Araştırma Makalesi
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DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS

Yıl 2025, Cilt: 3 Sayı: 1, 45 - 55, 01.06.2025
https://izlik.org/JA26LL36NK

Öz

The characterization of defect levels within a semiconductor using capacitive methods is based on manipulating the width of the depletion region through pulsed biasing. During the measurement, the processes of charge emission and subsequent charge capture at the defect energy levels occur sequentially. The aim of this study is to investigate defect energy levels by analyzing both charge capture and emission processes and to determine the capture cross section using the capture capacitance transient signal. In this study, a method is proposed where the capture cross section could be calculated directly from the capture capacitance transient signals. The charge capture process occurs in two distinct regions, known as the fast and slow capture regions, with the slow capture region becoming dominant under specific conditions. In this study, the activation energy of the defect level in the boron-doped Si sample was determined to be in the range of 0.159–0.216 eV using the Deep Level Transient Spectroscopy (DLTS) method. The capture cross section was determined as an average of σ_n=1.03×10^(-16) cm^2 from the capacitance transient signals of the charge emission process. In contrast, when using the capture capacitance transient signals, the average value of the capture cross section was calculated as 5.62×10^(-11) cm^2.

Kaynakça

  • [1] D.V. Lang, Deep Level Transient Spectroscopy: A New Method to Characterize Traps in Semiconductors, J. Appl. Phys. 45(7), 3023-3032, 1974.
  • [2] W. Shockley, W.T. Read, Statistics of the Recombination of Holes and Electrons, Phys. Rev. 87(5), 835-842, 1952.
  • [3] R.N. Hall, Electron-Hole Recombination in Germanium, Phys. Rev. 87(2), 387-387, 1952.
  • [4] L.C. Kimerling, Influence of Deep Traps on the Measurement of Free-Carrier Distributions in Semiconductors by Junction Capacitance Techniques, J. Appl. Phys. 45(4), 1839-1845, 1974.
  • [5] J.A. Borsuk, R.M. Swanson, Capture-Cross-Section Determination by Transient-Current Trap-Filling Experiments, J. Appl. Phys. 52(11), 6704-6712, 1981.
  • [6] A. Zylbersztejn, Trap Depth and Electron Capture Cross Section Determination by Trap Refilling Experiments in Schottky Diodes, Appl. Phys. Lett. 33(2), 200-202, 1978.
  • [7] J.T. Ryan, A. Matsuda, J.P. Campbell, K.P. Cheung, Interface-State Capture Cross Section—Why Does It Vary So Much?, Appl. Phys. Lett. 106(16), 163503, 2015.
  • [8] J. Lauwaert, J. Van Gheluwe, P. Clauws, An Accurate Analytical Approximation to the Capacitance Transient Amplitude in Deep Level Transient Spectroscopy for Fitting Carrier Capture Data, Rev. Sci. Instrum. 79(9), 093902, 2008.
  • [9] S. Kumar, P. Gupta, I. Guiney, C.J. Humphreys, S. Raghavan, R. Muralidharan, D.N. Nath, Temperature and Bias Dependent Trap Capture Cross Section in AlGaN/GaN HEMT on 6-in Silicon with Carbon-Doped Buffer, IEEE Trans. Electron Devices 64(12), 4868–4874, 2017.
  • [10] J.H. Zhao, T.E. Schlesinger, A.G. Milnes, Determination of Carrier Capture Cross Sections of Traps by Deep Level Transient Spectroscopy of Semiconductors, J. Appl. Phys. 62(7), 2865-2870, 1987.
  • [11] D. Pons, Determination of the Free Energy Level of Deep Centers, with Application to GaAs, Appl. Phys. Lett. 37(4), 413-415, 1980.
  • [12] D. Pons, Accurate Determination of the Free Carrier Capture Kinetics of Deep Traps by Space-Charge Methods, J. Appl. Phys. 55(10), 3644-3657, 1984.
  • [13] D. Stievenard, J.C. Bourgoin, M. Lannoo, An Easy Method to Determine Carrier-Capture Cross Sections: Application to GaAs, J. Appl. Phys. 55(6), 1477-1481, 1984.
  • [14] F.D. Auret, S.A. Goodman, M.J. Legodi, W.E. Meyer, D.C. Look, Electrical Characterization of Vapor-Phase-Grown Single-Crystal ZnO, Appl. Phys. Lett. 80(8), 1340–1342, 2002.
  • [15] E. Omotoso, E. Igumbor, W.E. Meyer, DLTS Characterisation of 107 MeV Krypton Ion-Irradiated Nitrogen-Doped 4H-Silicon Carbide, J. Mater. Sci.: Mater. Electron. 36(3), 2025.
  • [16] A. Kumar, S. Mondal, K.S.R. Koteswara Rao, Probing the Oxygen Vacancy Associated Native Defects in High-κ HfO₂ Using Deep Level Transient Spectroscopy, J. Appl. Phys. 135(4), 045305, 2024.
  • [17] C.A. Dawe, V.P. Markevich, M.P. Halsall, I.D. Hawkins, A.R. Peaker, A. Nandi, I. Sanyal, M. Kuball, Deep Level Traps in (010) β-Ga₂O₃ Epilayers Grown by Metal Organic Chemical Vapor Deposition on Sn-Doped β-Ga₂O₃ Substrates, J. Appl. Phys. 136(4), 045705, 2024.

