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Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method

Year 2019, , 1359 - 1366, 01.09.2019
https://doi.org/10.21597/jist.534345

Abstract

The voltage dependent surface states/traps (Nss) and their relaxation time () of the Al/CdZnO/p-Si (MIS) structure were investigated with admittance method using C-V-f and G/-V-f measurements in the frequency range of 5 kHz-1 MHz. Both the values of C and G/ were found as strong function of voltage and frequency and they increase with decreasing frequency almost for each voltage. The obtained higher values of C and G at the low frequencies are due to the presence of Nss located between CdZnO/p-Si interfaces. At low frequencies, the relaxation time of the charges at the traps is larger than the period (≥T) of the applied ac signal, so they can contribute to the measured C and G/ values. In addition, the presence of Nss causes a peak at the extracted parallel conductance (Gp/) versus Lnf curves of the structure. Thus, both the values of Nss and  were calculated from the peak value and its position, respectively. The values of Nss and  ranged from 1.65x1013 eV-1 cm-2, 31.4 s at 1.7 V and 1.39x1013 eV-1 cm-2, 9.18 s at 3 V, respectively. These values are very suitable for these structures at room temperature.

References

  • Akhlaghi E A, Badali Y, Altındal Ş, Azizian-Kalandaragh Y, 2018. Preperaiton of mixed copper/PVA nanocomposites as an interface layer for fabrication of Al/Cu-PVA/p-Si Schottky structures. Physica B: Condensed Matter, 546; 93-98.
  • Altındal Ş, Şafak Asar Y, Kaya A, Sönmez Z, 2012. Investigation of interface states in Al/SiO2/p_Si (MIS) structures with 50 and 826 Å SiO2 interfacial layer using admittance spectroscopy method. Journal of Optoelectronics and Advanced Materials, 14; 998-1004.
  • Badali Y, Nikravan A, Altındal Ş, Uslu İ, 2018. Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures. Journal of Electronic Materials, 47; 3510-3520.
  • Büyükbaş Uluşan A, Tataroğlu A, Azizian-Kalandaragh Y, Altındal Ş, 2018. On the conduction mechanisms of Au/ (Cu2O–CuO–PVA)/n-Si (MPS) Schottky barrier diodes (SBDs) using current–voltage–temperature (I–V–T) characteristics. Journal of Material Science: Materials in Electronic, 29; 159–170.
  • Card HC, Rhoderick EH, 1971. Studies of tunnel MOS diodes I. Interface effects in silicon Schottky diodes. Journal of Physics D: Applied Physics, 4; 1589-1601.
  • Castagne R, Vapaille A, 1971. Description of the SiO2-Si interface properties by means of very low frequency MOS capacitance measurements. Surface Science, 28; 157-193.
  • Chattopadhyay P, Raychaundhuri B, 1993. Frequency dependence of forward capacitance-voltage characteristics of Schottky barrier diodes. Solid-State Electronics, 36; 605-610.
  • Demirezen S, Kaya A, Altındal Ş, Uslu İ, 2017. The energy distribution profile of interface traps and their relaxation times and capture cross sections of Au/GO-doped PrBaCoO nanoceramic/n-Si capacitors at room temperature. Polymer Bulletin, 74; 3765-3781.
  • Durmuş P, Altındal Ş, 2017. Two-diode behavior in metal-ferroelectric-semiconductor structures with bismuth titanate interfacial layer. International Journal of Modern Physics B, 31; 1750197.
  • Ejderha K, Orak I, Duman S, Türüt A, 2018. The Effect of Thermal Annealing and Measurement Temperature on Interface State Density Distribution and Time Constant in Ni/n-GaP Rectifying Contacts. Journal of Electronic Materials, 47; 3502-3509.
  • Engel-Herbert R, Hwang Y, Stemmer S, 2010. Comparison of methods to quantify interface trap densities at dielectric/III-V semiconductor interfaces. Journal of Applied Physics, 108; 124101-15.
  • Güçlü ÇŞ, Özdemir AF, Karabulut A, Kökce A, Altındal Ş, 2019. Investigation of temperature dependent negative capacitance in the forward bias C-V characteristics of (Au/Ti)/Al2O3/n-GaAs Schottky barrier diodes (SBDs). Materials Science in Semiconductor Processing, 89; 26-31.
  • Hill WA, Coleman CC, 1980. A single-frequency approximation for interface-state density determination. Solid-State Electronics, 23; 987-993.
  • Kar S, Dahlke WE, 1972. Interface states in MOS structures with 20–40 Å thick SiO2 films on nondegenerate Si. Solid-State Electronics, 15; 221-237.
