. Journal of Applied Physics. 1965; 36: 3212.
-
[22] Acar S, Karadeniz S, Tugluoglu N, Selcuk AB, Kasap M. Gaussian distribution of inhomogeneous barrier height in Ag/p-Si (1 0 0) Schottky barrier diodes. Applied Surface Science. 2004; 233: 373–381.
-
[23] Tugluoglu N, Karadeniz S, Acar S, Kasap M. Temperature-dependent barrier characteristics of inhomogeneous In/p-Si (100) Schottky barrier diodes. Chinese Physics Letter. 2004; 21(9): 1795.
-
[24] Karadeniz S, Baris B, Yuksel OF, Tugluoglu N. Analysis of electrical properties of Al/p-Si Schottky contacts with and without rubrene layer. Synthetic Metals 2013; 168: 16–22.
-
[25] Baris B, Yuksel OF, Tugluoglu N, Karadeniz S. Double barrier heights in 5, 6, 11, 12-tetraphenylnaphthacene (rubrene) based organic Schottky diode. Synthetic Metals 2013; 180: 38–42.
-
[26] Schottky W. Halbleitertheorie der Sperrschicht. Naturwissenschaften 1938; 26: 843.
-
[27] Mott NF. The theory of crystal rectifiers. Proceedings of the Royal Society of London. Series A, Mathematical and Physical Sciences 1939; 171: 27-38.
-
[28] Mott NF. Note on the contact between a metal and an insulator or semi-conductor. Proceedings of Cambridge Philosophical Society 1938; 34(4): 568-572.
-
[29] Nicollian EH, Brews JR. Metal Oxide Semiconductor (MOS) Physics and Technology, John Wiley, New York, 1982.
-
[30] Sze SM. Physics of Semiconductors Devices, 2nd Ed. John Wiley and Sons, 1981.
-
[31] Padovani FA, Stratton R. Field and thermionic-field emission in Schottky barriers. Solid-State Electron. 1966; 9: 695-707.
-
[32] Crowell CR, Rideout VL. Normalized thermionic-field (TF) emission in metal-semiconductor (Schottky) barriers. Solid State Electron. 1969; 12: 89-105.
-
[33] Padovani FA. The voltage–current characteristic of metal–semiconductor contacts. Academic Press, New York 1971; 7: 75-146.
-
[34] Kar S, Ashok S, Fonash SJ. Evidence of tunnel‐assisted transport in nondegenerate MOS and semiconductor‐oxide‐semiconductor diodes at room temperature. Journal of Applied Physics. 1980; 51: 3417-3421.
-
[35] Omotoso E, Meyer WE, Janse PRV, Igumbor E, Tunhuma SM, Ngoepe PNM, Danga HT, Auret FD. The effects of high-energy proton irradiation on the electrical characteristics of Au/Ni/4H-SiC Schottky barrier diodes. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2017; 409: 241-245.
-
[36] Oeba DA, Bodunrin JO, Moloi SJ. Electrical properties of 3 MeV proton irradiated silicon Schottky diodes. Physica B: Condensed Matter. 2021;610: 412786.
-
[37] Han XW, Dai GD. Study on Total Measuring Effect of Ionizing Irradiation of Schottky Diode. Applied Mechanics and Materials 2014; (488-489): 1285-1288.
-
[38] Arshak K, Korostynska O. Thick film oxide diode structures for personal dosimetry application. Sensors and Actuators A 2004; 113: 319–323.
-
[39] Mamor M, Sellai A, Bouziane K, Harthi SH, Busaidi M, Gard FS. Influence of He-ion irradiation on the characteristics of Pd/n-Si0.90Ge0.10/Si Schottky contacts. Journal of Physics D: Applied Physics. 2007; 40: 1351.
-
[40] Grussell E, Berg S, Andersson LP. Electrical Defects in Silicon Introduced by Sputtering and Sputter‐Etching. Journal of The Electrochemical Society. 1980; 127: 1573.
-
[41] Bohlin KE. Generalized Norde plot including determination of the ideality factor. Journal of Applied Physics 1986; 60: 1223-1224.
-
[42] Norde HA. Modified Forward I−V Plot for Schottky Diodes with High Series Resistance. Journal of Applied Physics. 1979; 50: 5052–5053.
-
[43] Card HC, Rhoderick EH. Studies of tunnel MOS diodes I. Interface effects in silicon Schottky diodes. Journal of Physics D: Applied Physics 1971; D4: 1589.
-
[44] Cao Y, Guo H, Ma W, Zhu W, Zhong X, Feng Y. Study on Proton Irradiation Damage of Diamond Schottky Barrier Diodes. IEEE Transactions on Electron Devices. 2026; 73(3): 1163–1168.