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Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method

Cilt: 11 Sayı: 1 31 Mart 2026
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Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method

Öz

In this study, the direct and transfer-free synthesis of ultrathin hexagonal Boron Nitride (h BN) films on non-catalytic quartz substrates was investigated using the Low-Pressure Chemical Vapor Deposition (LPCVD) method. The effects of key growth parameters, including growth duration (15-90 min), precursor amount (50-200 mg), and precursor decomposition temperature (80-100°C), were systematically investigated to achieve high quality film growth. Spectroscopic characterization confirmed the formation of the h-BN phase, with Raman spectra exhibiting the characteristic E2g vibrational mode and FT-IR analysis showing the distinct B-N stretching and B-N-B bending bonds at 1370 and 800 cm-1, respectively. UV-Vis spectroscopy revealed high optical transparency (>95%) in the visible region, and Tauc plot analysis yielded an optical bandgap of 5.68 eV. This widening of the bandgap relative to bulk h-BN (~5.2 eV) provides quantitative evidence of the few-layer nature of the films due to the quantum confinement effect. The results demonstrate that the optimized LPCVD process allows for the precise control of h-BN synthesis on dielectric surfaces, eliminating the need for metal catalysts and complex transfer processes for optoelectronic applications.

Anahtar Kelimeler

Kaynakça

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Ayrıntılar

Birincil Dil

İngilizce

Konular

Malzeme Üretim Teknolojileri

Bölüm

Araştırma Makalesi

Yayımlanma Tarihi

31 Mart 2026

Gönderilme Tarihi

15 Aralık 2025

Kabul Tarihi

23 Ocak 2026

Yayımlandığı Sayı

Yıl 2026 Cilt: 11 Sayı: 1

Kaynak Göster

APA
Bozkaya, M., Arik, M. N., Altuntepe, A., Ateş, H., & Zan, R. (2026). Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method. Journal of Boron, 11(1), 13-21. https://doi.org/10.30728/boron.1840796
AMA
1.Bozkaya M, Arik MN, Altuntepe A, Ateş H, Zan R. Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method. Journal of Boron. 2026;11(1):13-21. doi:10.30728/boron.1840796
Chicago
Bozkaya, Meryem, Muhammet Nasuh Arik, Ali Altuntepe, Hakan Ateş, ve Recep Zan. 2026. “Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method”. Journal of Boron 11 (1): 13-21. https://doi.org/10.30728/boron.1840796.
EndNote
Bozkaya M, Arik MN, Altuntepe A, Ateş H, Zan R (01 Mart 2026) Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method. Journal of Boron 11 1 13–21.
IEEE
[1]M. Bozkaya, M. N. Arik, A. Altuntepe, H. Ateş, ve R. Zan, “Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method”, Journal of Boron, c. 11, sy 1, ss. 13–21, Mar. 2026, doi: 10.30728/boron.1840796.
ISNAD
Bozkaya, Meryem - Arik, Muhammet Nasuh - Altuntepe, Ali - Ateş, Hakan - Zan, Recep. “Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method”. Journal of Boron 11/1 (01 Mart 2026): 13-21. https://doi.org/10.30728/boron.1840796.
JAMA
1.Bozkaya M, Arik MN, Altuntepe A, Ateş H, Zan R. Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method. Journal of Boron. 2026;11:13–21.
MLA
Bozkaya, Meryem, vd. “Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method”. Journal of Boron, c. 11, sy 1, Mart 2026, ss. 13-21, doi:10.30728/boron.1840796.
Vancouver
1.Meryem Bozkaya, Muhammet Nasuh Arik, Ali Altuntepe, Hakan Ateş, Recep Zan. Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method. Journal of Boron. 01 Mart 2026;11(1):13-21. doi:10.30728/boron.1840796