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ATOMİK KATMAN BİRİKTİRME (ALD) CİHAZLARI VE ÇEŞİTLERİNDEKİ GELİŞMELER

Yıl 2018, , 590 - 605, 11.12.2018
https://doi.org/10.21923/jesd.392032

Öz

Malzemelerin
yüzey özelliklerinin değiştirilmesi ile elde edilen ürünlere kendi
özelliklerinin yanında farklı işlevsellikler kazandırılabilmektedir. Yüzey
teknolojilerindeki gelişmeler yeni ürünlerin eldesini ve üretim süreçlerinin
gelişmesini de sağlamaktadır. ALD yöntemi çok farklı uygulama alanlarında
başarı ile uygulanma potansiyeline sahiptir. Global ALD endüstrisi market
araştırmaları 2017-2025 yılları arasında yıllık %12’lik büyüme öngörmektedir. Bu
makalede ince film biriktirme tekniklerinden biri olan atomik katman biriktirme
(ALD) yönteminde kullanılan cihazların tarihsel gelişimi ve gelişen ALD
çeşitleri incelenmiştir. Çalışma genel ALD çeşitlerinin yanında doğrudan
yazmalı (Direct write) ve rulodan ruloya (Roll to roll) gibi yeni ALD çeşitleri
hakkında bilgi vermektedir. 

