In this study, graded (A) InxGa1-xN (10.5 ≤ x ≤ 18.4) and non graded (B) InxGa1-xN (13.6 ≤ x ≤ 24.9) samples are grown on c-oriented sapphire substrate using the Metal Organic Chemical Vapour Deposition (MOCVD) technique. The structural, optical and electrical features of the grown InGaN/GaN solar cell structures are analyzed using High Resolution X-Ray Diffraction (HRXRD), Photoluminescense (PL), Ultraviolet (UV), current density and potential (JV) measurements. According to the HRXRD results; it is determined that the InGaN layer of the graded structure has a lower FWHM (Full width at half maximum) value. From the PL measurements, it is observed that the GaN half-width peak value of the graded sample is narrower and the InGaN peak width value of the graded sample is larger. From UV measurements, that the graded sample has a greater band range. JV measurements determine that the performance of the graded structure is higher.
| Yazarlar | |
|---|---|
| Yayımlanma Tarihi | 3 Şubat 2017 |
| Yayımlandığı Sayı | Yıl 2017 Cilt: 21 Sayı: 1 |
e-ISSN :1308-6529
Linking ISSN (ISSN-L): 1300-7688
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