Colloidal Silica Production with Resin from Sodium Silicate and Optimization of Process

Yıl 2024, , 1 - 10, 29.06.2024

Buse Akkaya , Jiyan Aslan , Rukiye Taşdemir , İlker Erdem , Mehmet Gönen

https://doi.org/10.56171/ojn.1402531

Cited By: 1

Öz

Colloidal silica is a stable and homogeneously dispersed form of amorphous silicon dioxide (SiO2) nanoparticles in water. Colloidal silica has been the focus of research due to large surface area, biocompatibility, low toxicity and chemical and thermal stability. It has been used in a wide variety of industrial applications, including pulp and paper, chromatography, electronics, foods, and colloids, as well as in the ceramics and glass industry. In this study, colloidal silica was produced using cationic resin and sodium silicate and process conditions were optimized. Temperature (50-80 °C), mixing speed (200-500 rpm) and time (20-120 min.), which significantly affect the particle size, were selected as parameters. Particle size distribution (PSD) analyzes of colloidal silica particles were performed to determine appropriate levels of the parameters. The most suitable process conditions are 50°C temperature, 40 min. and 300 rpm. The average particle size of colloidal silica produced in optimum conditions was measured as 80 nm.

Anahtar Kelimeler

Colloidal Silica, Optimization, Sodium Silicate, Particle Size

Destekleyen Kurum

This study was supported by Project No. 1919B012107996 in Tübitak 2209/A category

Sodyum Silikat ve Reçineden Kolloidal Silika Üretimi ve Proses Şartlarının Optimizasyonu

Öz

Kolloidal silika, amorf silisyum dioksit (SiO2) nanopartiküllerinin suda kararlı ve homojen bir şekilde dağılmış halidir. Kolloidal silika, geniş yüzey alanı, biyouyumluluğu, düşük toksisitesi ve kimyasal ve termal kararlılığı nedeniyle araştırmaların odak noktası olmuştur. Kağıt hamuru ve kağıt, kromatografi, elektronik, gıdalar ve kolloidlerin yanı sıra seramik ve cam endüstrisini de içeren çok çeşitli endüstriyel uygulamada kullanılmaktadır. Bu çalışmada, katyonik reçine ve sodyum silikat kullanılarak koloidal silika üretilmiş ve proses koşulları optimize edilmiştir. Parçacık boyutunu önemli ölçüde etkileyen sıcaklık (50-80 °C), karıştırma hızı (200-500 dev./dk.) ve süre (20-120 dk.) parametre olarak seçilmiştir. En uygun proses koşulları 50°C sıcaklık, 40 dk. ve 300 dev/dk.'dir. Optimum koşullarda üretilen koloidal silikanın ortalama parçacık boyutu 80 nm olarak ölçülmüştür.

Anahtar Kelimeler

Kolloidal Silika, Optimizasyon, Sodyum Silikat, Parçacık Boyutu

Destekleyen Kurum

Bu çalışma Tübitak tarafından 1919B012107996 nolu proje ile desteklenmiştir.

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