Chemical Vapor Deposition Method and Types in Thin Film Production

Yıl 2021, , 351 - 363, 01.12.2021

Ayşegül Çoşğun , Ayşegül Taşçıoğlu , Gökhan Yılmaz

https://doi.org/10.29048/makufebed.861301

Cited By: 1

Öz

Thin film technology is widely used in almost every sector. Especially it is used in the electronic device industry. The most important factor in preferring thin films is that their morphological structure can be adjusted depending on their production, their stoichiometry can be controlled and their homogeneity. For this reason, thin film production technique is really important. The most commonly used method to obtain these properties is the chemical vapor deposition method. Depending on this method, studies have been made on different designs. In this study, chemical vapor deposition (CVD) method and its types were investigated and it was aimed to compare the methods.

Anahtar Kelimeler

Thin film, thin film production technique, chemical vapor deposition

İnce Film Üretiminde Kimyasal Buhar Biriktirme Yöntemi ve Çeşitleri

Öz

İnce film teknolojisi hemen her sektörde özellikle de elektronik cihaz sektöründe yaygın olarak kullanılmaktadır. İnce filmlerin tercih edilmesindeki en büyük etken üretimine bağlı olarak morfolojik yapısının ayarlanabilir olması, stokiyometrisinin kontrol edilebilmesi ve homojenliğidir. Bu sebeple ince film üretim teknikleri büyük önem arz etmektedir. Bu özellikleri elde etmek için en çok kullanılan yöntem kimyasal buhar biriktirme (KBB) yöntemidir. Bu yönteme bağlı olarak da farklı tasarımlar üzerine çalışmalar yapılmıştır. Bu çalışmada ise kimyasal buhar biriktirme yöntemleri araştırılarak yöntemlerin avantajlı ve dezavantajlı olduğu parametreler belirlenmiştir.

Anahtar Kelimeler

İnce film, ince film üretim tekniği, kimyasal buhar biriktirme

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