DETERMINATION OF DIELECTRIC PROPERTIES OF METAL-OXIDE SEMICONDUCTOR CAPACITOR WITH REDUCED GRAPHENE OXIDE INTERFACIAL OXIDE LAYER
Abstract
In this study, the frequency dependence of the dielectric properties of Au/RGO/p-Si metal-oxide-semiconductor (MOS) capacitor with silicon nitride (RGO) interfacial oxide layer have been investigated by taking experimental capacitance-voltage (C-V) and conductance-voltage (G/w-V) measurements at 200, 300, 500 and 700 kHz frequencies. Dielectric constant (ε'), dielectric loss (ε"), dielectric loss tangent (tanδ), ac electrical conductivity (σac), real and imaginary part of electric modulus (Μ' and M") values of the MOS capacitor have been determined in the frequency range of 10 kHz-1 MHz. The obtained results clearly show that the dielectric parameters are frequency dependent. The values of the ε' and ε'' decrease with increasing frequency. But the values of the σac, Μ' and Μ" increase with increasing frequency.
Keywords
Kaynakça
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Ayrıntılar
Birincil Dil
Türkçe
Konular
Elektrik Mühendisliği
Bölüm
Araştırma Makalesi
Yazarlar
İbrahim Karteri
Bu kişi benim
0000-0001-8913-6753
Yayımlanma Tarihi
31 Temmuz 2017
Gönderilme Tarihi
15 Nisan 2017
Kabul Tarihi
14 Haziran 2017
Yayımlandığı Sayı
Yıl 2017 Cilt: 6 Sayı: 2
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Journal of the Institute of Science and Technology
https://doi.org/10.21597/jist.638601