  • Karabulut A, 2018. Dielectric Characaterization of Si_based Heterojunction with TiO2 Interfacial Layer. Iğdır University journal of the Institute of Science and Technology, 8; 119-129.
  • Karma S, Varma S, 1985. Determination of silicon-silicon dioxide interface state properties from admittance measurements under illumination. Journal of Applied Physics, 58; 4256-4266.
  • Kaya A, Sevgili Ö, Altındal Ş, 2014. Energy density distribution profiles of surface states, relaxation time and capture cross-section in Au/n-type 4H-SiC SBDs by using admittance spectroscopy method. International Journal of Modern Physics B, 28; 1450104-16 pages.
  • Kaya A, Tecimer H, Vural Ö, Taşdemir İH, Altındal Ş, 2014. Capacitance/Conductance-Voltage-Frequency Characteristics of Au/PVC+TCNQ/p-Si Structures in Wide Frequency Range. IEEE Transactions on Electron Devices, 61; 584-590.
  • Kuhn M, 1970. A Quasi-Static Technique for MOS C-V and Surface State Measurements. Solid State Electronics, 13; 873-885.
  • Marıl E, Tan SO, Altındal Ş, Uslu İ, 2018. Evaluation of Electric and Dielectric Properties of Metal-Semiconductor Structures With 2% GC-Doped-(Ca3Co4Ga0.0001Ox) Interlayer. IEEE Transactions on Electron Devices, 65; 3901-3908.
  • Nicollian EH, Brews JR, 1982. Metal-Oxide-Semiconductor (MOS) Physics and Technology. Wiley, New York-ABD.
  • Nicollian EH, Goetzberger A, 1965. MOS Conductance Technique for Measuring Surface State Parameters. Applied Physics Letters, 7; 216-219.
  • Nicollian EH, Goetzberger A, 1967. The Si-SiO2 Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance Technique. The Bell System Technical Journal, 46; 1055-1133.
  • Nikravan A, Badali Y, Altındal Ş, Uslu İ, Orak İ, 2017. On the Frequency and Voltage-Dependent Profiles of the Surface States and Series Resistance of Au/ZnO/n-Si Structures in a Wide Range of Frequency and Voltage. Journal of Electronic Materials, 46; 5728-5736.
  • Orak İ, Koçyiğit A, 2016. The Electrical Characterization Effect of Insulator Layer between Semiconductor and Metal. Iğdır University journal of the Institute of Science and Technology, 6; 57-67.
  • Padma R, Sreenu K, Rajagopal Reddy V, 2017. Electrical and frequency dependence characteristics of Ti/polyethylene oxide (PEO)/p-type InP organic-inorganic Schottky junction. Journal of Alloys and Compounds, 695; 2587-2596.
  • Reddy MSP, Lee J-H, Jang J-S, 2013. Frequency dependent series resistance and interface states in Au/bio-organic/n-GaN Schottky structures based on DNA biopolymer. Synthetic Metals, 185-186; 167-171.
  • Reddy V N, Padma R, Gunasekhar K R, 2018. Analysis of electronic parameters and frequency-dependent properties of Au/NiO/n-GaN heterojunctions. Applied Physics A, 124; 79.
  • Tanrıkulu EE, Altındal Ş, Azizian-Kalandaragh Y, 2018. Preparation of (CuS–PVA) interlayer and the investigation their structural, morphological and optical properties and frequency dependent electrical characteristics of Au/(CuS–PVA)/n-Si (MPS) structures. Journal of Materials Science: Materials in Electronics, 29; 11801–11811.
  • Tanrıkulu H, Tataroğlu A, Tanrıkulu EE, Büyükbaş Uluşan A, 2018. Electrical characterization of MIS diode prepared by magnetron sputtering. Indian Journal of Pure and Applied Physics, 56; 142-148.
  • Taşçıoğlu İ, Tan S O, Yakuphanoğlu F, Altındal Ş, 2018. Effectuality of Barrier Height Inhomogeneity on the Current-Voltage-Temperature Characteristics of Metal Semiconductor Structures with CdZnO Interlayer. Journal of Electronic Materials, 47; 6059-6066.
  • Tecimer H, Tan S O, Altındal Ş, 2018. Frequency-Dependent Admittance Analysis of the Metal–Semiconductor Structure with an Interlayer of Zn-Doped Organic Polymer Nanocomposites. IEEE Transactions on Electron Devices, 65; 231-236.
  • Tecimer H, Uslu H, Alahmed Z A, Yakuphanoğlu F, Altındal Ş, 2014. On the frequency and voltage dependence of admittance characteristics of Al/PTCDA/p-Si (MPS) type Schottky barrier diodes (SBDs). Composites Part B, 57; 25-30.
  • Yakuphanoğlu F, 2008. Analysis of interface states of metal-insulator-semiconductor photodiode with n-type silicon by conductance technique. Sensors and Actuators A: Physical, 147; 104-109.
  • Yücedağ İ, 2009. On the Density Distribution Profiles of Interface States in Al/SiO2/p-Si (MIS) Structures. e-Journal of New World Sciences Academy, 4; 518-526.

