Some Physical Properties of the InGaAsN Thin Films Deposited by Thermionic Vacuum Arc
Öz
In this paper, InGaAsN thin films were deposited by Thermionic Vacuum Arc (TVA) for the first time. Deposition parameters were determined. These films were grown on different type substrate material. These are glass, Si and poly Polyethylene terephthalate (PET) materials. Crystal structures of the produced samples were investigated by XRD analysis of the produced samples. Atomic concentrations of the deposited samples were investigated by EDX. The surface properties of the films were imaged by atomic force microscopy. Band gap values were calculated by optical method from the absorbance spectra of the UV-Vis spectrophotometer. According to obtained results, different atomic ratios were detected.
Anahtar Kelimeler
Kaynakça
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Ayrıntılar
Birincil Dil
Türkçe
Konular
Mühendislik
Bölüm
Araştırma Makalesi
Yazarlar
Yayımlanma Tarihi
29 Ağustos 2017
Gönderilme Tarihi
5 Nisan 2016
Kabul Tarihi
20 Temmuz 2017
Yayımlandığı Sayı
Yıl 2017 Cilt: 22 Sayı: 2