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Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi

Yıl 2019, Cilt: 7 Sayı: 3, 649 - 660, 27.09.2019

Hakan Ateş Meryem Polat Gönüllü

https://doi.org/10.29109/gujsc.593292
Cited By: 4

Öz

Gelişmekte
olan teknoloji ile birlikte optoelektronik, enerji çevrimi, nanomedikal
uygulamaları ve katalizör malzemeler gibi pek çok alanda teknolojinin minyatürleşmesi
sebebiyle nano-boyutta malzeme üretiminin gerekliliği önem kazanmıştır. Bu
sebeple son zamanlarda yapılan bilimsel çalışmalar atomik-boyutta ince film
kaplama ve büyütme teknolojilerine odaklanmışlardır. Tam da bu noktada,
atomik-boyutta üstün kaliteli kaplamalar yapmaya imkân sağlayan atomik katman
biriktirme (ALD) ince film üretim tekniği devreye girmektedir. Bu çalışmada,
ALD tekniği hakkında temel bilgi verilmiş, ALD kullanılarak 200 ºC taban sıcaklığında
silisyum yongalar üzerine ZnO, TiO2 ve Al2O3 ince
filmler kaplanmıştır. Homojen yüzeyli ince film kaplamaların yapılabilmesi için
öncelikle deneysel parametreler değiştirilerek farklı tekrarlarda üretimler
gerçekleştirilmiştir ve en uygun deney koşulları belirlenmiştir. Detaylı karakterizasyon
işlemleri en uygun üretim koşulları altında kaplama homojenliği sağlayabilmiş ZnO,
TiO2 ve Al2O3 ince filmler için yapılmıştır.
Üretilen filmlerin homojen bir yapıya sahip olup olmadığını belirlemek için spektroskopik
elipsometri tekniği kullanılarak çeşitli noktalarından kalınlıkları
saptanmıştır. Ayrıca kristal yapıları hakkında bilgi edinmek adına X-ışını
kırınım desenleri incelenmiştir. 

Anahtar Kelimeler

ALD ince filmler kaplama nano teknoloji

Teşekkür

Bu çalışma, 07/2015-08 ve 07/2016-11 numaralı Gazi Üniversitesi Bilimsel Araştırma Projeleri desteğine ve Okyay Technology R&D tarafından desteklendi.

Kaynakça

  • Kaynaklar (References)
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Toplam 74 adet kaynakça vardır.

Ayrıntılar

Birincil Dil Türkçe
Konular Mühendislik
Bölüm Tasarım ve Teknoloji
Yazarlar

Hakan Ateş 0000-0002-5132-4107

Meryem Polat Gönüllü Bu kişi benim

Yayımlanma Tarihi 27 Eylül 2019
Gönderilme Tarihi 17 Temmuz 2019
Yayımlandığı Sayı Yıl 2019 Cilt: 7 Sayı: 3

Kaynak Göster

APA Ateş, H., & Polat Gönüllü, M. (2019). Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi. Gazi University Journal of Science Part C: Design and Technology, 7(3), 649-660. https://doi.org/10.29109/gujsc.593292

Cited By

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The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis Under Thermal Annealing
Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji
https://doi.org/10.29109/gujsc.1137863
The Effect of Annealing Technique on ZnO Film Properties
GAZI UNIVERSITY JOURNAL OF SCIENCE
Meryem POLAT GÖNÜLLÜ
https://doi.org/10.35378/gujs.872959
Insight of mechanical and morphological properties of ALD- Al2O3 films in point of structural properties
Applied Physics A
Burak Nalcaci
https://doi.org/10.1007/s00339-021-04601-x

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