Magnetron sıçratma yöntemiyle biriktirilen TiWSiN ince filmlerin yapısal ve tribolojik özelliklerine farklı azot akış hızlarının etkisinin araştırılması

Yıl 2025, Cilt: 15 Sayı: 3, 740 - 752, 15.09.2025

Semih Duran , Ahmet Melik Yılmaz , Hikmet Çiçek

https://doi.org/10.17714/gumusfenbil.1664390

Öz

TiWSiN ince filmler magnetron sıçratma yöntemiyle farklı azot akış hızlarında biriktirilerek üretilmiştir. Taramalı elektron mikroskobu (SEM) ile üretilen filmlerin kalınlıkları 1.71 µm ve 1.39 µm olarak ölçülmüştür. Artan azot akış miktarının, film kalınlıklarında belirgin bir azalmaya yol açtığı gözlemlenmiştir. X-ışını kırınım (XRD) cihazı ile TiWSiN ince filmlerde farklı açı ve düzlemlerde sadece TiN kristallerinin oluştuğu belirlenmiştir. Enerji dağılımlı spektroskopi (EDS) cihazı ile filmlerin kimyasal kompozisyonlarını oluşturan Ti, W, Si ve N elementlerinin atomik oranları belirlenmiştir. TiWSiN ince filmlerin sertlik değerlerinin tespit edilmesi için mikro sertlik ölçümleri yapılmıştır. En yüksek sertlik değeri 6.8 GPa ile N-40 filminde ölçülmüştür. Filmin mikro yapısında baskın olan TiN (111) fazının varlığı, N-40 filminde sertliğin artmasına katkıda bulunmuştur. TiWSiN ince filmlerin tribolojik testleri aşınma cihazı ve 3D profilometre cihazı kullanılarak araştırılmıştır. Yapılan aşınma testlerinde, N-40 filminin aşınma hızı 1.81×10-5 (mm3/(N.m)) ve N-50 filminin aşınma hızı ise 9.98×10-5 (mm3/(N.m)) olarak hesaplanmıştır. Sonuçlar incelendiğinde, 4 sccm azot akış hızında biriktirilen N-40 filminin aşınma direncinin N-50 filmine kıyasla yaklaşık 5.5 kat daha yüksek olduğu tespit edilmiştir. Tribotest sonuçları, N-40 filminin aşınma derinlik profilinin filmin taban malzeme üzerinde varlığını sürdürdüğünü açıkça ortaya koymuştur. Bu bulgular, N-40 filminin tribolojik performansının daha yüksek olduğunu göstermektedir. Sonuç olarak, azot akış hızının kontrolünün TiWSiN filmlerin performansını doğrudan etkilediği belirlenmiştir.

Anahtar Kelimeler

Aşınma , Magnetron sıçratma , Sürtünme katsayısı , Sertlik , TiWSiN

Investigation of the effect of different nitrogen flow rates on the structural and tribological properties of TiWSiN thin films deposited by magnetron sputtering

Öz

TiWSiN thin films were deposited using the magnetron sputtering method at different nitrogen flow rates. The thicknesses of the films, measured by scanning electron microscopy (SEM), were 1.71 µm and 1.39 µm. An increase in nitrogen flow resulted in a noticeable reduction in film thickness. X-ray diffraction (XRD) analysis confirmed the formation of only TiN crystals in different angles and planes. The atomic ratios of Ti, W, Si, and N elements forming the chemical composition of the films were determined using energy dispersive spectroscopy (EDS). Microhardness measurements were performed to determine the hardness values of TiWSiN thin films. The highest hardness value of 6.8 GPa was measured in the N-40 film. The presence of the predominant TiN (111) phase in the film’s microstructure has contributed to the increased hardness in the N-40 film. The tribological tests of TiWSiN thin films were investigated using a wear testing device and a 3D profilometer. The wear rates were calculated as 1.81×10-5 mm3/(N·m) for N-40 and 9.98×10-5 mm3/(N·m) for N-50. The results revealed that the wear resistance of the N-40 film, deposited at 4 sccm nitrogen flow, was approximately 5.5 times higher than that of N-50. Tribotest results showed that the wear depth profile of N-40 remained intact on the substrate. These findings indicate that the N-40 film exhibits better tribological performance. Consequently, it has been determined that the control of nitrogen flow rate directly affects the performance of TiWSiN thin films.

Anahtar Kelimeler

Wear , Magnetron sputtering , Coefficient of friction , Hardness , TiWSiN

Kaynakça

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