Derleme

µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri

Cilt: 8 Sayı: 1 29 Mart 2017
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µc-Si: H Thin Film Materials and Metastability Effects

Öz

Hydrogenated Microcrystalline Silicon thin film materials (µc-Si:H) are much more preferable material group than Single Crystalline Silicon (c-Si) and Hydrogenated Amorphous Silicon (a-Si:H) due to their optoelectronic specification, easy and cheap production techniques. New application areas of µc-Si:H have been improved with concurrently production technology improvement. Diode, Sensors, TFT, Photovoltaic and Heterojunction applications are examples of these improvements. Depending on these production improvement, high quality µc-Si:H can be produced. Therefore, these improvements draw attention of scientists regarding production of high quality electrical materials and their application areas. However; µc-Si:H materials have electronic metastability problems after production. Researchers have been working on solving this metastability problem of µc-Si:H for since 1983. Unfortunately, ultimate solution of metastability problem for µc-Si:H material has not been revealed until now. Thus, in this study, µc-Si:H thin films production, crystallographic structure, electronic structure, optical and electrical specification of µc-Si:H thin film chronologically have been analyzed through a detailed literature review and findings have been investigated through the perspective of metastability problem.

Anahtar Kelimeler

Kaynakça

  1. Brüggemann, R., & Souffi, N. (2006). Metastable dark and photoconductive properties of microcrystalline silicon. Journal of Non-Crystalline Solids, 352(9-20), 1079–1082. http://doi.org/10.1016/j.jnoncrysol.2005.11.089
  2. Finger, F., Carius, R., Dylla, T., Klein, S., Okur, S., & Günes, M. (2003). Stability of microcrystalline silicon for thin film solar cell applications. IEE Proceedings - Circuits, Devices and Systems, 150(4), 300. http://doi.org/10.1049/ip-cds:20030636
  3. Finger, F., Hapke, P., Luysberg, M., Carius, R., Wagner, H., & Scheib, M. (1994). Improvement of grain size and deposition rate of microcrystalline silicon by use of very high frequency glow discharge. Applied Physics Letters, 65(20), 2588. http://doi.org/10.1063/1.112604
  4. Finger, F., Müller, J., Malten, C., & Wagner, H. (1998). Electronic states in hydrogenated microcrystalline silicon. Philosophical Magazine Part B, 77(3), 805–830. http://doi.org/10.1080/13642819808214836
  5. Günes, M., Cansever, H., Yilmaz, G., Smirnov, V., Finger, F., & Brüggemann, R. (2012). Metastability effects in hydrogenated microcrystalline silicon thin films investigated by the dual beam photoconductivity method. Journal of Non-Crystalline Solids, 358(17), 2074–2077. http://doi.org/10.1016/j.jnoncrysol.2012.01.063
  6. Maissel, L. I., and Clang, R., (eds.), Handbook of Thin Film Technology, McGraw-Hill, New York (1970)
  7. Matsuda, A. (1983). Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma. Journal of Non-Crystalline Solids, 59-60(PART 2), 767–774. http://doi.org/10.1016/0022-3093(83)90284-3
  8. Matsumura, H. (1991). Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) Method. Japanese Journal of Applied Physics, 30(Part 2, No. 8B), L1522–L1524. http://doi.org/10.1143/JJAP.30.L1522

Ayrıntılar

Birincil Dil

Türkçe

Konular

Mühendislik

Bölüm

Derleme

Yazarlar

Yayımlanma Tarihi

29 Mart 2017

Gönderilme Tarihi

10 Ekim 2016

Kabul Tarihi

28 Mart 2017

Yayımlandığı Sayı

Yıl 2017 Cilt: 8 Sayı: 1

Kaynak Göster

APA
Yılmaz, G. (2017). µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri. Mehmet Akif Ersoy Üniversitesi Fen Bilimleri Enstitüsü Dergisi, 8(1), 46-55. https://izlik.org/JA65MR44HC
AMA
1.Yılmaz G. µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri. MAKUFEBED. 2017;8(1):46-55. https://izlik.org/JA65MR44HC
Chicago
Yılmaz, Gökhan. 2017. “µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri”. Mehmet Akif Ersoy Üniversitesi Fen Bilimleri Enstitüsü Dergisi 8 (1): 46-55. https://izlik.org/JA65MR44HC.
EndNote
Yılmaz G (01 Ocak 2017) µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri. Mehmet Akif Ersoy Üniversitesi Fen Bilimleri Enstitüsü Dergisi 8 1 46–55.
IEEE
[1]G. Yılmaz, “µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri”, MAKUFEBED, c. 8, sy 1, ss. 46–55, Oca. 2017, [çevrimiçi]. Erişim adresi: https://izlik.org/JA65MR44HC
ISNAD
Yılmaz, Gökhan. “µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri”. Mehmet Akif Ersoy Üniversitesi Fen Bilimleri Enstitüsü Dergisi 8/1 (01 Ocak 2017): 46-55. https://izlik.org/JA65MR44HC.
JAMA
1.Yılmaz G. µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri. MAKUFEBED. 2017;8:46–55.
MLA
Yılmaz, Gökhan. “µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri”. Mehmet Akif Ersoy Üniversitesi Fen Bilimleri Enstitüsü Dergisi, c. 8, sy 1, Ocak 2017, ss. 46-55, https://izlik.org/JA65MR44HC.
Vancouver
1.Gökhan Yılmaz. µc-Si:H İnce Film Malzemeler ve Metastabilite Etkileri. MAKUFEBED [Internet]. 01 Ocak 2017;8(1):46-55. Erişim adresi: https://izlik.org/JA65MR44HC