RF Magnetron Sıçratma ile Sentezlenen Nano Yapılı ZnO Yarıiletken İnce Filmlerin Optik ve Yüzey Özellikleri

Year 2019, , 759 - 767, 15.10.2019

Volkan Şenay

https://doi.org/10.17714/gumusfenbil.538545

Cited By: 1

Abstract

Bu araştırmada, RF
magnetron sıçratma tekniği ile 50 W, 100 W ve 125 W RF güçleri ile üç ayrı
deneyde ZnO ince filmler cam mikroskop lamlarının üzerine biriktirilmiştir. Her
biriktirme işlemi 30 dakika sürdürülmüştür. Spektroskopik reflektometre, UV-VIS
spektrofotometre ve atomik kuvvet mikroskobu (AFM), üretilen ince filmlerin
optik ve yüzey özellikleri üzerine sıçratma gücünün etkisini incelemek için
kullanılmıştır. Yansıtma ve geçirgenlik düzeyi, kırılma indisi ve yasak enerji
aralığı değerleri ile yüzey homojenliği ve pürüzlülüğün RF gücüne bağlı olduğu
bulunmuştur. Yasak enerji aralığı yaklaşık 3.83-3.87 eV civarındadır. Üretilen
son derece şeffaf ZnO ince filmler, çeşitli optoelektronik cihazlar ve
gelecekteki şeffaf iletken elektrot uygulamalarında kullanılabilir.

Keywords

Optical properties, RF magnetron sıçratma, Yüzey özellikleri, ZnO ince filmler

Optical and Surface Properties of Nanostructured ZnO Semiconductor Thin Films Synthesized by RF Magnetron Sputtering

Abstract

In this
research, ZnO thin films were deposited on glass microscope slides in three
separate experiments with RF input powers of 50 W, 100 W and 125 W by means of
RF magnetron sputtering technique. Each deposition process was conducted for 30
minutes. Spectroscopic reflectometer, UV-VIS
spectrophotometer and atomic force microscope (AFM) were used to examine the effect of
sputtering power on the optical and surface properties of the produced thin
films. The level of reflectivity and transparency, refractive index and band
gap energy values as well as surface homogeneity and roughness were
observed to rely on the RF input power. The optical band gap energy values were
about 3.83-3.87 eV. The produced highly transparent ZnO thin films can be used
in various optoelectronic devices and future transparent conductive electrode
implementations.

Keywords

RF magnetron sputtering, Surface properties, Optical properties, ZnO thin films

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