YAKALAMA GEÇİŞ SİNYALLERİNDEN YAKALAMA KESİT ALANINI BELİRLEME

Yıl 2025, Cilt: 3 Sayı: 1, 45 - 55, 01.06.2025
https://izlik.org/JA26LL36NK

Öz

Yarıiletken içerisindeki kusur seviyelerinin kapasitif yöntemlerle karakterizasyonu, arınmış bölge genişliğinin pulslu beslemeler ile manipüle edilmesine dayanır. Ölçüm sırasında, kusur enerji seviyelerinde yük yayınımı ve ardından yük yakalanması ardışık süreçler olarak gerçekleşir. Bu çalışmanın amacı, hem yük yakalama hem de yayınlama süreçlerini analiz ederek kusur enerji seviyelerini araştırmak ve yakalama kapasite geçiş sinyalini kullanarak yakalama tesir kesit alanını belirlemektir. Bu çalışmada, yakalama tesir kesit alanının doğrudan yakalama kapasite geçiş sinyalinden hesaplanabileceği bir yöntem önerildi. Yük yakalama süreci, hızlı ve yavaş olmak üzere iki farklı bölgede gerçekleşmekte olup, belirli koşullar altında yavaş yakalama bölgesi baskın hale gelmektedir. Bu araştırmada kullanılan boron katkılı Si örneğin kusur seviyesinin aktivasyon enerjisi, Derin Seviye Geçiş Spektroskopisi (DLTS) yöntemi kullanılarak 0.159-0.216 eV aralığında belirlenmiştir. Yük yayınlama sürecine ait kapasite geçiş sinyallerinden yakalama tesir kesit alanı ortalama σ_n=1.03×10^(-16) cm^2 olarak hesaplanmıştır. Buna karşılık, yakalama kapasite geçiş sinyalleri kullanıldığında, yakalama tesir kesit alanının ortalama değeri 5.62×10^(-11) cm^2 olarak hesaplanmıştır.

Kaynakça

  • [1] D.V. Lang, Deep Level Transient Spectroscopy: A New Method to Characterize Traps in Semiconductors, J. Appl. Phys. 45(7), 3023-3032, 1974.
  • [2] W. Shockley, W.T. Read, Statistics of the Recombination of Holes and Electrons, Phys. Rev. 87(5), 835-842, 1952.
  • [3] R.N. Hall, Electron-Hole Recombination in Germanium, Phys. Rev. 87(2), 387-387, 1952.
  • [4] L.C. Kimerling, Influence of Deep Traps on the Measurement of Free-Carrier Distributions in Semiconductors by Junction Capacitance Techniques, J. Appl. Phys. 45(4), 1839-1845, 1974.
  • [5] J.A. Borsuk, R.M. Swanson, Capture-Cross-Section Determination by Transient-Current Trap-Filling Experiments, J. Appl. Phys. 52(11), 6704-6712, 1981.
  • [6] A. Zylbersztejn, Trap Depth and Electron Capture Cross Section Determination by Trap Refilling Experiments in Schottky Diodes, Appl. Phys. Lett. 33(2), 200-202, 1978.
  • [7] J.T. Ryan, A. Matsuda, J.P. Campbell, K.P. Cheung, Interface-State Capture Cross Section—Why Does It Vary So Much?, Appl. Phys. Lett. 106(16), 163503, 2015.
  • [8] J. Lauwaert, J. Van Gheluwe, P. Clauws, An Accurate Analytical Approximation to the Capacitance Transient Amplitude in Deep Level Transient Spectroscopy for Fitting Carrier Capture Data, Rev. Sci. Instrum. 79(9), 093902, 2008.
  • [9] S. Kumar, P. Gupta, I. Guiney, C.J. Humphreys, S. Raghavan, R. Muralidharan, D.N. Nath, Temperature and Bias Dependent Trap Capture Cross Section in AlGaN/GaN HEMT on 6-in Silicon with Carbon-Doped Buffer, IEEE Trans. Electron Devices 64(12), 4868–4874, 2017.
  • [10] J.H. Zhao, T.E. Schlesinger, A.G. Milnes, Determination of Carrier Capture Cross Sections of Traps by Deep Level Transient Spectroscopy of Semiconductors, J. Appl. Phys. 62(7), 2865-2870, 1987.
  • [11] D. Pons, Determination of the Free Energy Level of Deep Centers, with Application to GaAs, Appl. Phys. Lett. 37(4), 413-415, 1980.
  • [12] D. Pons, Accurate Determination of the Free Carrier Capture Kinetics of Deep Traps by Space-Charge Methods, J. Appl. Phys. 55(10), 3644-3657, 1984.
  • [13] D. Stievenard, J.C. Bourgoin, M. Lannoo, An Easy Method to Determine Carrier-Capture Cross Sections: Application to GaAs, J. Appl. Phys. 55(6), 1477-1481, 1984.
  • [14] F.D. Auret, S.A. Goodman, M.J. Legodi, W.E. Meyer, D.C. Look, Electrical Characterization of Vapor-Phase-Grown Single-Crystal ZnO, Appl. Phys. Lett. 80(8), 1340–1342, 2002.
  • [15] E. Omotoso, E. Igumbor, W.E. Meyer, DLTS Characterisation of 107 MeV Krypton Ion-Irradiated Nitrogen-Doped 4H-Silicon Carbide, J. Mater. Sci.: Mater. Electron. 36(3), 2025.
  • [16] A. Kumar, S. Mondal, K.S.R. Koteswara Rao, Probing the Oxygen Vacancy Associated Native Defects in High-κ HfO₂ Using Deep Level Transient Spectroscopy, J. Appl. Phys. 135(4), 045305, 2024.
  • [17] C.A. Dawe, V.P. Markevich, M.P. Halsall, I.D. Hawkins, A.R. Peaker, A. Nandi, I. Sanyal, M. Kuball, Deep Level Traps in (010) β-Ga₂O₃ Epilayers Grown by Metal Organic Chemical Vapor Deposition on Sn-Doped β-Ga₂O₃ Substrates, J. Appl. Phys. 136(4), 045705, 2024.
Toplam 17 adet kaynakça vardır.

