ÇİFT TARAFLI YÜKLEME ALTINDA FARKLI MUKOZA KALINLIKLARININ İKİ TİP İMPLANT DESTEKLİ OVERDENTURE DİZAYNI ÜZERİNDEKİ STRES DAĞILIMINA ETKİSİ

Yıl 2019, Cilt: 29 Sayı: 2, 277 - 286, 22.03.2019

Özgün Yusuf Özyılmaz , Filiz Aykent

https://doi.org/10.17567/ataunidfd.461225

Öz

Amaç:
Bu çalışmanın amacı fotoelastik stres analiz yöntemi kullanılarak çift taraflı
yükleme altında farklı mukoza kalınlığının, iki implant destekli mandibular
overdenture tasarımları üzerindeki stres dağılımına etkisini değerlendirmektir.

Gereç ve Yöntem:
Kaninler bölgesine iki adet bağımsız implant (4,0x11 mm; Fixture Osseospeed
İmplant, Astra Tech, Mölndal, İsveç) yerleştirilerek altı adet alt çene dişsiz
fotoelastik modeller üretildi.  Çalışılan
ataçman sistemler, locator ve ball stud ataçman sistemlerdi.  Ball ve locator grupların her ikisi de,
farklı mukoza kalınlıkları (1mm-1mm, 1mm-2mm, 1mm-4mm ) sağlayan  farklı rezidüel kret yüksekliğine sahip üç
farklı modelden oluşmaktadır. Birinci molarların santral fossalarına çift taraflı
olarak 135 N statik vertikal kuvvet uygulandı. 
Modeller, yükleme altında implantların etrafında ve implantlar arası
bölgede  izokromatik fringeleri gözlemek
için dairesel polariskop alanına yerleştirildi. Fotoelastik stres fringeleri
monitörize edildi ve fotoğrafik olarak kaydedildi.

Bulgular:
Ball ataçman grupların tüm test modellerinde locator gruplardan daha yüksek
stres değerleri gözlendi. Her iki ataçman tasarımında en düşük stres değerleri
1mm-1mm mukoza kalınlığındaki modellerde görüldü. Locator grupların ball
ataçman gruplara göre stresi daha homojen dağıttığı gözlendi.

Sonuç:
Bu çalışmanın sonucuna göre, protez yapımı için yerleştirilen implantlar
arasında farklı mukoza kalınlıkları varlığında locator ataçman seçimi ball
ataçmana göre daha dengeli stres dağılımı sebebiyle avantaj sağlamaktadır.

Anahtar Sözcükler: Fotoelastik
analiz, mukoza kalınlığı, stres dağılımı,  çift taraflı yükleme

Anahtar Kelimeler

Fotoelastik analiz, mukoza kalınlığı, stres dağılımı

Kaynakça

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