Al/CdZnO/p-Si (MIS) Yapısının Voltaja Bağlı Arayüzey Durumlarının ve Bu Durumların Gevşeme Sürelerinin Admitans Metodu İle İncelenmesi

Year 2019, , 1359 - 1366, 01.09.2019
https://doi.org/10.21597/jist.534345

Abstract

Al/CdZnO/p-Si (MIS) yapısının voltaja bağlı arayüzey durumları / tuzakları (Nss) ve bu durumların gevşeme süreleri () 5 kHz-1 MHz frekans aralığındaki C-V-f ve G/-V-f ölçümleri kullanılarak admitans yöntemi ile incelenmiştir. Hem C hem de G/ değerleri voltaj ve frekansın güçlü bir fonksiyonu olarak bulundu ve bu değerler hemen hemen her voltaj için azalan frekansla artar. Düşük frekanslarda elde edilen daha yüksek C ve G değerleri, CdZnO/p-Si arayüzeyi arasında yer alan Nss varlığından kaynaklanmaktadır. Düşük frekanslarda, tuzaklardaki yüklerin gevşeme süresi uygulanan ac sinyalin periyodundan (≥T) daha büyüktür, bu nedenle ölçülen C ve G/ değerlerine katkıda bulunabilirler. Ayrıca, Nss varlığı yapının hesaplanan paralel iletkenlik (Gp/)-Lnf eğrilerinde bir pike neden olur. Böylece, hem Nss hem de  değerleri, sırasıyla pik değerinden ve pikin konumundan hesaplandı. Nss ve  değerleri, sırasıyla 1.7 V’da 1.65x1013 eV-1 cm-2, 31.4s ve 3 V’da 1.39x1013 eV-1 cm-2, 9.18 s arasında değişmiştir. Bu değerler oda sıcaklığında bu yapılar için çok uygundur.

