ZnO ve Al-katkılı ZnO filmlerin SILAR tekniğiyle üretimi ve analizleri

Yıl 2024, , 1074 - 1079, 15.10.2024

İlker Kara , Abjar Ibrahim Rashid Hafedh , Ihsan Sadeq Raheem Waelı

https://doi.org/10.28948/ngumuh.1439098

Öz

Bu çalışmada, farklı konsantrasyonlarda saf ZnO (Çinko Oksit) ve Al-katkılı ZnO ince filmler, ITO tabanı üzerine SILAR yöntemi ile başarıyla büyütüldü. Üretilen ince filmler SEM/EDS, XRD ve UV-Vis spektroskopisi ile karakterize edilmiştir. XRD analizi sonuçlarına göre, üretilen ince filmlerin nanometre ölçeğinde kristalleştiği ve kristalleşme kalitesinin Al-katkı konsantrasyonuna bağlı olarak değiştiği gözlendi. SEM/EDS analizi sonuçları, Al-katkılı ZnO ince filmlerin morfolojisi üzerinde etkilemiş olup nano-kök yapılar oluşturulmuştur. UV-Vis analizi sonuçları, Al-katkı maddesine bağlı olarak üretilen ince filmlerin yasak enerji aralığı değerleri azalmış, soğurma kenarının keskinleştiği ve soğurma yoğunluğunun arttığı gözlendi.

Anahtar Kelimeler

SILAR method, Zinc oxide, Al doped ZnO

Fabrication and analysis of ZnO and Al-doped ZnO films using the SILAR technique

Öz

In this study, pure ZnO and Al-doped ZnO thin films at different concentrations were successfully grown on an ITO substrate using the SILAR method. The produced thin films were characterized by SEM/EDS, XRD, and UV-Vis spectroscopy. According to the XRD analysis results, it was observed that the produced thin films crystallized on a nanometer scale, and the crystallization quality varied depending on the concentration of Al doping. SEM/EDS analysis results indicated that Al-doped ZnO thin films affected the morphology, forming nano-root structures. UV-Vis analysis results showed that the band gap values of the thin films produced varied depending on the Al dopant, with decreased values, sharper absorption edges, and increased absorption intensities.

Anahtar Kelimeler

SILAR method, Zinc oxide, Al doped ZnO

Kaynakça

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