Kaynakça

  • Referans1 Aarik, J., Akbashev, A., Bechelany, M., Berdova, M., Cameron, D., Chekurov, N., . . . Ylivaara, O. 2014. On the Early History of ALD: Molecular Layering. 14th Int. Conf. on Atomic Layer Deposition'da sunulan bildiri. Kyoto, Japan.
  • Referans2 Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., . . . Yurkevich, O., 2017. Review Article: Recommended Reading List of Early Publications on Atomic Layer Deposition—Outcome of the “Virtual Project on the History of ALD”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 35(1), 010801-13.
  • Referans3 Backman, L. B., Rautiainen, A., Krause, A. O. I., Lindblad, M., 1998. A Novel Co/SiO2 Catalyst for Hydrogenation. Catal. Today, 43(1-2), 11-19.
  • Referans4 Beetstra, R., Lafont, U., Nijenhuis, J., Kelder, E. M., Van Ommen, J. R., 2009. Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition. Chemical Vapor Deposition, 15(7-9), 227-233.
  • Referans5 Bishal, A. K., Butt, A., K Selvaraj, S., Joshi, B., Patel, S., Huang, S., . . . Takoudis, C., 2015. Atomic Layer Deposition in Bio-Nanotechnology: A Brief Overview. Critical Reviews Biomed Eng., 43(4), 255-276.
  • Referans6 Bui, H. V., Grillo, F., Ommen, J. R., 2017. Atomic and Molecular Layer Deposition: off the Beaten Track. The Royal Society of Chemistry Chem. Commun.(53), 45-71.
  • Referans7 Carcia, P. F., McLean, R. S., Groner, M. D., Dameron, A. A., George, S. M., 2009. Gas Diffusion Ultrabarriers on Polymer Substrates Using Al2O3 Atomic Layer Deposition and SiN Plasma-enhanced Chemical Vapor Deposition. Journal of Applied Physics, 106(2), 023533-6.
  • Referans8 Delft-imp.nl, 2015. History of ALD. Erişim Tarihi: 12.05.2015. http://delft-imp.nl/technology/
  • Referans9 Drozd, V. 2016. Progress in Device from Molecular Layering to Atomic Layer Deposition Worldwide Technology. 14th. International Baltic Conference on Atomic Layer Deposition (BALD)'da sunulan bildiri. St. Petersburg, Russia.
  • Referans10 Ferguson, J. D., Weimer, A. W., George, S. M., 2000a. Atomic Layer Deposition of Al2O3 and SiO2 on BN particles Using Sequential Surface Reactions. Applied Surface Science, 162(2000), 280-292.
  • Referans11 Ferguson, J. D., Weimer, A. W., George, S. M., 2000b. Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles. Thin Solid Films, 371(1-2), 95-104.
  • Referans12 George, S. M., 2010. Atomic Layer Deposition: An Overview. Chemical Reviews, 110(1), 111-131.
  • Referans13 George, S. M., Ferguson, J. D., Weimer, A. W. 1999. U.S. Patent.
  • Referans14 George, S. M., Ott, A. W., Klaus, J. W., 1996. Surface Chemistry for Atomic Layer Growth. Journal of Physical Chemistry, 100(31), 13121-13131.
  • Referans15 Ghiraldelli, E., Pelosi, C., Gombia, E., Chiavarotti, G., Vanzetti, L., 2008. ALD growth, Thermal Treatments and Characterisation of Al2O3 Layers. Thin Solid Films, 517(1), 434-436.
  • Referans16 Goldstein, D. N., McCormick, J. A., George, S. M., 2008. Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry. Journal of Physical Chemistry C, 112(49), 19530-19539.
  • Referans17 Grandviewresearch.com, 2018. Atomic Layer Deposition (ALD) Market Size. Erişim Tarihi: 25.01.2018. https://www.grandviewresearch.com/press-release/global-atomic-layer-deposition-market
  • Referans18 Granneman, E., Fischer, P., Pierreux, D., Terhorst, H., Zagwijn, P., 2007. Batch ALD: Characteristics, Comparison with Single Wafer ALD, and Examples. Surface and Coatings Technology, 201(22), 8899-8907.
  • Referans19 Groner, M. D., Elam, J. W., Fabreguette, F. H., George, S. M., 2002. Electrical Characterization of Thin Al2O3 Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates. Thin Solid Films, 413(1-2), 186-197.
  • Referans20 Hakim, L. F., Blackson, J., George, S. M., Weimer, A. W., 2005. Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor. Chemical Vapor Deposition, 11(10), 420-425.
  • Referans21 Hakim, L. F., Portman, J. L., Casper, M. D., Weimer, A. W., 2005. Aggregation Behavior of Nanoparticles in Fluidized Beds. Powder Technology, 160(3), 149-160.
