EN
In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors
Öz
In this paper, an electromechanical in-situ measurement method is to be developed for determination of some properties of fuel-oils. Electromechanical impedance spectroscopy (EMIS) method is to be utilized in the measurement technique which will be developed. This method uses piezoelectric sensors that work in electromechanical principles as resonator and dynamically determines the characteristics of a medium that the resonator interacts. EMIS method has been mostly used to determine the dynamic changes in elastic properties of solid materials.This method utilizes the shear horizontal piezoelectric wafer active sensor (SH-PWAS) to generate shear horizontal mode standing waves. Piezoelectric wafer active sensors (PWAS), that are to be utilized in this study, have recently been developed as easily manufactured, small in size and weight, and broad banded transducers to utilize in qualitative and quantitative measurement systems.
Anahtar Kelimeler
Kaynakça
- V. Giurgiutiu, J. Bao, and W. Zhao, “Active Sensor Wave Propagation Health Monitoring of Beam and Plate Structures,” in Proc of SPIE’s 8th International Symposium on Smart Structures and Materials, 2001, no. March.
- C. Liang, F. P. Sun, and C. a. Rogers, “Coupled Electro-Mechanical Analysis of Adaptive Material Systems -- Determination of the Actuator Power Consumption and System Energy Transfer,” J. Intell. Mater. Syst. Struct., vol. 5, no. 1, pp. 12–20, Jan. 1994.
- F. P. Sun, C. Liang, and C. A. Rogers, “Structural modal analysis using collocated piezoelectric actuator/sensors: an electromechanical approach,” in Proc. SPIE 2190, Smart Structures and Materials 1994: Smart Structures and Intelligent Systems, 238, 1994.
- A. N. Zagrai and V. Giurgiutiu, “Electro-Mechanical Impedance Method for Damage Identification in Circular Plates,” vol. 40, 2001.
- G. Park, H. Sohn, C. R. Farrar, and D. J. Inman, “Overview of Piezoelectric Impedance-Based Health Monitoring and Path Forward,” Shock Vib. Dig., vol. 35, no. 6, pp. 451–463, Nov. 2003.
- S. Bhalla, P. Kumar, A. Gupta, and T. K. Datta, “Simplified Impedance Model for Adhesively Bonded Piezo-Impedance Transducers,” J. Aerosp. Eng., vol. 22, no. 4, pp. 373–382, Oct. 2009.
- H. A. Tinoco and A. L. Serpa, “Bonding influence on the electromechanical admittance of piezoelectric sensors bonded to structures based on EMI technique,” 2011.
- V. G. Annamdas and M. a. Radhika, “Electromechanical impedance of piezoelectric transducers for monitoring metallic and non-metallic structures: A review of wired, wireless and energy-harvesting methods,” J. Intell. Mater. Syst. Struct., vol. 24, no. 9, pp. 1021–1042, Mar. 2013.
Ayrıntılar
Birincil Dil
İngilizce
Konular
-
Bölüm
-
Yazarlar
Yayımlanma Tarihi
26 Mayıs 2015
Gönderilme Tarihi
26 Mayıs 2015
Kabul Tarihi
-
Yayımlandığı Sayı
Yıl 2015 Cilt: 1 Sayı: 2
APA
Kamaş, T. (2015). In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors. International Journal of Engineering Technologies IJET, 1(2), 65-71. https://doi.org/10.19072/ijet.105713
AMA
1.Kamaş T. In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors. IJET. 2015;1(2):65-71. doi:10.19072/ijet.105713
Chicago
Kamaş, Tuncay. 2015. “In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors”. International Journal of Engineering Technologies IJET 1 (2): 65-71. https://doi.org/10.19072/ijet.105713.
EndNote
Kamaş T (01 Haziran 2015) In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors. International Journal of Engineering Technologies IJET 1 2 65–71.
IEEE
[1]T. Kamaş, “In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors”, IJET, c. 1, sy 2, ss. 65–71, Haz. 2015, doi: 10.19072/ijet.105713.
ISNAD
Kamaş, Tuncay. “In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors”. International Journal of Engineering Technologies IJET 1/2 (01 Haziran 2015): 65-71. https://doi.org/10.19072/ijet.105713.
JAMA
1.Kamaş T. In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors. IJET. 2015;1:65–71.
MLA
Kamaş, Tuncay. “In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors”. International Journal of Engineering Technologies IJET, c. 1, sy 2, Haziran 2015, ss. 65-71, doi:10.19072/ijet.105713.
Vancouver
1.Tuncay Kamaş. In-Situ Measurement Via E/M Impedance Spectroscopy Technique Using Shear Horizontal Piezoelectric Wafer Active Sensors. IJET. 01 Haziran 2015;1(2):65-71. doi:10.19072/ijet.105713