In this study, polythiophene-graphene (PTh-G) composite thin film was prepared on the n-type silicon (n-Si) semiconductor wafer by the spin coating method. Subsequently, the current-voltage (I-V) measurements were made on the fabricated Au/PTh-G/n-Si/Al device to ascertain the impact of the PTh-G interfacial layer on the device performance. The main device parameters such as ideality factor (n), barrier height (b), series resistance (Rs) were calculated by using the thermionic emission (TE) and Norde functions, and then, the obtained results were discussed in detail. Additionally, the capacitance-voltage (C-V) characteristic of the device was examined as a function of the frequency, and the device parameters such as diffusion potential (Vd), Fermi energy level (Ef), carrier concentration (Nd), b were detemined. Finally, the light intensity-dependent I-V measurements were taken to obtain information about the photoelectrical characteristics of the fabricated device. The obtained results have shown that the prepared composite material has a good potential to be used in optoelectronic applications such as photodiode, and photodetector.
Graphene Polythiophene Composite Material Photoresponse Photosensitivity
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The author would like to thank the NANOGRAFI Company (Turkey) for supplying graphene in this study.
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Birincil Dil | İngilizce |
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Konular | Metroloji,Uygulamalı ve Endüstriyel Fizik |
Bölüm | Araştırma Makalesi |
Yazarlar | |
Proje Numarası | Yok |
Yayımlanma Tarihi | 20 Ekim 2022 |
Gönderilme Tarihi | 14 Haziran 2022 |
Kabul Tarihi | 31 Ağustos 2022 |
Yayımlandığı Sayı | Yıl 2022 Cilt: 26 Sayı: 5 |
This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.