  • Referans22 Higashi, G. S., Fleming, C. G., 1989. Sequential Surface Chemical-Reaction Limited Growth of High-Quality Al2O3 Dielectrics. Applied Physics Letters, 55(19), 1963-1965.
  • Referans23 Hwang, C. S., Yoo, C. Y. 2014. Atomic Layer Deposition for Semiconductors. Springer Science+Business Media. New York.
  • Referans24 Jang, B., Kim, S. H., 2016. Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules. Korean Journal of Materials Research, 26(8), 430-437.
  • Referans25 Johnson, R. W., Hultqvist, A., Bent, S. F., 2014. A Brief Review of Atomic Layer Deposition: From Fundamentals to Applications. Materials Today, 17(5), 236-246.
  • Referans26 Jones, A. C., Hitchman, M. L. 2009. Chemical Vapour Deposition: Precursors, Processes and Applications. RSC Publising. USA.
  • Referans27 Jung, Y. S., Cavanagh, A. S., Riley, L. A., Kang, S. H., Dillon, A. C., Groner, M. D., . . . Lee, S. H., 2010. Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li-Ion Batteries. Advanced Materials, 22(19), 2172–2176.
  • Referans28 Kääriäinen, T., Cameron, D., Kääriäinen, M., Sherman, A. 2013. Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applications. Scrivener Publishing LLC Wiley. Massachusetts.
  • Referans29 Kessels, W. M. M., Putkonen, M., 2011. Advanced Process Technologies: Plasma, Direct-write, Atmospheric pressure, and Roll-to-roll ALD. Mrs Bulletin, 36(11), 907-913.
  • Referans30 Kilbury, O. J., Barrett, K. S., Fu, X. W., Yin, J., Dinair, D. S., Gump, C. J., . . . King, D. M., 2012. Atomic Layer Deposition of Solid Lubricating Coatings on Particles. Powder Technology(221), 26-35.
  • Referans31 Kim, D., Baek, S., Kim, Y. 2011. Energy Barriers for Trimethylaluminum Reaction with Varying Surface Hydroxyl Density. Applied Surface Science, 258, 225– 229.
  • Referans32 King, D. M., Liang, X. H., Weimer, A. W., 2012. Functionalization of Fine Particles Using Atomic and Molecular Layer Deposition. Powder Technology, 221, 13-25.
  • Referans33 King, M. D., A., S. J., Liang, X., Hakim, L. F., Weimer, A. W., 2007. Atomic Layer Deposition on Particles Using a Fluidized Bed Reactor with in Situ Mass Spectrometry. Surface & Coating Technology, (201), 9163-9171.
  • Referans34 Knez, M., Kadri, A., Wege, C., Gösele, U., Jeske, H., Nielsch, K., 2006. Atomic Layer Deposition on Biological Macromolecules:  Metal Oxide Coating of Tobacco Mosaic Virus and Ferritin. Nano Letters, 6(6), 1172-1177.
  • Referans35 Kunii, D., Levenspiel, O. 1991. Fluidization Engineering. Butterworth-Heinemann. U.S.A.
  • Referans36 Lei, W. 2006. Sensor Based Atomic Layer Depozition for Rapid Process Learning and Enchanced Manufacturability. University of Maryland, Doctoral thesis, 99pp, College Park.
  • Referans37 Leskela, M., Ritala, M., 2003. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges. Angewandte Chemie-International Edition, 42(45), 5548-5554.
  • Referans38 Levy, D. H., Kerr, R. S., Carey, J. T. 2009. U.S. Patent.
  • Referans39 Levy, D. H., Nelson, S. F., Freeman, D., 2009. Oxide Electronics by Spatial Atomic Layer Deposition. Journal of Display Technology, 5(12), 484-494.
  • Referans40 Limpt, V. B., Goulas, A., Ommen, J. R. 2015. Continuous production of ALD Nanostructured Particles for Catalysis. EcoNanoForum'da sunulan bildiri. http://euronanoforum2015.eu/wp-content/uploads/2015/06/12_Bart_van_Limpt_Continuous_production_of_ALD_nanostructured_particles_10_06_2015-1.2.pdf
  • Referans41 Lindblad, M., Haukka, S., Kytökivi, A., Lakomaa, E.-L., Rautiainen, A., Suntola, T., 1997. Processing of Catalysts by Atomic Layer Epitaxy: Modification of Supports. Applied Surface Science, 121/122, 286-291.
  • Referans42 Lindblad, M., Lindfors, L. P., Suntola, T., 1994. Preparation of Ni/Al2O3 Catalysts from Vapor Phase by Atomic Layer Epitaxy. Catalysis Letters, 27(3), 323-336.
  • Referans43 Longrie, D. 2013. Atomic Layer Deposition for Surface Engineering of Powders. Ghent University Doctoral thesis, 229 pp, Belgium.
