Fonksiyonel gruplu polistirenlerin fotolitografik özelliklerinin incelenmesi

Year 2022, Volume: 28 Issue: 7, 993 - 1000, 30.12.2022

Alaaddin Cerit

Abstract

Bu çalışmada farklı molekül kütleli PS’lerin fonksiyonel modifikatörlerle (maleik anhidrit (MA) ve asetik anhidrit (AA)), BF3O(C2H5)2 katalizörlüğünde optimum reaksiyon şartlarında kimyasal modifikasyonu yapılmış ve aromatik halkasına aktif fonksiyonel gruplar (MAPS: -CO-CH=CH-COOH ve AAPS: -CO-CH3) bağlanmıştır. Sentezlenen modifiye PS’lere bağlanan karboksil ve asetil grupların yapısına bağlı olarak fotolitografik özellikleri, çözünürlük tayini ve FTIR analizi ile incelenmiş ayrıca sensibilizatör-aktivatör borneol maddesinin fotolitografik özellikler üzerindeki etkisi araştırılmıştır. Sonuçta optimum reaksiyon şartları PS: modifikatör mol oranı 1:0.2; modifikatör: katalizör mol oranı 1:1 olarak bulunmuş ve düşük molekül ağırlıklı PS’lerin yapısına daha fazla fonksiyonel grup bağlandığı tespit edilmiştir. Modifiye PS’lerin toluende PS’ye göre daha az çözündüğü (sırasıyla %70.04 ve %85.48) tesbit edilmiştir. Işınlamadan sonra yapılan çözünürlük testlerinde en iyi değer %54.51 ile MAPS’den elde edilirken AAPS’nin çözünürlük değerlerinde dikkate değer bir değişim olmamıştır (%83.46). Borneol maddesinin ilavesinden sonra yapılan ışınlama işlemiyle MAPS’nin çözünürlük değeri %49.67’ye kadar düşerken, AAPS’nin çözünürlük değerlerinde önemli bir değişim olmamıştır (%84.50). Ayrıca MAPS’lerde ışınlama süresine bağlı olarak çözünürlük değerlerinde azalma gözlemlenirken bu durum AAPS’lerde görülmemiştir. UV ışınlama sonrasında MAPS’lerin çözünürlüğündeki azalma MAPS’lerin ışığa duyarlılık özelliği gösterdiğini ve ışınlama etkisiyle çapraz bağlanma yeteneğine sahip negatif fotorezist olduğunu göstermiştir. Borneol’ün de fotorezist özelliği desteklediği görülmüştür. AAPS’ler ise PS’ye göre daha düşük çözünürlük değerleri vermesine karşın UV-ışınlamadan sonra çözünürlük değerlerinde dikkate değer bir değişiklik görülmemiş ve AAPS’lerin fotorezist özellik göstermediği belirlenmiştir.

Keywords

Fotorezist, polistiren, modifikasyon, anhidrit

Evaluation of photolitographic properties of functional groups containing polystyrenes

Abstract

In this study, different molecular weighted PSs were chemically modified by two functional modifiers (maleic anhydride (MA) and acetic anhydride (AA)) under optimum reaction conditions with BF3O(C2H5)2 catalyst and the bonding of active functional groups (MAPS: -CO-CH=CH-COOH and AAPS: -CO-CH3) to the aromatic ring of the polymer was carried out. Depending on the structure of the carboxyl and acetyl groups attached to the aromatic ring, the photolithographic properties were examined by solubility and FT-IR analysis, also the effect of borneol, which is used as a sensitizer-activator, on photolithographic properties was investigated. As a result, the optimum reaction conditions was found to be as PS:modifier mole ratio 1:0.2; modifier:catalyst molar ratio 1:1 and it was determined that more functional groups were attached to the structure of lower molecular weighted PS. It was determined that modified PSs dissolved less in toluene than virgin PS (70.04% and 85.48% respectively). In dissolution tests performed after irradiation, the best value was obtained from MAPS (54.51%), while there was no significant change in the dissolution values of AAPS (83.46%). However the solubility value of MAPS decreased to 49.67% with the irradiation process performed after the addition of borneol substance but there was no significant change in the solubility values of AAPS (84.50%). In addition, it was observed that the dissolution values decreased depending on the irradiation time in MAPS, but it was not observed in AAPS. The decrease in dissolution of MAPS after UV irradiation has proven that MAPSs are light sensitive and they are negative photoresists that crosslinked by light effect. It was observed that the borneol also supports the photoresist feature. Although AAPS gives lower dissolution values than virgin PS but no significant change was observed in dissolution values after UVirradiation and it was determined that AAPS did not present photoresist properties.

Keywords

Photoresist, polystyrene, modification, anhydrite

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