Research Article

Effect of Silicon Application on Wheat Under Boron Stress

Volume: 23 Number: 3 December 25, 2019
EN TR

Effect of Silicon Application on Wheat Under Boron Stress

Abstract

In this study, effects of different silicon (Si) concentrations (0.75, 5, 10 mM) on wheat under boron(B) stress, investigated by means of some stress indicators such as tissue length, malondialdehyde (MDA), ion leakage, relative water content (RWC) and total chlorophyll content. Stress mitigating effects of silicon were observed mainly as reductions on membrane damage with reduced MDA concentrations and decreased ion leakage levels. Although necrosis was present on shoot tissues due to the boron stress, no significant change observed on shoot and root length with the application of Si. On the contrary, relative water content (RWC) has changed positively with the implementation of Si under boron stress. Furthermore Si has enhanced RWC level in Si+B co-applicated sets to the level of control plants. Total chlorophyll content increased with the existance of 0.75 and 5 mM Si, while 10 mM Si had no effect on the chorophyll content under boron stress. Overall, silicon was found to have a potential to alleviate boron stress in wheat production.

Keywords

References

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Details

Primary Language

English

Subjects

Engineering

Journal Section

Research Article

Publication Date

December 25, 2019

Submission Date

March 4, 2019

Acceptance Date

September 12, 2019

Published in Issue

Year 2019 Volume: 23 Number: 3

APA
Erkan, İ. E. (2019). Effect of Silicon Application on Wheat Under Boron Stress. Süleyman Demirel Üniversitesi Fen Bilimleri Enstitüsü Dergisi, 23(3), 743-747. https://doi.org/10.19113/sdufenbed.535286
AMA
1.Erkan İE. Effect of Silicon Application on Wheat Under Boron Stress. J. Nat. Appl. Sci. 2019;23(3):743-747. doi:10.19113/sdufenbed.535286
Chicago
Erkan, İbrahim Ertan. 2019. “Effect of Silicon Application on Wheat Under Boron Stress”. Süleyman Demirel Üniversitesi Fen Bilimleri Enstitüsü Dergisi 23 (3): 743-47. https://doi.org/10.19113/sdufenbed.535286.
EndNote
Erkan İE (December 1, 2019) Effect of Silicon Application on Wheat Under Boron Stress. Süleyman Demirel Üniversitesi Fen Bilimleri Enstitüsü Dergisi 23 3 743–747.
IEEE
[1]İ. E. Erkan, “Effect of Silicon Application on Wheat Under Boron Stress”, J. Nat. Appl. Sci., vol. 23, no. 3, pp. 743–747, Dec. 2019, doi: 10.19113/sdufenbed.535286.
ISNAD
Erkan, İbrahim Ertan. “Effect of Silicon Application on Wheat Under Boron Stress”. Süleyman Demirel Üniversitesi Fen Bilimleri Enstitüsü Dergisi 23/3 (December 1, 2019): 743-747. https://doi.org/10.19113/sdufenbed.535286.
JAMA
1.Erkan İE. Effect of Silicon Application on Wheat Under Boron Stress. J. Nat. Appl. Sci. 2019;23:743–747.
MLA
Erkan, İbrahim Ertan. “Effect of Silicon Application on Wheat Under Boron Stress”. Süleyman Demirel Üniversitesi Fen Bilimleri Enstitüsü Dergisi, vol. 23, no. 3, Dec. 2019, pp. 743-7, doi:10.19113/sdufenbed.535286.
Vancouver
1.İbrahim Ertan Erkan. Effect of Silicon Application on Wheat Under Boron Stress. J. Nat. Appl. Sci. 2019 Dec. 1;23(3):743-7. doi:10.19113/sdufenbed.535286

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