  • Referans44 Longrie, D., Deduytsche, D., Detavernier, C., 2014. Reactor Concepts for Atomic Layer Deposition on Agitated Particles: A review. Journal of Vacuum Science & Technology A, 32(1), 010802-13.
  • Referans45 Longrie, D., Deduytsche, D., Haemers, J., Driesen, K., Detavernier, C., 2012. A Rotary Reactor for Thermal and Plasma-enhanced Atomic Layer Deposition on Powders and Small Objects. Surface & Coatings Technology, 213, 183-191.
  • Referans46 Ma, L. L., Pan, D. Q., Xie, Y. Y., Yuan, C., 2015. Atomic Layer Deposition of Al2O3 Process Emissions. Rsc Advances, 5(17), 12824-12829.
  • Referans47 Mackus, A. J. M., Thissen, N. F. W., Mulders, J. J. L., Trompenaars, P. H. F., Verheijen, M. A., Bol, A. A., Kessels, W. M. M., 2013. Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements. The Journal of Physical Chemistry C, 117(20), 10788-10798.
  • Referans48 Malygin, A. A., Drozd, V. E., Malkov, A. A., Smirnov, V. M., 2015. From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition Chemical Vapor Deposition, 21(10-11-12), 216-240.
  • Referans49 McCormick, J. A. 2007. Atomic Layer Deposition on Nanoparticles in a Rotary Reactor. West Virginia University, Doctoral thesis, 174pp, USA.
  • Referans50 McCormick, J. A., Rice, K. P., Paul, D. F., Weimer, A. W., George, S. M., 2007. Analysis of Al2O3 Atomic Layer Deposition on ZrO2 Nanoparticles in a Rotary Reactor. Chemical Vapor Deposition, 13(9), 491-498.
  • Referans51 Miikkulainen, V., Leskela, M., Ritala, M., Puurunen, R. L., 2013. Crystallinity of Inorganic Films Grown by Atomic Layer Deposition: Overview and General Trends. Journal of Applied Physics, 113(2), 021301-101.
  • Referans52 Narayan, R. J., Adiga, S. P., Pellin, M. J., Curtiss, L. A., Hryn, A. J., Stafslien, S., . . . Elam, J. W., 2010. Atomic Layer Deposition-based Functionalization of Materials for Medical and Environmental Health Applications. Philosophical Transactions. Series A, Mathematical, Physical, and Engineering Sciences, 368(1917), 2033-2064.
  • Referans53 Paranjpe, A., Gopinath, S., Omstead, T., Bubber , R., 2001. Atomic Layer Deposition of AlOx for Thin Film Head Gap Applications. Journal of the Electrochemical Society, 148(9), G465-G471.
  • Referans54 Parsons, G. N., Elam, J. W., George, S. M., Haukka, S., Jeon, H., Kessels, W. M. M., . . . Rossnagel, S. M., 2013. History of Atomic Layer Deposition and Its Relationship with the American Vacuum Society. Journal of Vacuum Science & Technology A, 31(5), 050812-11.
  • Referans55 Philip, A. 2011. Preparation and Characterization of High-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications. Cochin University, Doctoral thesis, India.
  • Referans56 Pinna, N., Knez, M. 2012. Atomic Layer Deposition of Nanostructures Materials. (First Edition). Wiley-VCH Verlag GmbH & Co. KGaA. U.S.A.
  • Referans57 Poodt, P., Cameron, D. C., Dickey, E., George, S. M., Kuznetsov, V., Parsons, G. N., . . . Vermeer, A., 2012. Spatial Atomic Layer Deposition: A route Towards Further Industrialization of Atomic Layer Deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 30(1), 010802-13.
  • Referans58 Poodt, P., Lankhorst, A., Roozeboom, F., Spee, K., Maas, D., Vermeer, A., 2010. High-Speed Spatial Atomic-Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation. Advanced Materials, 22(32), 3564-3567.
  • Referans59 Putkonen, M., Niinistö, L., 2005. Organometallic Precursors for Atomic Layer Deposition. Top Organomet Chem, 9, 125-145.
  • Referans60 Puurunen, R. L., 2014. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy. Chemical Vapor Deposition, 20(10-12), 332-344.Referans61 Ritala, M., Niinisto, J., 2009. Industrial Applications of Atomic Layer Deposition. Atomic Layer Deposition Applications 6, 25(8), 641-652.
  • Referans61 Scala, F. 2013. Fluidized Bed Technologies for Near-Zero Emission Combustion and Gasification. Woodhead Publushing Limited. Oxford.