Ayrıntılar

Birincil Dil İngilizce
Konular Elektronik,Optik ve Manyetik Malzemeler, Malzeme Karekterizasyonu, Saf Yarı İletkenler
Bölüm Araştırma Makalesi
Yazarlar

Ömer Göksel Erbaş 0000-0002-6467-9302

Yasar Gürkan Celebi 0000-0003-1849-1197

Gönderilme Tarihi 3 Şubat 2025
Kabul Tarihi 3 Mart 2025
Erken Görünüm Tarihi 5 Nisan 2025
Yayımlanma Tarihi 1 Haziran 2025
IZ https://izlik.org/JA26LL36NK
Yayımlandığı Sayı Yıl 2025 Cilt: 3 Sayı: 1

Kaynak Göster

APA Erbaş, Ö. G., & Celebi, Y. G. (2025). DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS. Akdeniz Mühendislik Dergisi, 3(1), 45-55. https://izlik.org/JA26LL36NK
AMA 1.Erbaş ÖG, Celebi YG. DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS. AKUJE. 2025;3(1):45-55. https://izlik.org/JA26LL36NK
Chicago Erbaş, Ömer Göksel, ve Yasar Gürkan Celebi. 2025. “DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS”. Akdeniz Mühendislik Dergisi 3 (1): 45-55. https://izlik.org/JA26LL36NK.
EndNote Erbaş ÖG, Celebi YG (01 Haziran 2025) DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS. Akdeniz Mühendislik Dergisi 3 1 45–55.
IEEE [1]Ö. G. Erbaş ve Y. G. Celebi, “DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS”, AKUJE, c. 3, sy 1, ss. 45–55, Haz. 2025, [çevrimiçi]. Erişim adresi: https://izlik.org/JA26LL36NK
ISNAD Erbaş, Ömer Göksel - Celebi, Yasar Gürkan. “DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS”. Akdeniz Mühendislik Dergisi 3/1 (01 Haziran 2025): 45-55. https://izlik.org/JA26LL36NK.
JAMA 1.Erbaş ÖG, Celebi YG. DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS. AKUJE. 2025;3:45–55.
MLA Erbaş, Ömer Göksel, ve Yasar Gürkan Celebi. “DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS”. Akdeniz Mühendislik Dergisi, c. 3, sy 1, Haziran 2025, ss. 45-55, https://izlik.org/JA26LL36NK.
Vancouver 1.Ömer Göksel Erbaş, Yasar Gürkan Celebi. DETERMINING CAPTURE CROSS SECTION FROM CAPTURE TRANSIENT SIGNALS. AKUJE [Internet]. 01 Haziran 2025;3(1):45-5. Erişim adresi: https://izlik.org/JA26LL36NK