ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES

Cilt: 4 Sayı: 4 1 Mayıs 2009
  • Ibrahim Yücedağ
Engineering Sciences Kapak
Engineering Sciences
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ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES

Öz

ABSTRACT In this study, the energy distribution profile of the interface states (Nss) and their relaxation time () of Al/SiO2/p-Si (MIS) structure with a thin (32Å) SiO2 have been investigated by use the conductance methods. The C-V-f and G/-V-f characteristics of these devices were measured in the frequency range of 0.2kHz-100kHz. The experimental characteristics of MIS structure show fairly large frequency dispersion especially at low frequencies due to Rs and Nss. The capacitance of this structure decreases with increasing frequency. The increase in C especially at low frequencies result forms the presence of Nss. The Nss and  profiles have been determined in the band-gap of Si. The main value of Nss was found about 3.5x1014 eV-1cm-2 and slightly changes. The values of relaxation time range from 1.05x10-5 s to 1.58x10-3 s and have shown an exponential rise with bias from the top of the valance bend towards the mid-gap.

Anahtar Kelimeler

Ayrıntılar

Birincil Dil

Türkçe

Konular

-

Bölüm

-

Yazarlar

Ibrahim Yücedağ Bu kişi benim

Yayımlanma Tarihi

1 Mayıs 2009

Gönderilme Tarihi

29 Ağustos 2014

Kabul Tarihi

-

Yayımlandığı Sayı

Yıl 2009 Cilt: 4 Sayı: 4

DOI

https://doi.org/10.12739/nwsaes.v4i4.5000067123

IZ

https://izlik.org/JA26XH29XH

Kaynak Göster

RIS / Bibtex
APA
Yücedağ, I. (2009). ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES. Engineering Sciences, 4(4), 518-526. https://doi.org/10.12739/nwsaes.v4i4.5000067123
AMA
1.Yücedağ I. ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES. Engineering Sciences. 2009;4(4):518-526. doi:10.12739/nwsaes.v4i4.5000067123
Chicago
Yücedağ, Ibrahim. 2009. “ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES”. Engineering Sciences 4 (4): 518-26. https://doi.org/10.12739/nwsaes.v4i4.5000067123.
EndNote
Yücedağ I (01 Mayıs 2009) ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES. Engineering Sciences 4 4 518–526.
IEEE
[1]I. Yücedağ, “ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES”, Engineering Sciences, c. 4, sy 4, ss. 518–526, May. 2009, doi: 10.12739/nwsaes.v4i4.5000067123.
ISNAD
Yücedağ, Ibrahim. “ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES”. Engineering Sciences 4/4 (01 Mayıs 2009): 518-526. https://doi.org/10.12739/nwsaes.v4i4.5000067123.
JAMA
1.Yücedağ I. ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES. Engineering Sciences. 2009;4:518–526.
MLA
Yücedağ, Ibrahim. “ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES”. Engineering Sciences, c. 4, sy 4, Mayıs 2009, ss. 518-26, doi:10.12739/nwsaes.v4i4.5000067123.
Vancouver
1.Ibrahim Yücedağ. ON THE DENSITY DISTRIBUTION PROFILES OF INTERFACE STATES. Engineering Sciences. 01 Mayıs 2009;4(4):518-26. doi:10.12739/nwsaes.v4i4.5000067123