Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi

Hakan Ateş; Meryem Polat Gönüllü

doi:10.29109/gujsc.593292

Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi

Öz

Gelişmekte olan teknoloji ile birlikte optoelektronik, enerji çevrimi, nanomedikal uygulamaları ve katalizör malzemeler gibi pek çok alanda teknolojinin minyatürleşmesi sebebiyle nano-boyutta malzeme üretiminin gerekliliği önem kazanmıştır. Bu sebeple son zamanlarda yapılan bilimsel çalışmalar atomik-boyutta ince film kaplama ve büyütme teknolojilerine odaklanmışlardır. Tam da bu noktada, atomik-boyutta üstün kaliteli kaplamalar yapmaya imkân sağlayan atomik katman biriktirme (ALD) ince film üretim tekniği devreye girmektedir. Bu çalışmada, ALD tekniği hakkında temel bilgi verilmiş, ALD kullanılarak 200 ºC taban sıcaklığında silisyum yongalar üzerine ZnO, TiO₂ ve Al₂O₃ince filmler kaplanmıştır. Homojen yüzeyli ince film kaplamaların yapılabilmesi için öncelikle deneysel parametreler değiştirilerek farklı tekrarlarda üretimler gerçekleştirilmiştir ve en uygun deney koşulları belirlenmiştir. Detaylı karakterizasyon işlemleri en uygun üretim koşulları altında kaplama homojenliği sağlayabilmiş ZnO, TiO₂ ve Al₂O₃ince filmler için yapılmıştır. Üretilen filmlerin homojen bir yapıya sahip olup olmadığını belirlemek için spektroskopik elipsometri tekniği kullanılarak çeşitli noktalarından kalınlıkları saptanmıştır. Ayrıca kristal yapıları hakkında bilgi edinmek adına X-ışını kırınım desenleri incelenmiştir.

Anahtar Kelimeler

ALD,ince filmler,kaplama,nano teknoloji

Teşekkür

Bu çalışma, 07/2015-08 ve 07/2016-11 numaralı Gazi Üniversitesi Bilimsel Araştırma Projeleri desteğine ve Okyay Technology R&D tarafından desteklendi.

Kaynakça

Kaynaklar (References)
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Ayrıntılar

Birincil Dil

Türkçe

Konular

Mühendislik

Bölüm

Araştırma Makalesi

Yazarlar

Hakan Ateş ^*
0000-0002-5132-4107
Türkiye

Meryem Polat Gönüllü Bu kişi benim
Türkiye

Yayımlanma Tarihi

27 Eylül 2019

Gönderilme Tarihi

17 Temmuz 2019

Kabul Tarihi

6 Ağustos 2019

Yayımlandığı Sayı

Yıl 2019 Cilt: 7 Sayı: 3

DOI

https://doi.org/10.29109/gujsc.593292

IZ

https://izlik.org/JA28SA27ZB

Kaynak Göster

RIS / Bibtex

APA

Ateş, H., & Polat Gönüllü, M. (2019). Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji, 7(3), 649-660. https://doi.org/10.29109/gujsc.593292

AMA

1.Ateş H, Polat Gönüllü M. Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi. GUJS Part C. 2019;7(3):649-660. doi:10.29109/gujsc.593292

Chicago

Ateş, Hakan, ve Meryem Polat Gönüllü. 2019. “Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi”. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji 7 (3): 649-60. https://doi.org/10.29109/gujsc.593292.

EndNote

Ateş H, Polat Gönüllü M (01 Eylül 2019) Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji 7 3 649–660.

IEEE

[1]H. Ateş ve M. Polat Gönüllü, “Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi”, GUJS Part C, c. 7, sy 3, ss. 649–660, Eyl. 2019, doi: 10.29109/gujsc.593292.

ISNAD

Ateş, Hakan - Polat Gönüllü, Meryem. “Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi”. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji 7/3 (01 Eylül 2019): 649-660. https://doi.org/10.29109/gujsc.593292.

JAMA

1.Ateş H, Polat Gönüllü M. Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi. GUJS Part C. 2019;7:649–660.

MLA

Ateş, Hakan, ve Meryem Polat Gönüllü. “Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi”. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji, c. 7, sy 3, Eylül 2019, ss. 649-60, doi:10.29109/gujsc.593292.

Vancouver

1.Hakan Ateş, Meryem Polat Gönüllü. Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi. GUJS Part C. 01 Eylül 2019;7(3):649-60. doi:10.29109/gujsc.593292

Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi

Atomik Katman Biriktirme Tekniğine Genel Bakış: Zno, Tio2 Ve Al2o3 Filmlerin Üretimi

Öz

Anahtar Kelimeler

Teşekkür

Kaynakça

Ayrıntılar

Birincil Dil

Konular

Bölüm

Yazarlar

Yayımlanma Tarihi

Gönderilme Tarihi

Kabul Tarihi

Yayımlandığı Sayı

DOI

IZ

Kaynak Göster

Cited By

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Dynamics in between Structural and Electrical Properties of as Grown ZnO Thin Films by Thermal ALD