A Different Approach to Absorption Coefficient and Thickness
Öz
In this study structural and morphological properties of InGaN/GaN/Al2O3 structure, grown by Metal Organic Chemical Vapor Deposition (MOCVD) technique, is investigated. Crystal size of GaN in the structure is determined by using X-Ray Diffraction (XRD) techique. By the help of Raman spectra calibration coefficient is gained. This calibration coefficient and Termoelectric figure (ZT) of GaN is used to estimate number of stacks of GaN in the structure. Number of stacks (N) is a structural property and by using it an optical property, absorption coefficient, is determined. Using Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM) images total thickness of the sample is determined accurately and they are compared with each other. The sample used in this study is only for an example. The methods used in this study can be applied to different structures if right coefficients can be found. The importance of this study is that it plays a key role for determining structural, optical and morphological features of different samples.
Anahtar Kelimeler
Proje Numarası
Kaynakça
- [1] H. Morkoç., “Handbook of Nitride Semiconductors and Devices”, Wiley- VCH, Berlin, Vols. I–III, (2008). [2] E. J. Martinez., “Gallium Nitride & Related Wide Bandgap Materials and Devices”, DARPATech, (2000).
- [3] R. Davis., A. Roskowski., E. Preble., J. Speck., B. Heying., J. Freitas., E. Glaser., W. Carlos., “Gallium Nitride Materials”, Proc. IEEE 90, 993, (2004).
- [4] N. Nakamura., “Epitaxy for III-N-Based Electronic Devices”, MRS Bulletin, Warrendale, pp. 1145–1156, (1998).
- [5] S. Keller., Y. Wu., G. Parish., N. Ziang., J. Xu., B. Keller., S. DenBaars., U. Mishra., “Gallium nitrite based high power heterojunction field effect transistors: process development and present status at UCSB‖”, IEEE Trans. Electron Devices 48, 552, (2001).
- [6] C. Türkmen., “Growth and characterisation of CdS, ZnS, PbS Nano structures by MOCVD”, PhD Thesis number: 184045, Osmangazi University, Eskişehir, (2006).
- [7] E. Erdoğan., “Growth of InXGa1-XN ternary compound as thin film by RF magnetron sputtering technique and investigation of characteristic properties with experimental analysis”, Phd Thesis number:483620, Atatürk University,Graduate School of Naturel and Applied Sciences, Department of Nanoscience and Nanoengineering,Department of Nanomaterials, Erzurum, (2017).
- [8] H. Harima., “Properties of GaN and related compounds studied by means of Raman scattering”, Journal of Physics: Condensed Matter, (2002).
- [9] E. Smith., G. Dent., “Modern Raman Spectroscopy, A Practical Approach”, DOI:10.1002/0470011831, (2004).
Ayrıntılar
Birincil Dil
İngilizce
Konular
Mühendislik
Bölüm
Araştırma Makalesi
Yazarlar
Ömer Akpınar
0000-0002-5172-8283
Türkiye
Süleyman Özçelik
0000-0002-3761-3711
Türkiye
Mustafa Ozturk
0000-0002-8508-5714
Türkiye
Yayımlanma Tarihi
1 Haziran 2022
Gönderilme Tarihi
28 Haziran 2020
Kabul Tarihi
22 Aralık 2020
Yayımlandığı Sayı
Yıl 2022 Cilt: 25 Sayı: 2