References

  • Akhlaghi E A, Badali Y, Altındal Ş, Azizian-Kalandaragh Y, 2018. Preperaiton of mixed copper/PVA nanocomposites as an interface layer for fabrication of Al/Cu-PVA/p-Si Schottky structures. Physica B: Condensed Matter, 546; 93-98.
  • Altındal Ş, Şafak Asar Y, Kaya A, Sönmez Z, 2012. Investigation of interface states in Al/SiO2/p_Si (MIS) structures with 50 and 826 Å SiO2 interfacial layer using admittance spectroscopy method. Journal of Optoelectronics and Advanced Materials, 14; 998-1004.
  • Badali Y, Nikravan A, Altındal Ş, Uslu İ, 2018. Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures. Journal of Electronic Materials, 47; 3510-3520.
  • Büyükbaş Uluşan A, Tataroğlu A, Azizian-Kalandaragh Y, Altındal Ş, 2018. On the conduction mechanisms of Au/ (Cu2O–CuO–PVA)/n-Si (MPS) Schottky barrier diodes (SBDs) using current–voltage–temperature (I–V–T) characteristics. Journal of Material Science: Materials in Electronic, 29; 159–170.
  • Card HC, Rhoderick EH, 1971. Studies of tunnel MOS diodes I. Interface effects in silicon Schottky diodes. Journal of Physics D: Applied Physics, 4; 1589-1601.
  • Castagne R, Vapaille A, 1971. Description of the SiO2-Si interface properties by means of very low frequency MOS capacitance measurements. Surface Science, 28; 157-193.
  • Chattopadhyay P, Raychaundhuri B, 1993. Frequency dependence of forward capacitance-voltage characteristics of Schottky barrier diodes. Solid-State Electronics, 36; 605-610.
  • Demirezen S, Kaya A, Altındal Ş, Uslu İ, 2017. The energy distribution profile of interface traps and their relaxation times and capture cross sections of Au/GO-doped PrBaCoO nanoceramic/n-Si capacitors at room temperature. Polymer Bulletin, 74; 3765-3781.
  • Durmuş P, Altındal Ş, 2017. Two-diode behavior in metal-ferroelectric-semiconductor structures with bismuth titanate interfacial layer. International Journal of Modern Physics B, 31; 1750197.
  • Ejderha K, Orak I, Duman S, Türüt A, 2018. The Effect of Thermal Annealing and Measurement Temperature on Interface State Density Distribution and Time Constant in Ni/n-GaP Rectifying Contacts. Journal of Electronic Materials, 47; 3502-3509.
  • Engel-Herbert R, Hwang Y, Stemmer S, 2010. Comparison of methods to quantify interface trap densities at dielectric/III-V semiconductor interfaces. Journal of Applied Physics, 108; 124101-15.
  • Güçlü ÇŞ, Özdemir AF, Karabulut A, Kökce A, Altındal Ş, 2019. Investigation of temperature dependent negative capacitance in the forward bias C-V characteristics of (Au/Ti)/Al2O3/n-GaAs Schottky barrier diodes (SBDs). Materials Science in Semiconductor Processing, 89; 26-31.
  • Hill WA, Coleman CC, 1980. A single-frequency approximation for interface-state density determination. Solid-State Electronics, 23; 987-993.
  • Kar S, Dahlke WE, 1972. Interface states in MOS structures with 20–40 Å thick SiO2 films on nondegenerate Si. Solid-State Electronics, 15; 221-237.
  • Karabulut A, 2018. Dielectric Characaterization of Si_based Heterojunction with TiO2 Interfacial Layer. Iğdır University journal of the Institute of Science and Technology, 8; 119-129.
  • Karma S, Varma S, 1985. Determination of silicon-silicon dioxide interface state properties from admittance measurements under illumination. Journal of Applied Physics, 58; 4256-4266.
  • Kaya A, Sevgili Ö, Altındal Ş, 2014. Energy density distribution profiles of surface states, relaxation time and capture cross-section in Au/n-type 4H-SiC SBDs by using admittance spectroscopy method. International Journal of Modern Physics B, 28; 1450104-16 pages.
  • Kaya A, Tecimer H, Vural Ö, Taşdemir İH, Altındal Ş, 2014. Capacitance/Conductance-Voltage-Frequency Characteristics of Au/PVC+TCNQ/p-Si Structures in Wide Frequency Range. IEEE Transactions on Electron Devices, 61; 584-590.
  • Kuhn M, 1970. A Quasi-Static Technique for MOS C-V and Surface State Measurements. Solid State Electronics, 13; 873-885.
  • Marıl E, Tan SO, Altındal Ş, Uslu İ, 2018. Evaluation of Electric and Dielectric Properties of Metal-Semiconductor Structures With 2% GC-Doped-(Ca3Co4Ga0.0001Ox) Interlayer. IEEE Transactions on Electron Devices, 65; 3901-3908.
  • Nicollian EH, Brews JR, 1982. Metal-Oxide-Semiconductor (MOS) Physics and Technology. Wiley, New York-ABD.
  • Nicollian EH, Goetzberger A, 1965. MOS Conductance Technique for Measuring Surface State Parameters. Applied Physics Letters, 7; 216-219.
  • Nicollian EH, Goetzberger A, 1967. The Si-SiO2 Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance Technique. The Bell System Technical Journal, 46; 1055-1133.
  • Nikravan A, Badali Y, Altındal Ş, Uslu İ, Orak İ, 2017. On the Frequency and Voltage-Dependent Profiles of the Surface States and Series Resistance of Au/ZnO/n-Si Structures in a Wide Range of Frequency and Voltage. Journal of Electronic Materials, 46; 5728-5736.
  • Orak İ, Koçyiğit A, 2016. The Electrical Characterization Effect of Insulator Layer between Semiconductor and Metal. Iğdır University journal of the Institute of Science and Technology, 6; 57-67.
  • Padma R, Sreenu K, Rajagopal Reddy V, 2017. Electrical and frequency dependence characteristics of Ti/polyethylene oxide (PEO)/p-type InP organic-inorganic Schottky junction. Journal of Alloys and Compounds, 695; 2587-2596.
  • Reddy MSP, Lee J-H, Jang J-S, 2013. Frequency dependent series resistance and interface states in Au/bio-organic/n-GaN Schottky structures based on DNA biopolymer. Synthetic Metals, 185-186; 167-171.
  • Reddy V N, Padma R, Gunasekhar K R, 2018. Analysis of electronic parameters and frequency-dependent properties of Au/NiO/n-GaN heterojunctions. Applied Physics A, 124; 79.
  • Tanrıkulu EE, Altındal Ş, Azizian-Kalandaragh Y, 2018. Preparation of (CuS–PVA) interlayer and the investigation their structural, morphological and optical properties and frequency dependent electrical characteristics of Au/(CuS–PVA)/n-Si (MPS) structures. Journal of Materials Science: Materials in Electronics, 29; 11801–11811.
  • Tanrıkulu H, Tataroğlu A, Tanrıkulu EE, Büyükbaş Uluşan A, 2018. Electrical characterization of MIS diode prepared by magnetron sputtering. Indian Journal of Pure and Applied Physics, 56; 142-148.
  • Taşçıoğlu İ, Tan S O, Yakuphanoğlu F, Altındal Ş, 2018. Effectuality of Barrier Height Inhomogeneity on the Current-Voltage-Temperature Characteristics of Metal Semiconductor Structures with CdZnO Interlayer. Journal of Electronic Materials, 47; 6059-6066.
  • Tecimer H, Tan S O, Altındal Ş, 2018. Frequency-Dependent Admittance Analysis of the Metal–Semiconductor Structure with an Interlayer of Zn-Doped Organic Polymer Nanocomposites. IEEE Transactions on Electron Devices, 65; 231-236.
  • Tecimer H, Uslu H, Alahmed Z A, Yakuphanoğlu F, Altındal Ş, 2014. On the frequency and voltage dependence of admittance characteristics of Al/PTCDA/p-Si (MPS) type Schottky barrier diodes (SBDs). Composites Part B, 57; 25-30.
  • Yakuphanoğlu F, 2008. Analysis of interface states of metal-insulator-semiconductor photodiode with n-type silicon by conductance technique. Sensors and Actuators A: Physical, 147; 104-109.
  • Yücedağ İ, 2009. On the Density Distribution Profiles of Interface States in Al/SiO2/p-Si (MIS) Structures. e-Journal of New World Sciences Academy, 4; 518-526.
There are 35 citations in total.