  • Referans62 Scheffe, J. R., Frances, A., King, D. M., Liang, X. H., Branch, B. A., Cavanagh, A. S., . . . Weimer, A. W., 2009. Atomic Layer Deposition of Iron(III) Oxide on Zirconia Nanoparticles in a Fluidized Bed Reactor Using Ferrocene and Oxygen. Thin Solid Films, 517(6), 1874-1879.
  • Referans63 Seghete, D., Fabreguette, F. H., George, S. M., 2011. Using a Slit Doser to Probe Gas Dynamics During Al2O3 Atomic Layer Deposition and to Fabricate Laterally Graded Al2O3 Layers. Thin Solid Films, 519(11), 3612-3618.
  • Referans64 Solovyev, A. A., Ovchinnikov, D. V., Korostelev, E. V., Markeev, A. M., 2013. Correlation Between Structural and Bioactive properties of Titanium Dioxide Formed by Atomic Layer Deposition. Nanotechnologies in Russia, 8(5), 388-391.
  • Referans65 Suntola, T. 2004. 30 Years of ALD. ALD 2004 Conference'da sunulan bildiri. University of Helsinki. http://www.sci.fi/~suntola/Presentations/2004%20HY,%2030%20years%20of%20ALD.pdf
  • Referans66 Suntola, T., Antson, J. 1977. U.S. Patent.
  • Referans67 Suntola, T., Pakkala, A. J., Lindfors, S. G. 1983. U.S. Patent.
  • Referans68 Suvanto, M., Pakkanen, T. A., 1998. Tungsten Hexacarbonyl on Alumina - Controlled Deposition from Gas Phase. 166, 105-113.
  • Referans69 Uğur, A. 2017. Bor Nitrür Partiküllerinin Ultra İnce Tabaka ile Kaplanmasının Araştırılması Anadolu Üniversitesi, Doktora tezi, 190s, Eskişehir.
  • Referans70 Valdesueiro, D., Meesters, G. M. H., Kreutzer, M. T., Van Ommen, J. R., 2015. Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions. Materials, 8(3), 1249-1263.
  • Referans71 Van Delft, J. A., Garcia-Alonso, D., Kessels, W. M. M., 2012. Atomic Layer Deposition for Photovoltaics: Applications and Prospects for Solar cell Manufacturing. Semiconductor Science and Technology, 27(7), 074002 (13pp).
  • Referans72 Van Ommen, J. R., Kooijman, D., De Niet, M., Talebi, M., Goulas, A., 2015. Continuous Production of Nanostructured Particles Using Spatial Atomic Layer Deposition. J. Vac. Sci. Technol. A, 33(2), 021513-5.
  • Referans73 Vandalon, V., Kessels, W. M. M., 2016. What Is Limiting Low-temperature Atomic Layer Deposition of Al2O3 a Vibrational Sum-frequency Generation Study. Applied Physics Letters, 108(1), 11607.
  • Referans74 Wank, J. R., George, S. M., Weimer, A. W., 2001. Vibro-fluidization of Fine Boron Nitride Powder at Low Pressure. Powder Technology, 121(2-3), 195-204.
  • Referans75 Wank, J. R., George, S. M., Weimer, A. W., 2004. Nanocoating Individual Cohesive Boron Nitride Particles in a Fluidized Bed by ALD. Powder Technology, 142(1), 59-69.
  • Referans76 Weckman, T., Laasonen, K., 2015. First Principles Study of the Atomic Layer Deposition of Alumina by TMA-H2O-process. Physical Chemistry Chemical Physics, 17(26), 17322-17334.
  • Referans77 Weimer, A. W. 2004. Particle Coating by Atomic Layer Deposition (ALD). PARTEC (International Congress on Particle Technology) sunulan bildiri. http://www.aldnanosolutions.com/wp-content/uploads/2009/12/ALD_PARTEC_2004.pdf
  • Referans78 Xie, Y. Y., Ma, L. L., Pan, D. Q., Yuan, C., 2015. Mechanistic Modeling of Atomic Layer Deposition of Alumina Process with Detailed Surface Chemical Kinetics. Chemical Engineering Journal, 259, 213-220.
  • Referans79 Xiong, G., Elam, J. W., Feng, H., Han, C. Y., Wang, H. H., Iton, L. E., . . . Stair, P. C., 2005. Effect of Atomic Layer Deposition Coatings on the Surface Structure of Anodic Aluminum Oxide Membranes. Journal of Physical Chemistry B, 109(29), 14059-14063.
  • Referans80 Yamashita, S., Watanuki, K., Ishii, H., Shiba, Y., Kitano, M., Shirai, Y., . . . Ohmi, T., 2011. Dependence of the Decomposition of Trimethylaluminum on Oxygen Concentration. Journal of the Electrochemical Society, 158(2), H93-H96.
  • Referans81 Yun, S. J., Lee, K. H., Skarp, J., Kim, H. R., Nam, K. S., 1997. Dependence of Atomic Layer-deposited Al2O3 Films Characteristics on Growth Temperature and Al Precursors of Al(CH3)(3) and AlCl3. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films, 15(6), 2993-2997.

