Investigation of the Voltage Dependent Surface States and Their Relaxation Time of the Al/CdZnO/p-Si (MIS) Structure Via Admittance Method
Öz
The voltage dependent surface states/traps (Nss) and their relaxation time () of the Al/CdZnO/p-Si (MIS) structure were investigated with admittance method using C-V-f and G/-V-f measurements in the frequency range of 5 kHz-1 MHz. Both the values of C and G/ were found as strong function of voltage and frequency and they increase with decreasing frequency almost for each voltage. The obtained higher values of C and G at the low frequencies are due to the presence of Nss located between CdZnO/p-Si interfaces. At low frequencies, the relaxation time of the charges at the traps is larger than the period (≥T) of the applied ac signal, so they can contribute to the measured C and G/ values. In addition, the presence of Nss causes a peak at the extracted parallel conductance (Gp/) versus Lnf curves of the structure. Thus, both the values of Nss and were calculated from the peak value and its position, respectively. The values of Nss and ranged from 1.65x1013 eV-1 cm-2, 31.4 s at 1.7 V and 1.39x1013 eV-1 cm-2, 9.18 s at 3 V, respectively. These values are very suitable for these structures at room temperature.
Anahtar Kelimeler
Kaynakça
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Ayrıntılar
Birincil Dil
İngilizce
Konular
Metroloji,Uygulamalı ve Endüstriyel Fizik
Bölüm
Araştırma Makalesi
Yazarlar
Yayımlanma Tarihi
1 Eylül 2019
Gönderilme Tarihi
1 Mart 2019
Kabul Tarihi
17 Mart 2019
Yayımlandığı Sayı
Yıl 2019 Cilt: 9 Sayı: 3
Cited By
Investigation Of Electrical Characteristics, Voltage-Dependent Interface States, And Series Resistance of Au/AgNiO/n-Si Structures Using Low-High Frequency Capacitances
Journal of the Institute of Science and Technology
https://doi.org/10.21597/jist.1815773