Research Article

Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method

Volume: 9 Number: 3 September 1, 2019
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Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method

Abstract

The voltage dependent surface states/traps (Nss) and their relaxation time () of the Al/CdZnO/p-Si (MIS) structure were investigated with admittance method using C-V-f and G/-V-f measurements in the frequency range of 5 kHz-1 MHz. Both the values of C and G/ were found as strong function of voltage and frequency and they increase with decreasing frequency almost for each voltage. The obtained higher values of C and G at the low frequencies are due to the presence of Nss located between CdZnO/p-Si interfaces. At low frequencies, the relaxation time of the charges at the traps is larger than the period (≥T) of the applied ac signal, so they can contribute to the measured C and G/ values. In addition, the presence of Nss causes a peak at the extracted parallel conductance (Gp/) versus Lnf curves of the structure. Thus, both the values of Nss and  were calculated from the peak value and its position, respectively. The values of Nss and  ranged from 1.65x1013 eV-1 cm-2, 31.4 s at 1.7 V and 1.39x1013 eV-1 cm-2, 9.18 s at 3 V, respectively. These values are very suitable for these structures at room temperature.

Keywords

References

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Details

Primary Language

English

Subjects

Metrology, Applied and Industrial Physics

Journal Section

Research Article

Publication Date

September 1, 2019

Submission Date

March 1, 2019

Acceptance Date

March 17, 2019

Published in Issue

Year 2019 Volume: 9 Number: 3

APA
Erbilen Tanrıkulu, E. (2019). Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Journal of the Institute of Science and Technology, 9(3), 1359-1366. https://doi.org/10.21597/jist.534345
AMA
1.Erbilen Tanrıkulu E. Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. J. Inst. Sci. and Tech. 2019;9(3):1359-1366. doi:10.21597/jist.534345
Chicago
Erbilen Tanrıkulu, Esra. 2019. “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al CdZnO P-Si (MIS) Structure Via Admittance Method”. Journal of the Institute of Science and Technology 9 (3): 1359-66. https://doi.org/10.21597/jist.534345.
EndNote
Erbilen Tanrıkulu E (September 1, 2019) Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Journal of the Institute of Science and Technology 9 3 1359–1366.
IEEE
[1]E. Erbilen Tanrıkulu, “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method”, J. Inst. Sci. and Tech., vol. 9, no. 3, pp. 1359–1366, Sept. 2019, doi: 10.21597/jist.534345.
ISNAD
Erbilen Tanrıkulu, Esra. “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al CdZnO P-Si (MIS) Structure Via Admittance Method”. Journal of the Institute of Science and Technology 9/3 (September 1, 2019): 1359-1366. https://doi.org/10.21597/jist.534345.
JAMA
1.Erbilen Tanrıkulu E. Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. J. Inst. Sci. and Tech. 2019;9:1359–1366.
MLA
Erbilen Tanrıkulu, Esra. “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al CdZnO P-Si (MIS) Structure Via Admittance Method”. Journal of the Institute of Science and Technology, vol. 9, no. 3, Sept. 2019, pp. 1359-66, doi:10.21597/jist.534345.
Vancouver
1.Esra Erbilen Tanrıkulu. Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. J. Inst. Sci. and Tech. 2019 Sep. 1;9(3):1359-66. doi:10.21597/jist.534345

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