IMPROVEMENTS OF ATOMIC LAYER DEPOSITION (ALD) DEVICES AND TYPES

Yıl 2018, , 590 - 605, 11.12.2018
https://doi.org/10.21923/jesd.392032

Öz










The products obtained by changing the surface
properties of the materials can be given different functionalities besides
their own properties. Developments in surface technologies also provide the
development of obtain new products and manufacturing processes. The ALD method
has the potential to be successfully applied in many different application
areas. The global market research on the atomic layer deposition industry
estimated to annual growth of 12% from 2017 to 2025. In this paper the
historical developments of devices and types used in the application of ALD
method which is a types of thin film coating technique were investigated. It
gives information about new ALD types like direct write and roll to roll ALD as
well as general ALD approaches. 

Kaynakça

  • Referans1 Aarik, J., Akbashev, A., Bechelany, M., Berdova, M., Cameron, D., Chekurov, N., . . . Ylivaara, O. 2014. On the Early History of ALD: Molecular Layering. 14th Int. Conf. on Atomic Layer Deposition'da sunulan bildiri. Kyoto, Japan.
  • Referans2 Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., . . . Yurkevich, O., 2017. Review Article: Recommended Reading List of Early Publications on Atomic Layer Deposition—Outcome of the “Virtual Project on the History of ALD”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 35(1), 010801-13.
  • Referans3 Backman, L. B., Rautiainen, A., Krause, A. O. I., Lindblad, M., 1998. A Novel Co/SiO2 Catalyst for Hydrogenation. Catal. Today, 43(1-2), 11-19.
  • Referans4 Beetstra, R., Lafont, U., Nijenhuis, J., Kelder, E. M., Van Ommen, J. R., 2009. Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition. Chemical Vapor Deposition, 15(7-9), 227-233.
  • Referans5 Bishal, A. K., Butt, A., K Selvaraj, S., Joshi, B., Patel, S., Huang, S., . . . Takoudis, C., 2015. Atomic Layer Deposition in Bio-Nanotechnology: A Brief Overview. Critical Reviews Biomed Eng., 43(4), 255-276.
  • Referans6 Bui, H. V., Grillo, F., Ommen, J. R., 2017. Atomic and Molecular Layer Deposition: off the Beaten Track. The Royal Society of Chemistry Chem. Commun.(53), 45-71.
  • Referans7 Carcia, P. F., McLean, R. S., Groner, M. D., Dameron, A. A., George, S. M., 2009. Gas Diffusion Ultrabarriers on Polymer Substrates Using Al2O3 Atomic Layer Deposition and SiN Plasma-enhanced Chemical Vapor Deposition. Journal of Applied Physics, 106(2), 023533-6.
  • Referans8 Delft-imp.nl, 2015. History of ALD. Erişim Tarihi: 12.05.2015. http://delft-imp.nl/technology/
  • Referans9 Drozd, V. 2016. Progress in Device from Molecular Layering to Atomic Layer Deposition Worldwide Technology. 14th. International Baltic Conference on Atomic Layer Deposition (BALD)'da sunulan bildiri. St. Petersburg, Russia.
  • Referans10 Ferguson, J. D., Weimer, A. W., George, S. M., 2000a. Atomic Layer Deposition of Al2O3 and SiO2 on BN particles Using Sequential Surface Reactions. Applied Surface Science, 162(2000), 280-292.
  • Referans11 Ferguson, J. D., Weimer, A. W., George, S. M., 2000b. Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles. Thin Solid Films, 371(1-2), 95-104.
  • Referans12 George, S. M., 2010. Atomic Layer Deposition: An Overview. Chemical Reviews, 110(1), 111-131.
  • Referans13 George, S. M., Ferguson, J. D., Weimer, A. W. 1999. U.S. Patent.
  • Referans14 George, S. M., Ott, A. W., Klaus, J. W., 1996. Surface Chemistry for Atomic Layer Growth. Journal of Physical Chemistry, 100(31), 13121-13131.
  • Referans15 Ghiraldelli, E., Pelosi, C., Gombia, E., Chiavarotti, G., Vanzetti, L., 2008. ALD growth, Thermal Treatments and Characterisation of Al2O3 Layers. Thin Solid Films, 517(1), 434-436.
  • Referans16 Goldstein, D. N., McCormick, J. A., George, S. M., 2008. Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry. Journal of Physical Chemistry C, 112(49), 19530-19539.
  • Referans17 Grandviewresearch.com, 2018. Atomic Layer Deposition (ALD) Market Size. Erişim Tarihi: 25.01.2018. https://www.grandviewresearch.com/press-release/global-atomic-layer-deposition-market
  • Referans18 Granneman, E., Fischer, P., Pierreux, D., Terhorst, H., Zagwijn, P., 2007. Batch ALD: Characteristics, Comparison with Single Wafer ALD, and Examples. Surface and Coatings Technology, 201(22), 8899-8907.
  • Referans19 Groner, M. D., Elam, J. W., Fabreguette, F. H., George, S. M., 2002. Electrical Characterization of Thin Al2O3 Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates. Thin Solid Films, 413(1-2), 186-197.
  • Referans20 Hakim, L. F., Blackson, J., George, S. M., Weimer, A. W., 2005. Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor. Chemical Vapor Deposition, 11(10), 420-425.
  • Referans21 Hakim, L. F., Portman, J. L., Casper, M. D., Weimer, A. W., 2005. Aggregation Behavior of Nanoparticles in Fluidized Beds. Powder Technology, 160(3), 149-160.
  • Referans22 Higashi, G. S., Fleming, C. G., 1989. Sequential Surface Chemical-Reaction Limited Growth of High-Quality Al2O3 Dielectrics. Applied Physics Letters, 55(19), 1963-1965.
  • Referans23 Hwang, C. S., Yoo, C. Y. 2014. Atomic Layer Deposition for Semiconductors. Springer Science+Business Media. New York.
