Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique

Taner Kalaycı

doi:10.31466/kfbd.1282051

TR EN

Co/Ni İnce Filmlerde Kapak ve Tampon Katmanı Etkisinin Ferromanyetik Rezonans Tekniği ile İncelenmesi

Öz

Bu çalışmada, Si(100)/X5/(Co0.3/Ni0.5)3/Y5 (X: Pt, Cu ve Y: Pt, Cu, tüm katmanların kalınlığı nanometre) çok tabakalarının manyetik özellikleri ferromanyetik rezonans tekniği kullanılarak incelenmiştir. Numune setlerinde tampon, kapak ve Co katmanları magnetron püskürtme tekniği ile büyütülürken, Ni alt katmanları yüksek vakumda moleküler ışın epitaksisi (MBE) ile büyütüldü. Etkin manyetik anizotropi, tampon ve üst katman olarak bakır kullanıldığında 300 mT, tampon katman bakır ve üst katman Pt olduğunda 290 mT'dir. Öte yandan tampon ve kapak tabakası olarak Pt kullanıldığında etkin manyetik anizotropinin 350 mT, Pt tampon ve Cu üst tabakası kullanıldığında ise 150 mT olduğu görülmektedir. Ayrıca, Pt tampon tabakası kullanıldığında manyetik kolay eksen düzlem dışındayken, Cu tampon tabakası kullanıldığında manyetik kolay eksen düzleme paraleldir. Sonuçlar, spintronik alanında sıklıkla kullanılan Co/Ni ince filmlerde tampon ve kapak katmanların manyetik özellikleri etkilediğini göstermektedir.

Anahtar Kelimeler

Ferromanyetik Rezonans, Manyetik Çokkatmanlar, Tampon Katman, Manyetik Anizotropi, Kapak Katman

Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique

Öz

In this study, the magnetic properties of Si(100)/X5/(Co0.3/Ni0.5)3/Y5 (X: Pt, Cu and Y: Pt, Cu, all thicknesses are nm) multilayers were investigated using ferromagnetic resonance technique (FMR). In sample sets all layers (buffer, cap, and Co) were grown by magnetron sputtering while Ni sub-layers were grown by molecular beam epitaxy (MBE) at high vacuum. The effective magnetic anisotropy is 300 mT when copper is used as the buffer and cap layer, 290 mT when the buffer layer is copper, and the cap layer is Pt. On the other hand, it is seen that the effective magnetic anisotropy is 350 mT when Pt is used as buffer and cap layer, and 150 mT when Pt buffer and Cu cap layer are used. Furthermore, magnetic easy axis is out of plane when the Pt buffer layer is used, while the magnetic easy axis is parallel to the plane when the Cu buffer layer is used. The results show that the buffer and cap layers of Co/Ni thin films, which are frequently used in the field of spintronics influence the magnetic properties.

Anahtar Kelimeler

Ferromagnetic Resonance, Magnetic Multilayers, Buffer Layer, Magnetic Anisotropy, Cap Layer

Destekleyen Kurum

BANDIRMA ONYEDİ EYLÜL ÜNİVERSİTESİ

Proje Numarası

BAP-20-1003-007

Teşekkür

This study was supported by Research Projects with Foundation Number BAP-20-1003-007, Bandırma Onyedi Eylül University Scientific Research Commission, Turkey.

Kaynakça

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Ayrıntılar

Birincil Dil

İngilizce

Konular

Klasik Fizik (Diğer)

Bölüm

Araştırma Makalesi

Yazarlar

Taner Kalaycı ^*
0000-0002-6374-2373
Türkiye

Erken Görünüm Tarihi

15 Haziran 2023

Yayımlanma Tarihi

15 Haziran 2023

Gönderilme Tarihi

13 Nisan 2023

Kabul Tarihi

12 Haziran 2023

Yayımlandığı Sayı

Yıl 2023 Cilt: 13 Sayı: 2

DOI

https://doi.org/10.31466/kfbd.1282051

IZ

https://izlik.org/JA29DE42JB

APA

Kalaycı, T. (2023). Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique. Karadeniz Fen Bilimleri Dergisi, 13(2), 724-733. https://doi.org/10.31466/kfbd.1282051

AMA

1.Kalaycı T. Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique. KFBD. 2023;13(2):724-733. doi:10.31466/kfbd.1282051

Chicago

Kalaycı, Taner. 2023. “Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique”. Karadeniz Fen Bilimleri Dergisi 13 (2): 724-33. https://doi.org/10.31466/kfbd.1282051.

EndNote

Kalaycı T (01 Haziran 2023) Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique. Karadeniz Fen Bilimleri Dergisi 13 2 724–733.

IEEE

[1]T. Kalaycı, “Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique”, KFBD, c. 13, sy 2, ss. 724–733, Haz. 2023, doi: 10.31466/kfbd.1282051.

ISNAD

Kalaycı, Taner. “Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique”. Karadeniz Fen Bilimleri Dergisi 13/2 (01 Haziran 2023): 724-733. https://doi.org/10.31466/kfbd.1282051.

JAMA

1.Kalaycı T. Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique. KFBD. 2023;13:724–733.

MLA

Kalaycı, Taner. “Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique”. Karadeniz Fen Bilimleri Dergisi, c. 13, sy 2, Haziran 2023, ss. 724-33, doi:10.31466/kfbd.1282051.

Vancouver

1.Taner Kalaycı. Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique. KFBD. 01 Haziran 2023;13(2):724-33. doi:10.31466/kfbd.1282051

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Investigation of Thickness Effect on Structural and Magnetic Properties of Ni Thin Films for Some Applications

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Karadeniz Fen Bilimleri Dergisinde yayınlanan makaleler Creative Commons Attribution-NonCommercial 4.0 International kapsamında lisanslanmıştır.

Co/Ni İnce Filmlerde Kapak ve Tampon Katmanı Etkisinin Ferromanyetik Rezonans Tekniği ile İncelenmesi

Öz

Anahtar Kelimeler

Investigation of Cap and Buffer Layer Effect in Co/Ni Thin Films by Ferromagnetic Resonance Technique

Öz

Anahtar Kelimeler

Destekleyen Kurum

Proje Numarası

Teşekkür

Kaynakça

Ayrıntılar

Birincil Dil

Konular

Bölüm

Yazarlar

Erken Görünüm Tarihi

Yayımlanma Tarihi

Gönderilme Tarihi

Kabul Tarihi

Yayımlandığı Sayı

DOI

IZ

Kaynak Göster

Cited By

Investigation of Thickness Effect on Structural and Magnetic Properties of Ni Thin Films for Some Applications

Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]10 thin films

Unveiling Thickness-Dependent Oxidation Effect on Optical Response of Room Temperature RF-Sputtered Nickel Ultrathin Films on Amorphous Glass: An Experimental and FDTD Investigation

Laser-Engineered Co/Cu Multilayers by Pulsed Laser Deposition: Interfacial Control, Spin-Dependent Transport, and Enhanced Giant Magnetoresistance