Details

Primary Language English
Subjects Metrology, Applied and Industrial Physics
Journal Section Fizik / Physics
Authors

Esra Erbilen Tanrıkulu 0000-0003-3945-3536

Publication Date September 1, 2019
Submission Date March 1, 2019
Acceptance Date March 17, 2019
Published in Issue Year 2019

Cite

APA Erbilen Tanrıkulu, E. (2019). Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Journal of the Institute of Science and Technology, 9(3), 1359-1366. https://doi.org/10.21597/jist.534345
AMA Erbilen Tanrıkulu E. Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Iğdır Üniv. Fen Bil Enst. Der. September 2019;9(3):1359-1366. doi:10.21597/jist.534345
Chicago Erbilen Tanrıkulu, Esra. “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/P-Si (MIS) Structure Via Admittance Method”. Journal of the Institute of Science and Technology 9, no. 3 (September 2019): 1359-66. https://doi.org/10.21597/jist.534345.
EndNote Erbilen Tanrıkulu E (September 1, 2019) Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Journal of the Institute of Science and Technology 9 3 1359–1366.
IEEE E. Erbilen Tanrıkulu, “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method”, Iğdır Üniv. Fen Bil Enst. Der., vol. 9, no. 3, pp. 1359–1366, 2019, doi: 10.21597/jist.534345.
ISNAD Erbilen Tanrıkulu, Esra. “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/P-Si (MIS) Structure Via Admittance Method”. Journal of the Institute of Science and Technology 9/3 (September 2019), 1359-1366. https://doi.org/10.21597/jist.534345.
JAMA Erbilen Tanrıkulu E. Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Iğdır Üniv. Fen Bil Enst. Der. 2019;9:1359–1366.
MLA Erbilen Tanrıkulu, Esra. “Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/P-Si (MIS) Structure Via Admittance Method”. Journal of the Institute of Science and Technology, vol. 9, no. 3, 2019, pp. 1359-66, doi:10.21597/jist.534345.
Vancouver Erbilen Tanrıkulu E. Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method. Iğdır Üniv. Fen Bil Enst. Der. 2019;9(3):1359-66.