  • Referans24 Jang, B., Kim, S. H., 2016. Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules. Korean Journal of Materials Research, 26(8), 430-437.
  • Referans25 Johnson, R. W., Hultqvist, A., Bent, S. F., 2014. A Brief Review of Atomic Layer Deposition: From Fundamentals to Applications. Materials Today, 17(5), 236-246.
  • Referans26 Jones, A. C., Hitchman, M. L. 2009. Chemical Vapour Deposition: Precursors, Processes and Applications. RSC Publising. USA.
  • Referans27 Jung, Y. S., Cavanagh, A. S., Riley, L. A., Kang, S. H., Dillon, A. C., Groner, M. D., . . . Lee, S. H., 2010. Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li-Ion Batteries. Advanced Materials, 22(19), 2172–2176.
  • Referans28 Kääriäinen, T., Cameron, D., Kääriäinen, M., Sherman, A. 2013. Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applications. Scrivener Publishing LLC Wiley. Massachusetts.
  • Referans29 Kessels, W. M. M., Putkonen, M., 2011. Advanced Process Technologies: Plasma, Direct-write, Atmospheric pressure, and Roll-to-roll ALD. Mrs Bulletin, 36(11), 907-913.
  • Referans30 Kilbury, O. J., Barrett, K. S., Fu, X. W., Yin, J., Dinair, D. S., Gump, C. J., . . . King, D. M., 2012. Atomic Layer Deposition of Solid Lubricating Coatings on Particles. Powder Technology(221), 26-35.
  • Referans31 Kim, D., Baek, S., Kim, Y. 2011. Energy Barriers for Trimethylaluminum Reaction with Varying Surface Hydroxyl Density. Applied Surface Science, 258, 225– 229.
  • Referans32 King, D. M., Liang, X. H., Weimer, A. W., 2012. Functionalization of Fine Particles Using Atomic and Molecular Layer Deposition. Powder Technology, 221, 13-25.
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  • Referans34 Knez, M., Kadri, A., Wege, C., Gösele, U., Jeske, H., Nielsch, K., 2006. Atomic Layer Deposition on Biological Macromolecules:  Metal Oxide Coating of Tobacco Mosaic Virus and Ferritin. Nano Letters, 6(6), 1172-1177.
  • Referans35 Kunii, D., Levenspiel, O. 1991. Fluidization Engineering. Butterworth-Heinemann. U.S.A.
  • Referans36 Lei, W. 2006. Sensor Based Atomic Layer Depozition for Rapid Process Learning and Enchanced Manufacturability. University of Maryland, Doctoral thesis, 99pp, College Park.
  • Referans37 Leskela, M., Ritala, M., 2003. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges. Angewandte Chemie-International Edition, 42(45), 5548-5554.
  • Referans38 Levy, D. H., Kerr, R. S., Carey, J. T. 2009. U.S. Patent.
  • Referans39 Levy, D. H., Nelson, S. F., Freeman, D., 2009. Oxide Electronics by Spatial Atomic Layer Deposition. Journal of Display Technology, 5(12), 484-494.
  • Referans40 Limpt, V. B., Goulas, A., Ommen, J. R. 2015. Continuous production of ALD Nanostructured Particles for Catalysis. EcoNanoForum'da sunulan bildiri. http://euronanoforum2015.eu/wp-content/uploads/2015/06/12_Bart_van_Limpt_Continuous_production_of_ALD_nanostructured_particles_10_06_2015-1.2.pdf
  • Referans41 Lindblad, M., Haukka, S., Kytökivi, A., Lakomaa, E.-L., Rautiainen, A., Suntola, T., 1997. Processing of Catalysts by Atomic Layer Epitaxy: Modification of Supports. Applied Surface Science, 121/122, 286-291.
  • Referans42 Lindblad, M., Lindfors, L. P., Suntola, T., 1994. Preparation of Ni/Al2O3 Catalysts from Vapor Phase by Atomic Layer Epitaxy. Catalysis Letters, 27(3), 323-336.
  • Referans43 Longrie, D. 2013. Atomic Layer Deposition for Surface Engineering of Powders. Ghent University Doctoral thesis, 229 pp, Belgium.
  • Referans44 Longrie, D., Deduytsche, D., Detavernier, C., 2014. Reactor Concepts for Atomic Layer Deposition on Agitated Particles: A review. Journal of Vacuum Science & Technology A, 32(1), 010802-13.
  • Referans45 Longrie, D., Deduytsche, D., Haemers, J., Driesen, K., Detavernier, C., 2012. A Rotary Reactor for Thermal and Plasma-enhanced Atomic Layer Deposition on Powders and Small Objects. Surface & Coatings Technology, 213, 183-191.
  • Referans46 Ma, L. L., Pan, D. Q., Xie, Y. Y., Yuan, C., 2015. Atomic Layer Deposition of Al2O3 Process Emissions. Rsc Advances, 5(17), 12824-12829.
  • Referans47 Mackus, A. J. M., Thissen, N. F. W., Mulders, J. J. L., Trompenaars, P. H. F., Verheijen, M. A., Bol, A. A., Kessels, W. M. M., 2013. Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements. The Journal of Physical Chemistry C, 117(20), 10788-10798.
  • Referans48 Malygin, A. A., Drozd, V. E., Malkov, A. A., Smirnov, V. M., 2015. From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition Chemical Vapor Deposition, 21(10-11-12), 216-240.
  • Referans49 McCormick, J. A. 2007. Atomic Layer Deposition on Nanoparticles in a Rotary Reactor. West Virginia University, Doctoral thesis, 174pp, USA.
  • Referans50 McCormick, J. A., Rice, K. P., Paul, D. F., Weimer, A. W., George, S. M., 2007. Analysis of Al2O3 Atomic Layer Deposition on ZrO2 Nanoparticles in a Rotary Reactor. Chemical Vapor Deposition, 13(9), 491-498.
  • Referans51 Miikkulainen, V., Leskela, M., Ritala, M., Puurunen, R. L., 2013. Crystallinity of Inorganic Films Grown by Atomic Layer Deposition: Overview and General Trends. Journal of Applied Physics, 113(2), 021301-101.
