Effects of Annealing Temperature on Optical, Surface and Structural Properties of TiN, TiO, TiOxNy Thin Films

Year 2024, EARLY VIEW, 1 - 1

Yeliz Özkök , Mustafa Öztürk , Mehmet Çakmak

https://doi.org/10.2339/politeknik.1429518

Abstract

Titanium nitride (TiN), titanium oxide (TiO) and titanium oxynitride (TiOxNy) thin films were grown on soda lime glass (SLG), pure silicon (i-Si) and 316L stainless steel (316LSS) substrates using the sputtering technique with confocal geometry. In order to improve the physical properties of the films obtained, they were subjected to heat treatment at different temperatures in a diffusion furnace and the effect of annealing temperature on the optical, surface and structural properties of the films was investigated. Optical properties of TiN, TiO, TiOxNy thin films were determined by Attenuated Total Reflection (ATR), Fourier transform infrared spectroscopy (FTIR), structural properties were determined by X-ray diffraction diffractometer (XRD), and surface properties were determined by atomic force microscopy (AFM). According to the results obtained from the analyses, annealing temperature improved the physical properties of TiN, TiO, TiOxNy thin films.

Keywords

FTIR, AFM, XRD, Sputtering method with confocal geometry, annealing temperature, titanium oxynitride

TiN, TiO, TiOxNy İnce Filmlerin Optik, Yüzey ve Yapısal Özellikleri Üzerine Tavlama Sıcaklığının Etkileri

Abstract

Titanyum nitrür (TiN), titanyum oksit (TiO) ve titanyum oksinitrür (TiOxNy) ince filmleri eş-odaklı geometriye sahip püskürtme tekniği kullanılarak soda lime glass (SLG), katkısız silisyum (i-Si) ve 316L paslanmaz çelik (316LSS) alttaşlar üzerine büyütülmüştür. Elde edilen filmlerin fiziksel özelliklerinin iyileştirilmesi amacıyla, difüzyon fırınında farklı sıcaklıklarda ısıl işleme tabi tutulmuş ve filmlerin optik, yüzey ve yapısal özellikleri üzerine tavlama sıcaklığının etkisi araştırılmıştır. TiN, TiO, TiOxNy ince filmlerinin optik özellikleri Zayıflatılmış Toplam Yansıma (ATR), Fourier dönüşümü kızılötesi spektroskopisi (FTIR) ile yapısal özellikleri X-ışını kırınım difraktometresi (XRD) ile yüzey özellikleri atomik kuvvet mikroskobu (AFM) ile belirlenmiştir. Analizlerden elde edilen sonuçlara göre, tavlama sıcaklığı TiN, TiO, TiOxNy ince filmlerin fiziksel özelliklerinde iyileşme yaratmıştır.

Keywords

FTIR, AFM, XRD, Eş-odaklı geometriye sahip püskürtme yöntemi, tavlama sıcaklığı, titanyum oksinitrür

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