  • Referans52 Narayan, R. J., Adiga, S. P., Pellin, M. J., Curtiss, L. A., Hryn, A. J., Stafslien, S., . . . Elam, J. W., 2010. Atomic Layer Deposition-based Functionalization of Materials for Medical and Environmental Health Applications. Philosophical Transactions. Series A, Mathematical, Physical, and Engineering Sciences, 368(1917), 2033-2064.
  • Referans53 Paranjpe, A., Gopinath, S., Omstead, T., Bubber , R., 2001. Atomic Layer Deposition of AlOx for Thin Film Head Gap Applications. Journal of the Electrochemical Society, 148(9), G465-G471.
  • Referans54 Parsons, G. N., Elam, J. W., George, S. M., Haukka, S., Jeon, H., Kessels, W. M. M., . . . Rossnagel, S. M., 2013. History of Atomic Layer Deposition and Its Relationship with the American Vacuum Society. Journal of Vacuum Science & Technology A, 31(5), 050812-11.
  • Referans55 Philip, A. 2011. Preparation and Characterization of High-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications. Cochin University, Doctoral thesis, India.
  • Referans56 Pinna, N., Knez, M. 2012. Atomic Layer Deposition of Nanostructures Materials. (First Edition). Wiley-VCH Verlag GmbH & Co. KGaA. U.S.A.
  • Referans57 Poodt, P., Cameron, D. C., Dickey, E., George, S. M., Kuznetsov, V., Parsons, G. N., . . . Vermeer, A., 2012. Spatial Atomic Layer Deposition: A route Towards Further Industrialization of Atomic Layer Deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 30(1), 010802-13.
  • Referans58 Poodt, P., Lankhorst, A., Roozeboom, F., Spee, K., Maas, D., Vermeer, A., 2010. High-Speed Spatial Atomic-Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation. Advanced Materials, 22(32), 3564-3567.
  • Referans59 Putkonen, M., Niinistö, L., 2005. Organometallic Precursors for Atomic Layer Deposition. Top Organomet Chem, 9, 125-145.
  • Referans60 Puurunen, R. L., 2014. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy. Chemical Vapor Deposition, 20(10-12), 332-344.Referans61 Ritala, M., Niinisto, J., 2009. Industrial Applications of Atomic Layer Deposition. Atomic Layer Deposition Applications 6, 25(8), 641-652.
  • Referans61 Scala, F. 2013. Fluidized Bed Technologies for Near-Zero Emission Combustion and Gasification. Woodhead Publushing Limited. Oxford.
  • Referans62 Scheffe, J. R., Frances, A., King, D. M., Liang, X. H., Branch, B. A., Cavanagh, A. S., . . . Weimer, A. W., 2009. Atomic Layer Deposition of Iron(III) Oxide on Zirconia Nanoparticles in a Fluidized Bed Reactor Using Ferrocene and Oxygen. Thin Solid Films, 517(6), 1874-1879.
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  • Referans64 Solovyev, A. A., Ovchinnikov, D. V., Korostelev, E. V., Markeev, A. M., 2013. Correlation Between Structural and Bioactive properties of Titanium Dioxide Formed by Atomic Layer Deposition. Nanotechnologies in Russia, 8(5), 388-391.
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  • Referans69 Uğur, A. 2017. Bor Nitrür Partiküllerinin Ultra İnce Tabaka ile Kaplanmasının Araştırılması Anadolu Üniversitesi, Doktora tezi, 190s, Eskişehir.
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  • Referans73 Vandalon, V., Kessels, W. M. M., 2016. What Is Limiting Low-temperature Atomic Layer Deposition of Al2O3 a Vibrational Sum-frequency Generation Study. Applied Physics Letters, 108(1), 11607.
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  • Referans76 Weckman, T., Laasonen, K., 2015. First Principles Study of the Atomic Layer Deposition of Alumina by TMA-H2O-process. Physical Chemistry Chemical Physics, 17(26), 17322-17334.
  • Referans77 Weimer, A. W. 2004. Particle Coating by Atomic Layer Deposition (ALD). PARTEC (International Congress on Particle Technology) sunulan bildiri. http://www.aldnanosolutions.com/wp-content/uploads/2009/12/ALD_PARTEC_2004.pdf
  • Referans78 Xie, Y. Y., Ma, L. L., Pan, D. Q., Yuan, C., 2015. Mechanistic Modeling of Atomic Layer Deposition of Alumina Process with Detailed Surface Chemical Kinetics. Chemical Engineering Journal, 259, 213-220.
  • Referans79 Xiong, G., Elam, J. W., Feng, H., Han, C. Y., Wang, H. H., Iton, L. E., . . . Stair, P. C., 2005. Effect of Atomic Layer Deposition Coatings on the Surface Structure of Anodic Aluminum Oxide Membranes. Journal of Physical Chemistry B, 109(29), 14059-14063.
  • Referans80 Yamashita, S., Watanuki, K., Ishii, H., Shiba, Y., Kitano, M., Shirai, Y., . . . Ohmi, T., 2011. Dependence of the Decomposition of Trimethylaluminum on Oxygen Concentration. Journal of the Electrochemical Society, 158(2), H93-H96.
  • Referans81 Yun, S. J., Lee, K. H., Skarp, J., Kim, H. R., Nam, K. S., 1997. Dependence of Atomic Layer-deposited Al2O3 Films Characteristics on Growth Temperature and Al Precursors of Al(CH3)(3) and AlCl3. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films, 15(6), 2993-2997.
Toplam 81 adet kaynakça vardır.

Ayrıntılar

Birincil Dil Türkçe
Konular Mühendislik
Bölüm Derleme Makaleler \ Review Articles
Yazarlar

Alper Uğur 0000-0002-8310-8839

Nuran Ay 0000-0002-2228-9904

Yayımlanma Tarihi 11 Aralık 2018
Gönderilme Tarihi 8 Şubat 2018
Kabul Tarihi 4 Ekim 2018
Yayımlandığı Sayı Yıl 2018

Kaynak Göster

APA Uğur, A., & Ay, N. (2018). ATOMİK KATMAN BİRİKTİRME (ALD) CİHAZLARI VE ÇEŞİTLERİNDEKİ GELİŞMELER. Mühendislik Bilimleri Ve Tasarım Dergisi, 6(4), 590-605. https://doi.org/10.21923/jesd.392032